Properties of SnO2 films fabricated using a rectangular filtered vacuum arc plasma source
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摘要
Transparent and conducting SnO2 films of 57–200nm thickness were deposited on microscope glass slide substrates, using a rectangular filtered vacuum arc deposition system. The 40 glass slides were equally distributed on a 400 × 420mm substrate carriage, and were exposed to a Sn plasma beam, produced by a rectangular vacuum arc plasma gun with a Sn cathode, and passed through a rectangular magnetic macroparticle filter towards the substrates. The carriage with the substrates was transported past the 94 × 494mm filter outlet. The SnO2 films were fabricated on the glass substrates at room temperature by maintaining the chamber oxygen background pressure at 0.52Pa. The film composition, and electrical and optical properties were studied as a function of the film thickness. The films were stored under ambient air conditions, and their electrical resistance was measured as a function of storage time over a period of several months.

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