光刻机六自由度工件台控制系统设计
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摘要
光刻机是IC制造业的核心装备,而工件台掩膜台系统又是工件台系统中运动控制的核心组成部分,具有扫描、上下片、定位、调平调焦等一些功能。其运动控制的性能对光刻机的工作效率及精度都有着非常大的影响。近年来光刻机技术发展迅速,对工件台掩膜台系统的性能也越来越高,这就对工件台控制系统的设计提出了很高的要求。
而工件台系统因为具有6自由度,以及其高精度快响应的要求,六自由度之间的耦合作用就对工件台系统的性能带来了很大的影响,因此,需要进行首先解耦设计,才能对其进行进一步的控制。
首先,本文针对工件台系统的耦合情况,着手研究耦合的概念,判断耦合程度来确定是否需要对系统进行解耦设计,若需要设计应该对系统进行怎样的设计来消除耦合。在判断完耦合程度之后,研究了一些基于古典控制理论、现代控制理论、智能控制理论的解耦方法,比较了其优缺点、适用范围,选择合适于工件台系统解耦设计的状态反馈解耦方法。
其次,对工件台系统进行了建模,先通过研究工件台所需要完成的功能,和运动特点,建立一个适当的机械模型,并选择了合适的电机来作为工件台运动部分的驱动元件。之后研究了电机的位移和工件台质心的位移之间的关系,来建立方程组,通过分析音圈电机的模型,将整个系统的位移关系、力学关系、电磁力等关系联立起来,建立了控制系统模型。
然后,对系统进行了解耦设计,将六自由度相互耦合的MIMO系统,转化为输入和输出一一对应的SISO系统,然后依据工程上应用最为广泛的三闭环系统的设计方法,对SISO系统进行了控制,使其达到了较好的性能指标。对于系统的机械谐振,设计了陷波器,来消除其带来的不利影响。通过仿真验证了设计的结果。
最后,对工件台的运动轨迹进行了规划,给出了整个硅片的曝光过程。
Lithography is the core of IC manufacturing equipment, mask platform workpiece table system is the core motion control system components, with the features such as scanning, the upper and lower pieces, positioning, leveling and focusing.The driver of this motion control board belongs to the driver module of character device, and its driver system realizes through standard VxWorks I/O system. The motion control performance of lithography has a very big impact.on efficiency and accuracy. Lithography technology is developing rapidly in recent years, the workpiece table mask platform sets are increasingly high performance of the system, which controls the design of the workpiece table made very high demands.
The workpiece table system with 6 degrees of freedom as well as its quick response to the requirements of high accuracy, the coupling between the six degrees of freedom to the performance of the workpiece table system is a big impact, therefore, the need for the first decoupling design in order to further its control.
Firstly, for the coupling of the workpiece table system,After the judging the degree of coupling, the study of some based on classical control theory, modern control theory, intelligent decoupling control theory, to compare their advantages and disadvantages, scope.choose the State feedback decoupling method which suits for the workpiece table system.
Secondly, the workpiece table system is modeled, first by studying the parts needed to complete the function table, and movement characteristics, the establishment of an appropriate mechanical model, and select the appropriate units of motor sport as part of the workpiece drive components.Then studying the displacement relationship of the motor and the centroid of the workpiece table to establish the equations.By simultaneous up the Displacement relationship, mechanical relationship, electromagnetic force relationship, etc. Then establish the control model.
Then, design the decoupling of system,changing the six degrees of freedom coupled MIMO system into one-to-one SISO system.Then choose three closed-loop method which used most widely in engineering to control the SISO system,to achieve a well performance. Notch filter designed to eliminate the adverse effects of mechanical resonance.Design is verified by simulation results.
Finally, the trajectory of the workpiece station was planned, given the exposure of the wafer process.
而工件台系统因为具有6自由度,以及其高精度快响应的要求,六自由度之间的耦合作用就对工件台系统的性能带来了很大的影响,因此,需要进行首先解耦设计,才能对其进行进一步的控制。
首先,本文针对工件台系统的耦合情况,着手研究耦合的概念,判断耦合程度来确定是否需要对系统进行解耦设计,若需要设计应该对系统进行怎样的设计来消除耦合。在判断完耦合程度之后,研究了一些基于古典控制理论、现代控制理论、智能控制理论的解耦方法,比较了其优缺点、适用范围,选择合适于工件台系统解耦设计的状态反馈解耦方法。
其次,对工件台系统进行了建模,先通过研究工件台所需要完成的功能,和运动特点,建立一个适当的机械模型,并选择了合适的电机来作为工件台运动部分的驱动元件。之后研究了电机的位移和工件台质心的位移之间的关系,来建立方程组,通过分析音圈电机的模型,将整个系统的位移关系、力学关系、电磁力等关系联立起来,建立了控制系统模型。
然后,对系统进行了解耦设计,将六自由度相互耦合的MIMO系统,转化为输入和输出一一对应的SISO系统,然后依据工程上应用最为广泛的三闭环系统的设计方法,对SISO系统进行了控制,使其达到了较好的性能指标。对于系统的机械谐振,设计了陷波器,来消除其带来的不利影响。通过仿真验证了设计的结果。
最后,对工件台的运动轨迹进行了规划,给出了整个硅片的曝光过程。
Lithography is the core of IC manufacturing equipment, mask platform workpiece table system is the core motion control system components, with the features such as scanning, the upper and lower pieces, positioning, leveling and focusing.The driver of this motion control board belongs to the driver module of character device, and its driver system realizes through standard VxWorks I/O system. The motion control performance of lithography has a very big impact.on efficiency and accuracy. Lithography technology is developing rapidly in recent years, the workpiece table mask platform sets are increasingly high performance of the system, which controls the design of the workpiece table made very high demands.
The workpiece table system with 6 degrees of freedom as well as its quick response to the requirements of high accuracy, the coupling between the six degrees of freedom to the performance of the workpiece table system is a big impact, therefore, the need for the first decoupling design in order to further its control.
Firstly, for the coupling of the workpiece table system,After the judging the degree of coupling, the study of some based on classical control theory, modern control theory, intelligent decoupling control theory, to compare their advantages and disadvantages, scope.choose the State feedback decoupling method which suits for the workpiece table system.
Secondly, the workpiece table system is modeled, first by studying the parts needed to complete the function table, and movement characteristics, the establishment of an appropriate mechanical model, and select the appropriate units of motor sport as part of the workpiece drive components.Then studying the displacement relationship of the motor and the centroid of the workpiece table to establish the equations.By simultaneous up the Displacement relationship, mechanical relationship, electromagnetic force relationship, etc. Then establish the control model.
Then, design the decoupling of system,changing the six degrees of freedom coupled MIMO system into one-to-one SISO system.Then choose three closed-loop method which used most widely in engineering to control the SISO system,to achieve a well performance. Notch filter designed to eliminate the adverse effects of mechanical resonance.Design is verified by simulation results.
Finally, the trajectory of the workpiece station was planned, given the exposure of the wafer process.
引文
1汪劲松,朱煜.我国“十五”期间IC制造装备的发展战略研究[J].机器人技术与应用.2002,(2):5~6
2曹来发,朱正堂.中国集成电路现状[J].科技情报开发与经济.2004年14卷.第2期:191
3朱贻玮.我国IC芯片制造线目前状况分析[J].半导体行业.2010.2:11
4董吉洪,田兴志,李志来,王明哲. 100nm步进扫描投影光刻机工件台、掩模台的发展[J].光机电信息.2004,(5):20~21
5 International technology roadmap for semiconductors 2005 edition lithograp hy[Z]. http://www.itrs.net/Links/2005ITRS/Litho2005.pdf73
6周得时.为研制我国自己的分步光刻机(DSW)而拼搏[J].电子工业专用设备1991年第3期第20卷:30~33
7 Ermst Abbe.Beitr ge Zur Theorie des Mikroskopsund der mikroskopischen Wahrnehmung [J].Archivfur Mikroskopische Anatomie 9, 1873.413-468.
8李艳秋.浸没式ArF光刻最新进展[J].电子工业专用设备.2006.5:27~28
9 F.M.Schellenberg.Resolution Enhancement Technology: The past, the present, and Extension for the Future[C].Proc.SPIE,2004,Vol.5377:1-20.
10 J.Mulkens et al.Benefits and limitations of immersion lithography,Burn-Jeng Lin; Ed,JM3-Journal of Microlithography[J].Microfabrication and Microsystems,2003,03(01):104-114.
11 TWINSCAN NXT:1950i Step-and-Scan system.[EB/OL]. http://www.asml.com/asml/show.do?ctx=6720&rid=36951
12王春.国产首台先进封装光刻机投入使用[J]中国技术市场报.2010.8.6:第001版
13光刻技术[J].HUDONG BAIKE. http://www.hudong.com/wiki/%E5%85%89%E5%88%BB%E6%8A%80%E6%9C%AF
14袁琼雁,王向朝.国际主流光刻机研发的最新进展[J]光刻技术.2007.1:51~63
15陈学东,何学明,叶燚玺.超精密气浮定位工作台技术[M].武汉.华中科技大学出版社.2008.2
16张晓峰.大行程超精密工作台关键技术研究[D]天津大学.2008:2~4
17 H.Shinno, H.Yoshioka, K.Taniguchi A Newly Developed Linear Motor-Driven Aerostatic X-Y Planar Motion Table System for Nano-Machining CIRP Annals Manufacturing Technology, 2007, 56(1):369~372
18李国勇.过程控制系统.[M]电子工业出版社.2009.5.1:第9章
19王树青.工业过程控制工程[M].北京.化学工业出版社.2002.12:第9章
20 Jones M,Levi E,Iqbal A. Vector control of a five-phase series-connected two-motor drive using synchronous current controllers [J] .Electric Power Components and Systems, 2005,33, 33 (4) :411-430 .
21 E.H.Bristol,On a New Measuer of Interaction for Mu1tiariable Process Control.IEEE.Trans.Autornatie Control.Vo1.AC-11, No.1,1966.133
22 M.F.Wither, T.J.Maevoy. Interaeting Control Systems: Steady State and Dynamic[J]Measurement of Interaetion·ISA.Trans,Vol.16,No.3,1977.36
23纪兴权,徐进学,王丽.控制系统间的耦合分析[J].沈阳化工学院学报.1996.9:188~193
24申欲晓,谢克明.多变量系统耦合度分析.[J]电力学报.1997.12.2:8~11
25 H H Rosebrok.Computer-Aided Designed of Multivariable control systems proc.second Advanced control systems.1969
26隆媛媛.多变量耦合系统的解耦控制设计和仿真[D]广西师范大学2010.4
27王启志.工程解耦控制系统的研究.[D]厦门.华侨大学.2002.4:8~9.
28 Fossard.A.J“Multivariable system control”. North-Holland.New York 1977.
29 R.J.kavanagh.Multivariblee on control system syn thesis.AIEE.Trans.APPIInd., Pt11, 1958, 77(11):425一429
30张浩,陆元章.应用逆Nyquist阵列法设计CCIM调速转动系统[J]上海交通大学学报.1991.第25卷第3期
31 Rosenbroek.H.H.Computer. Aided Control System[M] Design.AeademiePress.1974
32段广仁.线性系统理论[M].2004.2:258~277
33王晓哲,李界家,吴成东.多变量系统解耦方法综述.[J].沈阳建筑工程学院学报.2004.6:143~148
34 Werbo P J.An overview of neural networks for control .[J].IEEE Control Systems,1991,13(1):40~41.
35冯恩波,俞金寿,蒋慰孙.基于神经网络技术解耦及容错解耦控制策略[J].信息与控制.1992:363~368.
36 Tsao-Tsung Ma, P–Q decoupled control schemes using fuzzy neural networksfor the unified power flow controller[J] , International Journal of Electrical Power & EnergySystems, Volume 29, Issue 10, 2007.10:748-758
37 Wood.R.K.,et al.Terminal Composition Control of aBinary Diatilation Colimn,Chem.Eng.Sci.,Vol.1973:28
38舒怀林. PID神经元网络多变量控制系统分析[J].自动化学报.1999.1.25卷1期:105~111
39 Chan K C, Lenong S S. A neural network PI controller tuner. Artif. Intell. Eng. (UK),1995,9(3):167-176
40 Ma X Loh N K. Tuning PID controllers by neural networks. In: Proc. Artificial Neural Network in Engineering Conference. St Louis: 1991.625-630
41鲍秀兰.光刻机精密气浮工件台的振动特性分析及运动控制[M].华中科技大学.2007:21~25
42 Ryan T.Ratliff. Design, Modeling, Seek control of a voice-coil motor actuatorwith nonlinear magnetic bias [J]. IEEE Transactions on Magnetics. 2005, 41:2178~2183
43王建平.刘矿陵.杨辅强.光课机隔振试验平台定位系统的轨迹规划[J]工具技术,2007年11期:66
44杨辅强,吴运新.基于遗传算法的步进式扫描光刻机路径规划[J].机械科学与技术. 2007年12月:1545~1547
45 KimW J, Trumpert.D L. High precisionmagnetic levitation stage for photolithography [J].Precision Engineering,1998, 22(3)
46穆海华,周云飞,周艳红.光刻机步进扫描运动轨迹重叠规划算法[J].机械工程学报.2010.4:122~127
2曹来发,朱正堂.中国集成电路现状[J].科技情报开发与经济.2004年14卷.第2期:191
3朱贻玮.我国IC芯片制造线目前状况分析[J].半导体行业.2010.2:11
4董吉洪,田兴志,李志来,王明哲. 100nm步进扫描投影光刻机工件台、掩模台的发展[J].光机电信息.2004,(5):20~21
5 International technology roadmap for semiconductors 2005 edition lithograp hy[Z]. http://www.itrs.net/Links/2005ITRS/Litho2005.pdf73
6周得时.为研制我国自己的分步光刻机(DSW)而拼搏[J].电子工业专用设备1991年第3期第20卷:30~33
7 Ermst Abbe.Beitr ge Zur Theorie des Mikroskopsund der mikroskopischen Wahrnehmung [J].Archivfur Mikroskopische Anatomie 9, 1873.413-468.
8李艳秋.浸没式ArF光刻最新进展[J].电子工业专用设备.2006.5:27~28
9 F.M.Schellenberg.Resolution Enhancement Technology: The past, the present, and Extension for the Future[C].Proc.SPIE,2004,Vol.5377:1-20.
10 J.Mulkens et al.Benefits and limitations of immersion lithography,Burn-Jeng Lin; Ed,JM3-Journal of Microlithography[J].Microfabrication and Microsystems,2003,03(01):104-114.
11 TWINSCAN NXT:1950i Step-and-Scan system.[EB/OL]. http://www.asml.com/asml/show.do?ctx=6720&rid=36951
12王春.国产首台先进封装光刻机投入使用[J]中国技术市场报.2010.8.6:第001版
13光刻技术[J].HUDONG BAIKE. http://www.hudong.com/wiki/%E5%85%89%E5%88%BB%E6%8A%80%E6%9C%AF
14袁琼雁,王向朝.国际主流光刻机研发的最新进展[J]光刻技术.2007.1:51~63
15陈学东,何学明,叶燚玺.超精密气浮定位工作台技术[M].武汉.华中科技大学出版社.2008.2
16张晓峰.大行程超精密工作台关键技术研究[D]天津大学.2008:2~4
17 H.Shinno, H.Yoshioka, K.Taniguchi A Newly Developed Linear Motor-Driven Aerostatic X-Y Planar Motion Table System for Nano-Machining CIRP Annals Manufacturing Technology, 2007, 56(1):369~372
18李国勇.过程控制系统.[M]电子工业出版社.2009.5.1:第9章
19王树青.工业过程控制工程[M].北京.化学工业出版社.2002.12:第9章
20 Jones M,Levi E,Iqbal A. Vector control of a five-phase series-connected two-motor drive using synchronous current controllers [J] .Electric Power Components and Systems, 2005,33, 33 (4) :411-430 .
21 E.H.Bristol,On a New Measuer of Interaction for Mu1tiariable Process Control.IEEE.Trans.Autornatie Control.Vo1.AC-11, No.1,1966.133
22 M.F.Wither, T.J.Maevoy. Interaeting Control Systems: Steady State and Dynamic[J]Measurement of Interaetion·ISA.Trans,Vol.16,No.3,1977.36
23纪兴权,徐进学,王丽.控制系统间的耦合分析[J].沈阳化工学院学报.1996.9:188~193
24申欲晓,谢克明.多变量系统耦合度分析.[J]电力学报.1997.12.2:8~11
25 H H Rosebrok.Computer-Aided Designed of Multivariable control systems proc.second Advanced control systems.1969
26隆媛媛.多变量耦合系统的解耦控制设计和仿真[D]广西师范大学2010.4
27王启志.工程解耦控制系统的研究.[D]厦门.华侨大学.2002.4:8~9.
28 Fossard.A.J“Multivariable system control”. North-Holland.New York 1977.
29 R.J.kavanagh.Multivariblee on control system syn thesis.AIEE.Trans.APPIInd., Pt11, 1958, 77(11):425一429
30张浩,陆元章.应用逆Nyquist阵列法设计CCIM调速转动系统[J]上海交通大学学报.1991.第25卷第3期
31 Rosenbroek.H.H.Computer. Aided Control System[M] Design.AeademiePress.1974
32段广仁.线性系统理论[M].2004.2:258~277
33王晓哲,李界家,吴成东.多变量系统解耦方法综述.[J].沈阳建筑工程学院学报.2004.6:143~148
34 Werbo P J.An overview of neural networks for control .[J].IEEE Control Systems,1991,13(1):40~41.
35冯恩波,俞金寿,蒋慰孙.基于神经网络技术解耦及容错解耦控制策略[J].信息与控制.1992:363~368.
36 Tsao-Tsung Ma, P–Q decoupled control schemes using fuzzy neural networksfor the unified power flow controller[J] , International Journal of Electrical Power & EnergySystems, Volume 29, Issue 10, 2007.10:748-758
37 Wood.R.K.,et al.Terminal Composition Control of aBinary Diatilation Colimn,Chem.Eng.Sci.,Vol.1973:28
38舒怀林. PID神经元网络多变量控制系统分析[J].自动化学报.1999.1.25卷1期:105~111
39 Chan K C, Lenong S S. A neural network PI controller tuner. Artif. Intell. Eng. (UK),1995,9(3):167-176
40 Ma X Loh N K. Tuning PID controllers by neural networks. In: Proc. Artificial Neural Network in Engineering Conference. St Louis: 1991.625-630
41鲍秀兰.光刻机精密气浮工件台的振动特性分析及运动控制[M].华中科技大学.2007:21~25
42 Ryan T.Ratliff. Design, Modeling, Seek control of a voice-coil motor actuatorwith nonlinear magnetic bias [J]. IEEE Transactions on Magnetics. 2005, 41:2178~2183
43王建平.刘矿陵.杨辅强.光课机隔振试验平台定位系统的轨迹规划[J]工具技术,2007年11期:66
44杨辅强,吴运新.基于遗传算法的步进式扫描光刻机路径规划[J].机械科学与技术. 2007年12月:1545~1547
45 KimW J, Trumpert.D L. High precisionmagnetic levitation stage for photolithography [J].Precision Engineering,1998, 22(3)
46穆海华,周云飞,周艳红.光刻机步进扫描运动轨迹重叠规划算法[J].机械工程学报.2010.4:122~127