新型光刻技术研究进展
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摘要
集成电路光刻作为传统光刻技术的典型代表,支撑着集成电路芯片的快速发展。新一代光刻技术具有工艺多样化、光刻精度高、光刻效率高的优点,在研发新型光电子器件、实现3维微纳结构、构建有序纳米孔通道等方面有很大的潜力。回顾了近些年来涌现的多种新型光刻技术,分析了各自的特征及在新型纳米电子、光子器件、能源、传感等领域中的应用。对未来光刻技术的发展方向进行了展望。
Integrated circuit(IC) lithography,as a typical representative of traditional lithography technology,supports the rapid development of integrated circuit chips.The new generation of photolithography technology has the advantages of diverse technology,high precision and high efficiency.It has great potential in the development of optoelectronic devices,the realization of 3-D micro-nano structure,and the construction of the ordered nanoscale channels.A variety of new photolithography technologies in recent years have been reviewed.Their characteristics and their applications in nanoelectronics,photonic devices,energy,sensing and other fields have been analyzed.Finally,the development direction of lithography technology in the future is prospected.
Integrated circuit(IC) lithography,as a typical representative of traditional lithography technology,supports the rapid development of integrated circuit chips.The new generation of photolithography technology has the advantages of diverse technology,high precision and high efficiency.It has great potential in the development of optoelectronic devices,the realization of 3-D micro-nano structure,and the construction of the ordered nanoscale channels.A variety of new photolithography technologies in recent years have been reviewed.Their characteristics and their applications in nanoelectronics,photonic devices,energy,sensing and other fields have been analyzed.Finally,the development direction of lithography technology in the future is prospected.
引文
[1]MOORE G E.Cramming more components onto integrated circuits[J].Proceedings of the IEEE,1998,86(1):82-85.
[2]KIM S,MARELLI B,BRENCKLE M A,et al.All-water-based electron-beam lithography using silk as a resist[J].Nature Nanotechnology,2014,9(4):306-310.
[3]HOEFLICH K,JURCZYK J,ZHANG Y,et al.Direct electron beam writing of silver-based nanostructures[J].ACS Applied Materials&Interfaces,2017,9(28):24071-24077.
[4]QIU C,ZHANG Z,XIAO M,et al.Scaling carbon nanotube complementary transistors to 5-nm gate lengths[J].Science,2017,355(6322):271-276.
[5]KHORASANINEJAD M,CHEN W T,DEVLIN R C,et al.Metalenses at visible wavelengths:Diffraction-limited focusing and subwavelength resolution imaging[J].Science,2016,352(6290):1190-1194.
[6]FISCHER J,VON FREYMANN G,WEGENER M.The materials challenge in diffraction-unlimited direct-laser-writing optical lithography[J].Advanced Materials,2010,22(32):3578-3582.
[7]YU J,HE Sh T,SONG H Y,et al.Metal nanostructured film generated by femtosecond laser induced forward transfer[J].Chinese Journal of Lasers,2017,44(1):102009(in Chinese).
[8]BUCKMANN T,STENGER N,KADIC M,et al.Tailored 3-D mechanical metamaterials made by dip-in direct laser writing optical lithography[J].Advanced Materials,2012,24(20):2710-2714.
[9]LONG J,XIONG W,LIU Y,et al.3-D assembly of aligned carbon nanotubes via femtosecond laser direct writing[J].Chinese Journal of Lasers,2017,44(1):102003(in Chinese).
[10]BRAUN A,MAIER S A.Versatile direct laser writing lithography technique for surface enhanced infrared spectroscopy sensors[J].ACS Sensors,2016,1(9):1155-1162.
[11]BAGHERI S,WEBER K,GISSIBL T,et al.Fabrication of squarecentimeter plasmonic nanoantenna arrays by femtosecond direct laser writing lithography:effects of collective excitations on SEIRA enhancement[J].ACS Photonics,2015,2(6):779-786.
[12]BROWN L V,YANG X,ZHAO K,et al.Fan-shaped gold nanoantennas above reflective substrates for surface-enhanced infrared absorption(SEIRA)[J].Nano Letters,2015,15(2):1272-1280.
[13]CHENG F,YANG X,GAO J.Ultrasensitive detection and characterization of molecules with infrared plasmonic metamaterials[J].Scientific Reports,2015,5:14327.
[14]BAGHERI S,GIESSEN H,NEUBRECH F.Large-area antennaassisted seira substrates by laser interference lithography[J].Advanced Optical Materials,2014,2(11):1050-1056.
[15]CHANG Y C,LU S C,CHUNG H C,et al.High-throughput nanofabrication of infra-red and chiral metamaterials using nanosphericallens lithography[J].Scientific Reports,2013,3(3):3339.
[16]ZHAO Z,CAO Y,CAI Y,et al.Oblique colloidal lithography for the fabrication of nonconcentric features[J].ACS Nano,2017,11(7):6594-6604.
[17]DU K,DING J,LIU Y,et al.Stencil lithography for scalable micro-and nanomanufacturing[J].Micromachines,2017,8(4):131.
[18]GUILHABERT B,MASSOUBRE D,RICHARDSON E,et al.Submicron lithography using In Ga N micro-LEDs:mask-free fabrication of LED arrays[J].IEEE Photonics Technology Letters,2012,24(24):2221-2224.
[19]MIKULICS M,HARDTDEGEN H.Nano-LED array fabrication suitable for future single photon lithography[J].Nanotechnology,2015,26(18):185302.
[20]CHALLA P K,KARTANAS T,CHARMET J,et al.Microfluidic devices fabricated using fast wafer-scale LED-lithography patterning[J].Biomicrofluidics,2017,11(1):014113.
[21]LIN H Y,SHER C W,HSIEH D H,et al.Optical cross-talk reduction in a quantum-dot-based full-color micro-light-emitting-diode display by a lithographic-fabricated photoresist mold[J].Photonics Research,2017,5(5):411-416.
[22]MASUDA H,FUKUDA K.Ordered metal nanohole arrays made by a two-step replication of honeycomb structures of anodic alumina[J].Science,1995,268(5216):1466.
[23]LEE W,PARK S J.Porous anodic aluminum oxide:anodization and templated synthesis of functional nanostructures[J].Chemical reviews,2014,114(15):7487-7556.
[24]MAc FARLANE R J,LEE B,HILL H D,et al.Assembly and organization processes in DNA-directed colloidal crystallization[J].Proceedings of the National Academy of Sciences,2009,106(26):10493-10498.
[25]YAN P,FEI G T,SU Y,et al.Anti-counterfeiting of one-dimensional alumina photonic crystal by creating defects[J].Electrochemical and Solid-State Letters,2011,15(3):K23-K26.
[26]YAO J,LIU Z,LIU Y,et al.Optical negative refraction in bulk metamaterials of nanowires[J].Science,2008,321(5891):930.
[27]ZHOU L,TAN Y,WANG J,et al.3-D self-assembly of aluminium nanoparticles for plasmon-enhanced solar desalination[J].Nature Photonics,2016,10(6):393-398.
[28]CHOU S Y,KRAUSS P R,RENSTROM P J.Imprint of sub-25nm vias and trenches in polymers[J].Applied Physics Letters,1995,67(21):3114-3116.
[29]KOOY N,MOHAMED K,PIN L T,et al.A review of roll-to-roll nanoimprint lithography[J].Nanoscale Research Letters,2014,9(1):320.
[30]MA P,XU Z,WANG M,et al.Fast fabrication of Ti O2hard stamps for nanoimprint lithography[J].Materials Research Bulletin,2017,90:253-259.
[31]JAIN A,SPANN A,COCHRANE A,et al.Fluid flow in UV nanoimprint lithography with patterned templates[J].Microelectronic Engineering,2017,173:62-70.
[32]ZHANG L,ZHANG J,YUAN D,et al.Electrochemical nanoimprint lithography directly on n-type crystalline silicon(111)wafer[J].Electrochemistry Communications,2017,75:1-4.
[33]MATSUI S,HIROSHIMA H,HIRAI Y,et al.Innovative UV nanoimprint lithography using a condensable alternative chlorofluorocarbon atmosphere[J].Microelectronic Engineering,2015,133(C):134-155.
[34]JI R,HORNUNG M,VERSCHUUREN M A,et al.UV enhanced substrate conformal imprint lithography(UV-SCIL)technique for photonic crystals patterning in LED manufacturing[J].Microelectronic Engineering,2010,87(5):963-967.
[35]TALIP N B A,HAYASHI T,TANIGUCHI J,et al.Lifetime amelioration of antireflection structure molds by means of partial-filling ultraviolet nanoimprint lithography[J].Microelectronic Engineering,2015,141:81-86.
[36]MOONEN P F,VRATZOV B,SMAAL W T T,et al.Flexible thinfilm transistors using multistep UV nanoimprint lithography[J].Organic Electronics,2012,13(12):3004-3013.
[37]LIU Ch,JIN L D,YE A P.Progress in and prospect of microsphere optical nanoscopy[J].Laser&Optoelectronics Progress,2016,53(7):70003(in Chinese).
[38]YANG H,TROUILLON R,HUSZKA G,et al.Super-resolution imaging of a dielectric microsphere is governed by the waist of its photonic nanojet[J].Nano Letters,2016,16(8):4862-4870.
[39]UPPUTURI P K,KRISNAN M S,MOOTHANCHERY M,et al.Photonic nanojet engineering to achieve super-resolution in photoacoustic microscopy:a simulation study[J].Proceedings of the SPIE,2017,10064:100644S
[40]PISCO M,GALEOTTI F,QUERO G,et al.Nanosphere lithography for optical fiber tip nanoprobes[J].Light:Science&Applications,2017,6(5):e16229.
[41]JI D,LI T,FUCHS H.Nanosphere lithography for sub-10nm nanogap electrodes[J].Advanced Electronic Materials,2017,3(1):1600348.
[42]CHEN Y F,XU CH,LU B R.A Super resolution nanolithography method using photon nano jetting to cause focusing effect:China,201410722282.6[P].2015-04-01.
[43]JASCHKE M,BUTT H J.Deposition of organic material by the tip of a scanning force microscope[J].Langmuir,1995,11(4):1061-1064.
[44]GARCIA R,KNOLL A W,RIEDO E.Advanced scanning probe lithography[J].Nature Nanotechnology,2014,9(8):577-587.
[2]KIM S,MARELLI B,BRENCKLE M A,et al.All-water-based electron-beam lithography using silk as a resist[J].Nature Nanotechnology,2014,9(4):306-310.
[3]HOEFLICH K,JURCZYK J,ZHANG Y,et al.Direct electron beam writing of silver-based nanostructures[J].ACS Applied Materials&Interfaces,2017,9(28):24071-24077.
[4]QIU C,ZHANG Z,XIAO M,et al.Scaling carbon nanotube complementary transistors to 5-nm gate lengths[J].Science,2017,355(6322):271-276.
[5]KHORASANINEJAD M,CHEN W T,DEVLIN R C,et al.Metalenses at visible wavelengths:Diffraction-limited focusing and subwavelength resolution imaging[J].Science,2016,352(6290):1190-1194.
[6]FISCHER J,VON FREYMANN G,WEGENER M.The materials challenge in diffraction-unlimited direct-laser-writing optical lithography[J].Advanced Materials,2010,22(32):3578-3582.
[7]YU J,HE Sh T,SONG H Y,et al.Metal nanostructured film generated by femtosecond laser induced forward transfer[J].Chinese Journal of Lasers,2017,44(1):102009(in Chinese).
[8]BUCKMANN T,STENGER N,KADIC M,et al.Tailored 3-D mechanical metamaterials made by dip-in direct laser writing optical lithography[J].Advanced Materials,2012,24(20):2710-2714.
[9]LONG J,XIONG W,LIU Y,et al.3-D assembly of aligned carbon nanotubes via femtosecond laser direct writing[J].Chinese Journal of Lasers,2017,44(1):102003(in Chinese).
[10]BRAUN A,MAIER S A.Versatile direct laser writing lithography technique for surface enhanced infrared spectroscopy sensors[J].ACS Sensors,2016,1(9):1155-1162.
[11]BAGHERI S,WEBER K,GISSIBL T,et al.Fabrication of squarecentimeter plasmonic nanoantenna arrays by femtosecond direct laser writing lithography:effects of collective excitations on SEIRA enhancement[J].ACS Photonics,2015,2(6):779-786.
[12]BROWN L V,YANG X,ZHAO K,et al.Fan-shaped gold nanoantennas above reflective substrates for surface-enhanced infrared absorption(SEIRA)[J].Nano Letters,2015,15(2):1272-1280.
[13]CHENG F,YANG X,GAO J.Ultrasensitive detection and characterization of molecules with infrared plasmonic metamaterials[J].Scientific Reports,2015,5:14327.
[14]BAGHERI S,GIESSEN H,NEUBRECH F.Large-area antennaassisted seira substrates by laser interference lithography[J].Advanced Optical Materials,2014,2(11):1050-1056.
[15]CHANG Y C,LU S C,CHUNG H C,et al.High-throughput nanofabrication of infra-red and chiral metamaterials using nanosphericallens lithography[J].Scientific Reports,2013,3(3):3339.
[16]ZHAO Z,CAO Y,CAI Y,et al.Oblique colloidal lithography for the fabrication of nonconcentric features[J].ACS Nano,2017,11(7):6594-6604.
[17]DU K,DING J,LIU Y,et al.Stencil lithography for scalable micro-and nanomanufacturing[J].Micromachines,2017,8(4):131.
[18]GUILHABERT B,MASSOUBRE D,RICHARDSON E,et al.Submicron lithography using In Ga N micro-LEDs:mask-free fabrication of LED arrays[J].IEEE Photonics Technology Letters,2012,24(24):2221-2224.
[19]MIKULICS M,HARDTDEGEN H.Nano-LED array fabrication suitable for future single photon lithography[J].Nanotechnology,2015,26(18):185302.
[20]CHALLA P K,KARTANAS T,CHARMET J,et al.Microfluidic devices fabricated using fast wafer-scale LED-lithography patterning[J].Biomicrofluidics,2017,11(1):014113.
[21]LIN H Y,SHER C W,HSIEH D H,et al.Optical cross-talk reduction in a quantum-dot-based full-color micro-light-emitting-diode display by a lithographic-fabricated photoresist mold[J].Photonics Research,2017,5(5):411-416.
[22]MASUDA H,FUKUDA K.Ordered metal nanohole arrays made by a two-step replication of honeycomb structures of anodic alumina[J].Science,1995,268(5216):1466.
[23]LEE W,PARK S J.Porous anodic aluminum oxide:anodization and templated synthesis of functional nanostructures[J].Chemical reviews,2014,114(15):7487-7556.
[24]MAc FARLANE R J,LEE B,HILL H D,et al.Assembly and organization processes in DNA-directed colloidal crystallization[J].Proceedings of the National Academy of Sciences,2009,106(26):10493-10498.
[25]YAN P,FEI G T,SU Y,et al.Anti-counterfeiting of one-dimensional alumina photonic crystal by creating defects[J].Electrochemical and Solid-State Letters,2011,15(3):K23-K26.
[26]YAO J,LIU Z,LIU Y,et al.Optical negative refraction in bulk metamaterials of nanowires[J].Science,2008,321(5891):930.
[27]ZHOU L,TAN Y,WANG J,et al.3-D self-assembly of aluminium nanoparticles for plasmon-enhanced solar desalination[J].Nature Photonics,2016,10(6):393-398.
[28]CHOU S Y,KRAUSS P R,RENSTROM P J.Imprint of sub-25nm vias and trenches in polymers[J].Applied Physics Letters,1995,67(21):3114-3116.
[29]KOOY N,MOHAMED K,PIN L T,et al.A review of roll-to-roll nanoimprint lithography[J].Nanoscale Research Letters,2014,9(1):320.
[30]MA P,XU Z,WANG M,et al.Fast fabrication of Ti O2hard stamps for nanoimprint lithography[J].Materials Research Bulletin,2017,90:253-259.
[31]JAIN A,SPANN A,COCHRANE A,et al.Fluid flow in UV nanoimprint lithography with patterned templates[J].Microelectronic Engineering,2017,173:62-70.
[32]ZHANG L,ZHANG J,YUAN D,et al.Electrochemical nanoimprint lithography directly on n-type crystalline silicon(111)wafer[J].Electrochemistry Communications,2017,75:1-4.
[33]MATSUI S,HIROSHIMA H,HIRAI Y,et al.Innovative UV nanoimprint lithography using a condensable alternative chlorofluorocarbon atmosphere[J].Microelectronic Engineering,2015,133(C):134-155.
[34]JI R,HORNUNG M,VERSCHUUREN M A,et al.UV enhanced substrate conformal imprint lithography(UV-SCIL)technique for photonic crystals patterning in LED manufacturing[J].Microelectronic Engineering,2010,87(5):963-967.
[35]TALIP N B A,HAYASHI T,TANIGUCHI J,et al.Lifetime amelioration of antireflection structure molds by means of partial-filling ultraviolet nanoimprint lithography[J].Microelectronic Engineering,2015,141:81-86.
[36]MOONEN P F,VRATZOV B,SMAAL W T T,et al.Flexible thinfilm transistors using multistep UV nanoimprint lithography[J].Organic Electronics,2012,13(12):3004-3013.
[37]LIU Ch,JIN L D,YE A P.Progress in and prospect of microsphere optical nanoscopy[J].Laser&Optoelectronics Progress,2016,53(7):70003(in Chinese).
[38]YANG H,TROUILLON R,HUSZKA G,et al.Super-resolution imaging of a dielectric microsphere is governed by the waist of its photonic nanojet[J].Nano Letters,2016,16(8):4862-4870.
[39]UPPUTURI P K,KRISNAN M S,MOOTHANCHERY M,et al.Photonic nanojet engineering to achieve super-resolution in photoacoustic microscopy:a simulation study[J].Proceedings of the SPIE,2017,10064:100644S
[40]PISCO M,GALEOTTI F,QUERO G,et al.Nanosphere lithography for optical fiber tip nanoprobes[J].Light:Science&Applications,2017,6(5):e16229.
[41]JI D,LI T,FUCHS H.Nanosphere lithography for sub-10nm nanogap electrodes[J].Advanced Electronic Materials,2017,3(1):1600348.
[42]CHEN Y F,XU CH,LU B R.A Super resolution nanolithography method using photon nano jetting to cause focusing effect:China,201410722282.6[P].2015-04-01.
[43]JASCHKE M,BUTT H J.Deposition of organic material by the tip of a scanning force microscope[J].Langmuir,1995,11(4):1061-1064.
[44]GARCIA R,KNOLL A W,RIEDO E.Advanced scanning probe lithography[J].Nature Nanotechnology,2014,9(8):577-587.