等离子体烧蚀引起光束调制的功率谱密度计算
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摘要
采用电子束蒸发制备了1064 nm高反膜样品,并通过激光预处理系统对样品表面的部分区域进行了光栅式扫描,形成等离子体烧蚀区域。搭建了光束质量测试系统,记录在样品表面有无等离子体烧蚀两种情况下的反射光束的空间强度分布。采用经典周期图法,分别计算了各自的强度分布的功率谱密度。结果表明,等离子体烧蚀导致的传输光束峰值强度对应于功率谱密度曲线中心峰值强度,而周期性起伏则体现在相应频率下的峰值。因此功率谱密度曲线可以作为表征光学元件对传输光束调制的手段。
The 1064 nm high reflectors are prepared by e-beam deposition, and via laser conditioning with raster scanning on certain areas, plasma scalds are formed on the surface. The beam quality testing system is built. The spatial intensity distribution of laser beam reflected by the samples with or without plasma scalds is recorded. The power spectral density of laser beam is calculated with periodogram method. The results indicate that the peak of the power spectral density corresponds to the peak intensity of the transmitted beam which is modulated by plasma scalds. Therefore the modulation of transmitted laser beam can be analyzed and characterized using the power spectral density calculated from the distribution of the laser beam.
The 1064 nm high reflectors are prepared by e-beam deposition, and via laser conditioning with raster scanning on certain areas, plasma scalds are formed on the surface. The beam quality testing system is built. The spatial intensity distribution of laser beam reflected by the samples with or without plasma scalds is recorded. The power spectral density of laser beam is calculated with periodogram method. The results indicate that the peak of the power spectral density corresponds to the peak intensity of the transmitted beam which is modulated by plasma scalds. Therefore the modulation of transmitted laser beam can be analyzed and characterized using the power spectral density calculated from the distribution of the laser beam.
引文
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11 Chen Weixiao,Li Dawei,Liu Xiaofeng,et al..Influence of plasma scalds on laser-beam distoration for 1064nm high reflectivity laser film surface[J].Acta Optica Sinica,2013,33(3):0331003.陈惟肖,李大伟,刘晓凤,等.基频反射膜元件表面等离子体烧蚀对传输光束畸变的影响[J].光学学报,2013,33(3):0331003.
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13 Zhang R Z,Cai B W,Yang C L,et al..Calculation of the power spectral density of the wavefront[C].SPIE,2000,4231:295-300.
14 Lawson J K,Wolfe C R,Manes K R,et al..Specification of optical components using the power spectral density function[C].SPIE,1995,2536:38-50.
15 Lawson J,Aikens D,Wang D,et al..Optical specifications-their role in the national ignition facility[J].OSA Technical Digest,2000:OMC2.
16 Lawson J K,Aikens D M,English Jr R E,et al..Power spectral density specifications for high-power laser systems[C].SPIE,1996,2775:345-356.
17 Liu Xiaofeng,Li Dawei,Li Xiao,et al..1064 nm laser conditioning effect of Hf O2/Si O2high reflectors deposited by E-beam[J].Chinese J lasers,2009,36(6):1545-1549.刘晓凤,李大伟,李笑,等.电子束蒸发制备Hf O2/Si O2高反膜的1064 nm激光预处理效应[J].中国激光,2009,36(6):1545-1549.
18 Liu X,Li D,Zhao Y A,et al..Automated damage diagnostic system for laser damage threshold tests[J].Chin Opt Lett,2010,8(4):407-410.
19 Liu X F,Zhao Y A,Gao Y Q,et al..Investigations on the catastrophic damage in multilayer dielectric films[J].Applied Optics,2013,52(10):2194-2199.
2 Kozlowski M R,Thomas I M.Future-trends in optical coatings for high-power laser applications[C].SPIE,1994,2262:54-59.
3 Chang Yanhe,Jin Chunshui,Li Chun,et al..Laser induced damage of fluoride coatings at 193 nm[J].Chinese J Laser,2013,40(7):0707001.常艳贺,金春水,李春,等,193 nm氟化物薄膜的激光诱导损伤[J].中国激光,2013,40(7):0707001.
4 Wolfe C,Kozlowski M,Campbell J,et al..Laser conditioning of optical thin films[C].SPIE,1989,1438:360-375.
5 Kozlowski M R,Wolfe C R,Staggs M C et al..Large area laser conditioning of dielectric thin film mirrors[C].SPIE,1989,1438:376-392.
6 Yang Lihong,Wang Tao,Su Junhong,et al..Influnence of laser conditioning on the damage properties of Hf O2thin film[J].Acta Optica Sinica,2013,33(12):1231001.杨利红,王涛,苏俊宏,等.激光预处理对Hf O2薄膜损伤特性的影响[J].光学学报,2013,33(12):1231001.
7 Bercegol H.What is laser conditioning:A review focused on dielectric multilayers[C].SPIE,1998,3578:421-426.
8 Taniguchi J,Le Baron N E,Howe J,et al..Functional damage threshold of Hafnia/Silica coating designs for the NIF laser[C].SPIE,2001,4347:109-117.
9 Genin F Y,Stolz C J,Kozlowski M R.Growth of laser-induced damage during repetitive illumination of Hf O2-Si O2multilayer mirror and polarizer coatings[C].SPIE,1997,2966:273-282.
10 Liu X F,Zhao Y A,Li D W,et al..Characteristics of plasma scalds in multilayer dielectric films[J].Applied Optics,2011,50(21):4226-4231.
11 Chen Weixiao,Li Dawei,Liu Xiaofeng,et al..Influence of plasma scalds on laser-beam distoration for 1064nm high reflectivity laser film surface[J].Acta Optica Sinica,2013,33(3):0331003.陈惟肖,李大伟,刘晓凤,等.基频反射膜元件表面等离子体烧蚀对传输光束畸变的影响[J].光学学报,2013,33(3):0331003.
12 Schmidt J R,Runkel M J,Martin K E,et al..Scattering-induced downstream beam modulation by plasma scalded mirrors[C].SPIE,2008,6720:H7201.
13 Zhang R Z,Cai B W,Yang C L,et al..Calculation of the power spectral density of the wavefront[C].SPIE,2000,4231:295-300.
14 Lawson J K,Wolfe C R,Manes K R,et al..Specification of optical components using the power spectral density function[C].SPIE,1995,2536:38-50.
15 Lawson J,Aikens D,Wang D,et al..Optical specifications-their role in the national ignition facility[J].OSA Technical Digest,2000:OMC2.
16 Lawson J K,Aikens D M,English Jr R E,et al..Power spectral density specifications for high-power laser systems[C].SPIE,1996,2775:345-356.
17 Liu Xiaofeng,Li Dawei,Li Xiao,et al..1064 nm laser conditioning effect of Hf O2/Si O2high reflectors deposited by E-beam[J].Chinese J lasers,2009,36(6):1545-1549.刘晓凤,李大伟,李笑,等.电子束蒸发制备Hf O2/Si O2高反膜的1064 nm激光预处理效应[J].中国激光,2009,36(6):1545-1549.
18 Liu X,Li D,Zhao Y A,et al..Automated damage diagnostic system for laser damage threshold tests[J].Chin Opt Lett,2010,8(4):407-410.
19 Liu X F,Zhao Y A,Gao Y Q,et al..Investigations on the catastrophic damage in multilayer dielectric films[J].Applied Optics,2013,52(10):2194-2199.