多弧离子镀的工艺参数对TiAlN膜层性能的影响
|
摘要
研究了直流偏压、脉冲偏压、占空比、弧电流和氮气流量对多弧离子镀制备TiAlN涂层结合力和硬度的影响。结果表明,影响TiAlN涂层结合力的因素按重要性排序依次为脉冲偏压、占空比、弧电流、氮气流量、直流偏压。影响TiAlN涂层显微硬度的因素按重要性排序依次为占空比、脉冲偏压、弧电流、氮气流量和直流偏压。
The influences of five different factors such as DC bias, pulse bias, duty ratio, arc current, nitrogen gas flow on the bonding force and hardness of the TiAlN coating prepared by multi-arc ion plating were studied. The results indicate that the factors affecting the bonding force of TiAlN coating according to descending order is pulsed bias, duty ratio, arc current,nitrogen gas flow and DC bias. Meanwhile, the factors affecting the microhardness of TiAlN according to descending order is duty ratio, pulse bias, arc current, nitrogen gas flow and DC bias.
The influences of five different factors such as DC bias, pulse bias, duty ratio, arc current, nitrogen gas flow on the bonding force and hardness of the TiAlN coating prepared by multi-arc ion plating were studied. The results indicate that the factors affecting the bonding force of TiAlN coating according to descending order is pulsed bias, duty ratio, arc current,nitrogen gas flow and DC bias. Meanwhile, the factors affecting the microhardness of TiAlN according to descending order is duty ratio, pulse bias, arc current, nitrogen gas flow and DC bias.
引文
[1]Gong Manfeng,Chen Jian,Deng Xin,et al.Sliding wear behavior of TiAlN and AlCrN coatings on a unique cemented carbide substrate[J].International Journal of Refractory Metals&Hard Materials,2017,69:209-214.
[2]Zheng Liyun,Zhao Lixin,Xiong Weihao.Tribological properties of TiAlN coated cermets[J].Rare Metals,2009(1):57-63.
[3]Vettive S L,Jegan R,Vignesh J,et al.Surface characteristics and wear depth profile of the TiN,TiAlN and AlCrN coated stainless steel in dry sliding wear condition[J].Surfaces and Interfaces,2017(6)1-10.
[4]刘爱华.PVD氮化物涂层的高温摩擦磨损特性及机理研究[D].青岛:山东大学,2012.
[5]Knotek O,Bohmer M,Leyendecker T.On structure and properties of sputtered Ti and Al based hard compound films[J].Vac.Sci.Technol,1986(A4):2695-2700.
[6]Wan X S,Zhao S S,Yang Y,et al.Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-Ncoatings deposited by arc ion plating[J].Surface&Coatings Technology,2010(204):1800-1810.
[7]张而耕,吴雁.现代PVD表面工程技术及应用[M].北京:科学出版社,2016.
[8]邓乐乐,侯波,何宇廷,等.工艺参数对多弧离子镀沉积铜薄膜微结构及性能的影响[J].功能材料,2015,44(4):127-132.
[9]Devia D M,Restrepo P E,Arango P J,et al.TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage[J].Applied Surface Science,2011,257:6181-6185.
[10]Wei Yongqiang,Gong Chunzhi.Effects of pulsed bias duty ratio on micro-structure and mechanical properties of TiN/TiAlN multilayer coatings[J].Applied Surface Science,2011,257:7881-7886.
[11]魏永强,张艳霞,文振华,等.脉冲偏压占空比对TiN/TiAlN多层薄膜微观结构和硬度的影响[J].表面技术,2014(1):1-7.
[12]Wang Lei,Zhang shihong,Chen Zhong,et al.Influence of deposition parameters on hard Cr-Al-N coatings deposited by multi-arc ion plating[J].Applied Surface Science,2012,258:3629-3636.
[13]Cai Fei,Zhang Shihong,Li Jinlong,et al.Effect of nitrogen partial pressure on Al-Ti-N films deposited by arc ion plating[J].Applied Surface Science,2011,258:1819-1825.
[14]王萌萌,黄美东,潘玉鹏,等.脉冲偏压对多弧离子镀TiAlN薄膜的成分和结构的影响研究[J].真空,2015,25(1):34-38.
[15]周军,李涛,樊湘芳,等.占空比对多弧离子镀TiAlN涂层表面形貌和性能的影响[J].粉末冶金材料科学与工程,2018,23(3):328-334.
[16]程玺儒.非平衡磁控溅射离子镀制备TiAlN薄膜及其性能研究[D].成都:西华大学,2017.
[17]张会霞,刘崇林.基于正交实验Ti0.33Al0.67N膜层制备工艺研究[J].热加工工艺,2013,42(14):113-115.
[18]卢龙,刘崇林,张会霞,等.正交实验在多弧离子镀工艺中的应用研究[J].铸造技术,2014(3):511-514.
[2]Zheng Liyun,Zhao Lixin,Xiong Weihao.Tribological properties of TiAlN coated cermets[J].Rare Metals,2009(1):57-63.
[3]Vettive S L,Jegan R,Vignesh J,et al.Surface characteristics and wear depth profile of the TiN,TiAlN and AlCrN coated stainless steel in dry sliding wear condition[J].Surfaces and Interfaces,2017(6)1-10.
[4]刘爱华.PVD氮化物涂层的高温摩擦磨损特性及机理研究[D].青岛:山东大学,2012.
[5]Knotek O,Bohmer M,Leyendecker T.On structure and properties of sputtered Ti and Al based hard compound films[J].Vac.Sci.Technol,1986(A4):2695-2700.
[6]Wan X S,Zhao S S,Yang Y,et al.Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-Ncoatings deposited by arc ion plating[J].Surface&Coatings Technology,2010(204):1800-1810.
[7]张而耕,吴雁.现代PVD表面工程技术及应用[M].北京:科学出版社,2016.
[8]邓乐乐,侯波,何宇廷,等.工艺参数对多弧离子镀沉积铜薄膜微结构及性能的影响[J].功能材料,2015,44(4):127-132.
[9]Devia D M,Restrepo P E,Arango P J,et al.TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage[J].Applied Surface Science,2011,257:6181-6185.
[10]Wei Yongqiang,Gong Chunzhi.Effects of pulsed bias duty ratio on micro-structure and mechanical properties of TiN/TiAlN multilayer coatings[J].Applied Surface Science,2011,257:7881-7886.
[11]魏永强,张艳霞,文振华,等.脉冲偏压占空比对TiN/TiAlN多层薄膜微观结构和硬度的影响[J].表面技术,2014(1):1-7.
[12]Wang Lei,Zhang shihong,Chen Zhong,et al.Influence of deposition parameters on hard Cr-Al-N coatings deposited by multi-arc ion plating[J].Applied Surface Science,2012,258:3629-3636.
[13]Cai Fei,Zhang Shihong,Li Jinlong,et al.Effect of nitrogen partial pressure on Al-Ti-N films deposited by arc ion plating[J].Applied Surface Science,2011,258:1819-1825.
[14]王萌萌,黄美东,潘玉鹏,等.脉冲偏压对多弧离子镀TiAlN薄膜的成分和结构的影响研究[J].真空,2015,25(1):34-38.
[15]周军,李涛,樊湘芳,等.占空比对多弧离子镀TiAlN涂层表面形貌和性能的影响[J].粉末冶金材料科学与工程,2018,23(3):328-334.
[16]程玺儒.非平衡磁控溅射离子镀制备TiAlN薄膜及其性能研究[D].成都:西华大学,2017.
[17]张会霞,刘崇林.基于正交实验Ti0.33Al0.67N膜层制备工艺研究[J].热加工工艺,2013,42(14):113-115.
[18]卢龙,刘崇林,张会霞,等.正交实验在多弧离子镀工艺中的应用研究[J].铸造技术,2014(3):511-514.