文摘
Ingenious solid phase epitaxy of ThCr2Si2-type Y2O2Bi thin film with a Bi2鈥?/sup> square net was developed. A Y2O3 amorphous thin film with Y and Bi powders was heated in two steps under reductive atmosphere on a nonoxide lattice-matched CaF2 substrate. This procedure was indispensable for the epitaxial growth of Y2O2Bi, circumventing the formation of the C-rare earth type (Y,Bi)2O3 with Bi3+. Highly oxidizable Y metal was a key to accomplish the unusual reductive state of Bi2鈥?/sup>. The lattice-matched CaF2 substrate possessing a similar structure to the Y2O22+ unit in Y2O2Bi promoted the spontaneous c-axis orientation of the thin film.