Near Full-Composition-Range High-Quality GaAs1–<i>xSbx Nanowires Grown by Molecular-Beam Epitaxy
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文摘
Here we report on the Ga self-catalyzed growth of near full-composition-range energy-gap-tunable GaAs1–<i>xi>Sb<i>xi> nanowires by molecular-beam epitaxy. GaAs1–<i>xi>Sb<i>xi> nanowires with different Sb content are systematically grown by tuning the Sb and As fluxes, and the As background. We find that GaAs1–<i>xi>Sb<i>xi> nanowires with low Sb content can be grown directly on Si(111) substrates (0 ≤ <i>xi> ≤ 0.60) and GaAs nanowire stems (0 ≤ <i>xi> ≤ 0.50) by tuning the Sb and As fluxes. To obtain GaAs1–<i>xi>Sb<i>xi> nanowires with <i>xi> ranging from 0.60 to 0.93, we grow the GaAs1–<i>xi>Sb<i>xi> nanowires on GaAs nanowire stems by tuning the As background. Photoluminescence measurements confirm that the emission wavelength of the GaAs1–<i>xi>Sb<i>xi> nanowires is tunable from 844 nm (GaAs) to 1760 nm (GaAs0.07Sb0.93). High-resolution transmission electron microscopy images show that the grown GaAs1–<i>xi>Sb<i>xi> nanowires have pure zinc-blende crystal structure. Room-temperature Raman spectra reveal a redshift of the optical phonons in the GaAs1–<i>xi>Sb<i>xi> nanowires with <i>xi> increasing from 0 to 0.93. Field-effect transistors based on individual GaAs1–<i>xi>Sb<i>xi> nanowires are fabricated, and rectifying behavior is observed in devices with low Sb content, which disappears in devices with high Sb content. The successful growth of high-quality GaAs1–<i>xi>Sb<i>xi> nanowires with near full-range bandgap tuning may speed up the development of high-performance nanowire devices based on such ternaries.

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