Ripple surface generated on hydrogenated amorphous carbon nitride films
详细信息查看全文 | 推荐本文 |
摘要
It is reported for the first time that the periodical ripple surface feature at micrometer-scale was observed on hydrogenated amorphous carbon nitride films deposited by pulse plasma chemical vapor deposition (CVD) technique. Nitrogen incorporation to hydrogenated amorphous carbon films and the different growing environments of pulse dc plasma discharge perhaps played crucial role in the surface morphology transformation of hydrogenated amorphous carbon nitride films.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700