Substrate-Independent Dip-Pen Nanolithography Based on Reactive Coatings

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• 作者：Hsien-Yeh Chen ; Michael Hirtz ; Xiaopei Deng ; Thomas Laue ; Harald Fuchs ; Joerg Lahann
• 刊名：Journal of the American Chemical Society
• 出版年：2010
• 出版时间：December 29, 2010
• 年：2010
• 卷：132
• 期：51
• 页码：18023-18025
• 全文大小：182K
• 年卷期：v.132,no.51(December 29, 2010)
• ISSN：1520-5126

文摘

We report that nanostructuring via dip-pen nanolithography can be used for modification of a broad range of different substrates (polystyrene, Teflon, stainless steel, glass, silicon, rubber, etc.) without the need for reconfiguring the underlying printing technology. This is made possible through the use of vapor-based coatings that can be deposited on these substrates with excellent conformity, while providing functional groups for subsequent spatially directed click chemistry via dip-pen nanolithography. Pattern quality has been compared on six different substrates demonstrating that this approach indeed results in a surface modification protocol with potential use for a wide range of biotechnological applications.