Influence of Anneal Time on m class="a-plus-plus">Σm>3 Boundary Segregation in Commercially Pure Nickel

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• 作者：Shery L. Welsh ; Jeffrey L. Evans
• 关键词：Grain boundary engineering ; Special grain boundary ; Segregation ; Atom probe tomography
• 刊名：Metallography, Microstructure, and Analysis
• 出版年：2016
• 出版时间：December 2016
• 年：2016
• 卷：5
• 期：6
• 页码：466-475
• 全文大小：6625KB
• 刊物主题：Metallic Materials; Characterization and Evaluation of Materials; Structural Materials; Surfaces and Interfaces, Thin Films; Nanotechnology;
• 出版者：Springer US
• ISSN：2192-9270
• 卷排序：5

文摘

Commercially pure nickel (Ni200) samples were thermo-mechanically processed to drive segregation into Σ3, special grain boundaries. The special grain boundaries were characterized using electron backscatter diffraction, and their segregation behavior at the atomic level was studied using atom probe tomography. Local electrode atom probe analyses showed a lack of segregation at the Σ3 special grain boundary for a specimen annealed at 1000 °C for 30 h except for a slight increase in Si. This specimen was utilized in a previous study by the authors to compare the effects of segregation of type-specific grain boundaries. Local electrode atom probe results showed no segregation at the special grain boundary for a specimen annealed at 1000 °C for 100 h providing preliminary evidence that there is a correlation between increased anneal time and the effectiveness of Σ3 special grain boundaries to inhibit grain boundary segregation.