液态金属汞在硅片表面的润湿行为研究
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摘要
针对常温下的液体在固体表面的润湿行为研究。以液态金属汞为研究对象,采用真空等离子体刻蚀工艺制备不同表面形貌的硅片,研究不同硅片的润湿行为,并探究了液滴体积对润湿性的影响。利用金相电子显微镜、白光干涉三维形貌仪以及接触角测量仪分别对不同硅片的表面形貌、表面粗糙度以及润湿行为进行了测量与表征。结果表明:当液滴体积相同时,随硅片表面粗糙度Sa增大,接触角增大;当液滴体积为1μL,表面粗糙度为257.01μm时,测得静态接触角达到最大,为158.3°;而在同一形貌的硅片表面,当液滴体积由1增加到4μL时,硅片表面的接触角呈现逐渐减小的趋势,在致密的网状结构硅片表面,接触角减小的幅度最大,达到11.6°。为今后研究汞在不用材料表面的润湿行为具有一定的参考意义。
We addressed the wetting behavior of liquid mercury on plasma-etched Si wafer surface. The influence of the surface roughness and mercury droplet volume on the wettability was investigated with metallurgical microscope,white light interferometer,3D profilometer and contact angle measurement. The results show that the surface roughness and Hg-droplet volume significantly affected the contact angle. The results show that the surface roughness and Hg-droplet volume had a major impact. To be specific,as the surface roughness increased,the contact angle of the mercury droplet with the same volume increased; the largest static contact angle reached 158. 3° when the surface roughness was 257. 01 μm and the volume was 1 μL; as the volume increased from 1 to 4 μL and the surface roughness remained to be the same,the contact angle gradually decreased,with a largest net decrease of 11. 6° on a dense "reticular"-structured Si wafer surface.
We addressed the wetting behavior of liquid mercury on plasma-etched Si wafer surface. The influence of the surface roughness and mercury droplet volume on the wettability was investigated with metallurgical microscope,white light interferometer,3D profilometer and contact angle measurement. The results show that the surface roughness and Hg-droplet volume significantly affected the contact angle. The results show that the surface roughness and Hg-droplet volume had a major impact. To be specific,as the surface roughness increased,the contact angle of the mercury droplet with the same volume increased; the largest static contact angle reached 158. 3° when the surface roughness was 257. 01 μm and the volume was 1 μL; as the volume increased from 1 to 4 μL and the surface roughness remained to be the same,the contact angle gradually decreased,with a largest net decrease of 11. 6° on a dense "reticular"-structured Si wafer surface.
引文
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[16]张波.疏水性材料的等离子体表面改性工艺研究[J].真空科学与技术学报,2011,31(06):705-709
[2]王奔,念敬妍,铁璐,等.稳定超疏水性表面的理论进展[J].物理学报,2013,62(14):370-384
[3]陈钰,徐建生,郭志光.仿生超疏水性表面的最新应用研究[J].化学进展,2012,24(05):696-708
[4]Olga I Vinogradova,Alexander L Dubov.Superhydrophobic Textures for Microfluidics[J].Mendeleev Communications,2012,22(5)
[5]Nishimoto S,Bhushan B.Bioinspired Self-Cleaning Surfaces with Superhydrophobicity,Superoleophobicity,and Superhydrophilicity[J].RSC Adv,2013,(3):671-690
[6]Liao R J,Zuo Z P,Guo C,et al.Fabrication of Superhydrophobic Surface on Aluminum by Continuous Chemical Etching and its Anti-icing Property[J].Appl Surf Sci,2014,317:701-709
[7]OBERLI L,CARUSO D,HALL C,et al.Condensation and Freezing of Droplets on Superhydrophobic Surfaces[J].Advances in Colloid&Interface Science,2013,210(8):47-57
[8]Peng Shusen,Ma Yongcun.Fabrication of Hydrophilic and Oil-Repellent Surface via CF4Plasma Treatment[J].Materials&Design,2017
[9]李伟,李梅,路庆华.离子液体在超疏水银膜表面的电润湿性能[J].上海交通大学学报,2011,45(12):1879-1884
[10]赵文杰,曾志翔,王立平,等.规则织构化硅片表面的制备及其润湿行为[J].中国表面工程,2011,24(03):4-10
[11]姜磊,李兆敏,杨丽敏,等.氧等离子处理对多孔硅表面润湿性的影响[J].中国表面工程,2013,26(05):43-48
[12]刘珂.多孔硅的制备及其润湿性研究[D].沈阳:沈阳航空航天大学,2012
[13]王玉娟,郭亚杰,裘英华,等.硅表面微结构对表面润湿方向性影响的分子动力学研究[J].东南大学学报,2014,44(06):1161-1165
[14]李晶,姜虹宇,杜锋,等.气动喷砂工艺对304不锈钢表面润湿效应的影响[J].中国表面工程,2017,30(05):95-101
[15]邵晶晶,任芝龙,杨雅伦,等.磁控溅射制备聚四氟乙烯低温超疏水薄膜[J].真空科学与技术学报,2017,37(02):154-160
[16]张波.疏水性材料的等离子体表面改性工艺研究[J].真空科学与技术学报,2011,31(06):705-709