聚酰亚胺/氧化铝复合薄膜耐电晕性能研究
详细信息    查看全文 | 推荐本文 |
  • 英文篇名:Corona Resistance of PI/Al_2O_3 Composite Film
  • 作者:石慧 ; 王静雅 ; 孙宇宁 ; 于钢 ; 刘立柱
  • 英文作者:SHI Hui;WANG Jingya;SUN Yuning;YU Gang;LIU Lizhu;Sub-institute of Standard Information, China National Institute of Standardization;School of Material Science and Engineering,Harbin University of Science and Technology;
  • 关键词:聚酰亚胺 ; 纳米氧化铝 ; 三层复合薄膜 ; 耐电晕性能
  • 英文关键词:polyimide;;nano-Al_2O_3;;tri-layer composite film;;corona resistance
  • 中文刊名:JYCT
  • 英文刊名:Insulating Materials
  • 机构:中国标准化研究院标准情报研究所;哈尔滨理工大学材料科学与工程学院;
  • 出版日期:2018-11-22 17:02
  • 出版单位:绝缘材料
  • 年:2018
  • 期:v.51
  • 基金:国家重点研发计划“国家质量基础的共性技术研究与应用”专项(NQI专项)(2016YFF0202900)
  • 语种:中文;
  • 页:JYCT201811010
  • 页数:5
  • CN:11
  • ISSN:45-1287/TM
  • 分类号:58-61+69
摘要
采用逐层流延铺膜及热亚胺化法制备了掺杂层纳米氧化铝含量不同的聚酰亚胺/氧化铝(PI/Al_2O_3)三层复合薄膜。通过透射电子显微镜、X射线衍射仪对复合薄膜进行表征,并对复合薄膜的力学性能、热稳定性及耐电晕性能进行测试。结果表明:复合薄膜具有明显的三层结构,掺杂层中纳米Al_2O_3颗粒分散均匀,纳米Al_2O_3的加入会降低PI基体的排列有序度。加入纳米Al_2O_3颗粒后PI/Al_2O_3三层复合薄膜的拉伸强度和断裂伸长率降低,热稳定性和耐电晕性能提高。当掺杂层无机含量为16%时,PI/Al_2O_3三层复合薄膜的耐电晕时间比纯PI薄膜提高了48倍。
        Tri-layer polyimide(PI)/Al_2O_3 composite films with different doping content of Al_2O_3 in doped-layer were prepared by layer-by-layer tape casting method and thermal imidization. The films were characterized by transmission electron microscope and X-ray diffractometer, and then their mechanical properties, thermal stability, and corona resistance were tested. The results show that the composite films have obvious tri-layer structures and the nano-Al_2O_3 particles in the doped-layer well disperse. After adding nano-Al_2O_3 particles, the degree of order of PI matrix reduces, the tensile strength and elongation at break of the PI/Al_2O_3 composite films decrease, and the thermal stability and corona resistance increase.When the content of nano-Al_2O_3 particles in the doped-layer is 16%, the corona resistance time of the tri-layer PI/Al_2O_3 composite films is 48 times longer than that of pure PI film.
引文
[1]丁孟贤.聚酰亚胺化学、结构与性能的关系及材料[M].北京:科学出版社,2006,25-32.
    [2]于娣.变频调速的应用研究[D].北京:华北电力大学,2011:11-12.
    [3] GAO Q, ASHER G M, SUMNER M, et al. Position estimation of AC machines over a wide frequency range based on space vector PWM excitation[J]. IEEE Transactions on Industry Applications,2007,43(4):1001-1011.
    [4]刘亚强,李朋.耐电晕型聚酰亚胺无机纳米杂化薄膜的研究进展[J].商丘师范学院学报,2017,33(6):23-26.
    [5]刘洋,吴广宁,高国强,等.方波脉冲下纳米氧化铝掺杂对聚酰亚胺表面放电特性影响[J].中国电机工程学报,2016,36(4):1141-1147.
    [6]田付强,彭潇.耐电晕耐电痕化绝缘材料研究进展[J].电工技术学报,2017,32(16):3-13.
    [7]冯宇,殷景华,陈明华,等.聚酰亚胺/TiO2纳米杂化薄膜耐电晕性能的研究[J].中国电机工程学报,2013,33(22):142-147.
    [8] SHI H, LIU L, WENG L, et al. Preparation and characterization of polyimide/Al2O3nanocomposite film with good corona resistance[J]. Polymer Composites,2014,274(3):28557-28565.
    [9] LIU L, SHI H, WENG L, et al. The effects of particle size on the morphology and properties of polyimide/nano-Al2O3composite films[J]. Polymers&Polymer Composites,2014,22(2):117-121.
    [10] FENG Y, YIN J, CHEM M, et al. Influence of interface on the electrical properties of polyimide/TiO2composite films[J]. IEEE Transactions on Dielectrics and Electrical Insulation,2014,21(4):1501-1508.
    [11]熊海安,梅金硕,殷景华. TiO2和SiO2纳米掺杂聚酰亚胺复合薄膜的电学性能研究[J].绝缘材料,2017,50(5):30-34.
    [12]刘俊,何明鹏,陈昊,等.二氧化硅/聚酰亚胺纳米复合薄膜的制备与性能研究[J].绝缘材料,2009,42(6):1-3,8.
    [13]孔宇楠,殷景华,铁雯鹭,等.聚酰亚胺/二氧化钛纳米复合薄膜制备与耐电晕性[J].无机材料学报,2014,29(1):98-102.
    [14]廖波,张步峰,王文进,等.纳米氧化硅改性聚酰亚胺薄膜的制备与性能研究[J].绝缘材料,2014,47(1):37-39.
    [15]范勇,谭及兰,谢艳红,等.纳米Zr-Ti-Al复合氧化物杂化PI薄膜的耐电晕性[J].哈尔滨理工大学学报,2014,19(4):59-62.
    [16] KATZ M, THEIS R J. New high temperature polyimide insulation for partial discharge resistance in harsh environments[J]. IEEE Electrical Insulation Magazine,1997,13(4):24-30.
    [17]张沛红.无机纳米-聚酰亚胺复合薄膜介电性及耐电晕老化机理研究[D].哈尔滨:哈尔滨理工大学,2006.
    [18]王志强,殷景华,夏旭,等.三明治结构聚酰亚胺/SiO2纳米复合薄膜电学性能研究[J].绝缘材料,2017,50(3):23-27.
    [19]贺洪菊,刘立柱,翁凌.亚胺化工艺对聚酰亚胺/纳米Al2O3三层复合薄膜耐电晕性能的影响[J].功能材料,2017,48(6):6154-6157.
    [20]刘洋,吴广宁,高国强.纳米氧化铝掺杂对高速动车组牵引电机绝缘性能的影响[J].铁道学报,2016,38(3):66-71.
    [21]马莉莉,马涛,王宝祥,等.聚酰亚胺/改性六方氮化硼复合薄膜的耐电晕性能研究[J].绝缘材料,2018,51(4):28-31.
    [22]石慧.耐电晕纳米Al2O3聚酰亚胺复合薄膜的制备与性能研究[D].哈尔滨:哈尔滨理工大学,2013.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700