Short Time Deposition Kinetics of Diethyl Phthalate and Dibutyl Phthalate on a Silicon Wafer Surface

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• 作者：Yuhao Kang ; Walter Den ; and Hsunling Bai
• 刊名：Industrial & Engineering Chemistry Research
• 出版年：2006
• 出版时间：February 15, 2006
• 年：2006
• 卷：45
• 期：4
• 页码：1331 - 1336
• 全文大小：97K
• 年卷期：v.45,no.4(February 15, 2006)
• ISSN：1520-5045

文摘

Short time adsorption and desorption behaviors of two alkyl phthalate esters, namely diethyl phthalate (DEP)and dibutyl phthalate (DBP), on silicon wafers exposed under various ambient concentrations wereexperimentally and theoretically investigated. The results showed that the surface density of DBP wassignificantly affected by both the length of exposure time and its ambient concentration, whereas that of DEPwas only affected by its ambient concentration within the tested periods between 60 and 240 min. Thedetermination of rate parameters for adsorption and desorption showed that the rate constants of DEP werealways larger than those of DBP. Also, the sticking coefficient of DEP was larger during the initial adsorptionstage due to its relatively lower molecular weight as compared to DBP. The value of the sticking coefficientfor DEP, however, decreased much faster such that the value eventually became smaller than that for DBP.Therefore, for silicon wafers experiencing a short exposure time, organic compounds with lower molecularweights may be a more important source of airborne molecular contamination than those with higher molecularweights.