微透镜阵列光刻投影系统的研究
|
摘要
微透镜阵列在光路中可以发挥二维并行的会聚、发散、准直、成像和传输变换等作用，它具有排列精度高，制作方便可靠，易于与其它平面器件耦合等优点，是一种重要的微小光学器件。它顺应了光学元件微小化和阵列化的趋势，在光刻、光纤通信、光学信息处理等领域有着广阔的应用前景。
本文首先从理论和实验两方面入手，较系统全面地研究了折射型微透镜阵列的形成原理和制作工艺。在光刻胶熔融法形成微透镜阵列的理论基础上，研究和简化了匀胶层厚度公式。针对光刻胶熔融法中的一些不足，发展了光刻胶的最佳熔融条件，探讨了熔融光刻胶与石英基片的接触角对微透镜阵列的表面面形形成的影响。对最佳接触角进行了理论分析和实验探讨，从而较好地指导了微透镜阵列的制作，获得了质量较高的光刻胶微透镜阵列。由于光刻胶的透光性能和抗磨损性能都远远逊色于石英基片，因此我们用反应离子束刻蚀法，将光刻胶上的微透镜面形转移到石英基片上来，有效地改善了微透镜阵列的透光质量。
接着对折射型微透镜阵列光学参数的测量进行了讨论，利用简单实用的装置测得所制作的微透镜阵列的基本光学参数。在几何光学理论基础上，分析了微透镜阵列的光学性质，得到了焦距及相关主面位置的计算公式。用这些公式计算的系统参数与实际测量结果吻合得较好。
本文主要对微透镜阵列组合形成光刻投影系统进行了较为全面深入的研究。从理论上和实验上系统地研究了微透镜阵列组的综合成像，建立并初步完善了一套利用微透镜阵列的组合作为光刻物镜头，进行投影光刻的光学系统。介绍了光刻投影系统的组合集成，详细分析了该系统的成像特点及光学性能。最后对这种光刻投影系统进行了像质评价。与传统的近贴式投影光刻相比，针对大面积光刻，特别是对那些面形有微弯曲或不平整的器件，采用这种光刻投影系统进行非接触式光刻，可以获得良好的像质和更大的工作距离。
Microlens array is an important fundamental device in Micro-Optics, for it has the functions of focusing, diverging, collimating, imaging and transforming in arrays, also it has so many advantages such as high density, convenient fabrication and easy coupling with other plane devices. It goes with the tide of miniaturizing and integrating in optical devices. It has wide prospects for application in photolithography, fiber communication and optical information processing etc.
In the thesis, the physical mechanism and fabricating method of microlens array are studied theoretically and experimentally. Guided by the theory of melting resist technique on microlens array, the formula of the thickness of melting resist to overcome some disadvantage on melting resist technique and the optimized melting resist method is suggested. The influence of the best contact angle between the melting resist and substrate to the surface formation of microlens is discussed. Because the transparence and anti-fraying performance of the photoresist microlens array is not good, we can obtain better ones by combining melting resist technique with reactive ion etching for transfering the profile to the substrate. The measure method of the parameter of the refractive microlens array is discussed and tested by simple equipment. On the base of applied optical theories, the imaging properties of microlens array are analyzed.
The multiple imaging of the microlens arrays is studied theoretically and experimentally, and a microlens projection photolithographic system is designed and fabricated. Integration of the system is described, the characteristics of the photolithographic imaging system are analyzed in detail. Finally, Experimental measurement result and evaluation of the system are provided. Compared with conventional proximity printing, the microlens photolithographic projection system is a new novel technique. For a large area of mask, especially for some non-planar substrates, the system can provide better image and larger working distance.
本文首先从理论和实验两方面入手，较系统全面地研究了折射型微透镜阵列的形成原理和制作工艺。在光刻胶熔融法形成微透镜阵列的理论基础上，研究和简化了匀胶层厚度公式。针对光刻胶熔融法中的一些不足，发展了光刻胶的最佳熔融条件，探讨了熔融光刻胶与石英基片的接触角对微透镜阵列的表面面形形成的影响。对最佳接触角进行了理论分析和实验探讨，从而较好地指导了微透镜阵列的制作，获得了质量较高的光刻胶微透镜阵列。由于光刻胶的透光性能和抗磨损性能都远远逊色于石英基片，因此我们用反应离子束刻蚀法，将光刻胶上的微透镜面形转移到石英基片上来，有效地改善了微透镜阵列的透光质量。
接着对折射型微透镜阵列光学参数的测量进行了讨论，利用简单实用的装置测得所制作的微透镜阵列的基本光学参数。在几何光学理论基础上，分析了微透镜阵列的光学性质，得到了焦距及相关主面位置的计算公式。用这些公式计算的系统参数与实际测量结果吻合得较好。
本文主要对微透镜阵列组合形成光刻投影系统进行了较为全面深入的研究。从理论上和实验上系统地研究了微透镜阵列组的综合成像，建立并初步完善了一套利用微透镜阵列的组合作为光刻物镜头，进行投影光刻的光学系统。介绍了光刻投影系统的组合集成，详细分析了该系统的成像特点及光学性能。最后对这种光刻投影系统进行了像质评价。与传统的近贴式投影光刻相比，针对大面积光刻，特别是对那些面形有微弯曲或不平整的器件，采用这种光刻投影系统进行非接触式光刻，可以获得良好的像质和更大的工作距离。
Microlens array is an important fundamental device in Micro-Optics, for it has the functions of focusing, diverging, collimating, imaging and transforming in arrays, also it has so many advantages such as high density, convenient fabrication and easy coupling with other plane devices. It goes with the tide of miniaturizing and integrating in optical devices. It has wide prospects for application in photolithography, fiber communication and optical information processing etc.
In the thesis, the physical mechanism and fabricating method of microlens array are studied theoretically and experimentally. Guided by the theory of melting resist technique on microlens array, the formula of the thickness of melting resist to overcome some disadvantage on melting resist technique and the optimized melting resist method is suggested. The influence of the best contact angle between the melting resist and substrate to the surface formation of microlens is discussed. Because the transparence and anti-fraying performance of the photoresist microlens array is not good, we can obtain better ones by combining melting resist technique with reactive ion etching for transfering the profile to the substrate. The measure method of the parameter of the refractive microlens array is discussed and tested by simple equipment. On the base of applied optical theories, the imaging properties of microlens array are analyzed.
The multiple imaging of the microlens arrays is studied theoretically and experimentally, and a microlens projection photolithographic system is designed and fabricated. Integration of the system is described, the characteristics of the photolithographic imaging system are analyzed in detail. Finally, Experimental measurement result and evaluation of the system are provided. Compared with conventional proximity printing, the microlens photolithographic projection system is a new novel technique. For a large area of mask, especially for some non-planar substrates, the system can provide better image and larger working distance.
引文
[1] 刘德森，吉林大学自然科学学报，1990年特刊：5
[2] 大越孝敬，三维成像技术，北京，机械工业出版社，1976：18-32
[3] M Oikawa, K Iga, Distributed-index planar microlens and its application, Appl.Opt. Vol.21(1982): 1052-6
[4] N Fborreli, D 1 Morse, R H Bellman, and W L Morgan, Photolytic technique for producing microlens in photosensitive glass,Appl.Opt.Vol.24(1988):2520-5
[5] W J Hossack, P McOwan, and R E Burge, Computer generated optical fan out elemem, Opt. Commun. Vol.68(1988): 97-102
[6] H Nishihara, Suhara,Micro Fresnel Lenses,Progress in Optics,Vol.24(1987):1-3
[7] Z D Popovic, R A Sprague, G A N Connell,Technique for monolithic fabrication of microlens array,Appl.Opt.Vol.27(1988):1281-1284
[8] Gao Yingjun,Yan Guoan, Yao Shengli,Gao Feng,Fabrication of difffraction-limited full aperture microlens array by melting photoresist,High Technology Letters,Vol.3(1997),No.1,:5-9
[9] N.F.Borrelli,D.L.Moore,R.H.Bellman,W.L.Morgan.Appl.Opt,1985,24(16):2520J.
[10] Johns, S.J. Walker. Appl. Opt. 1990, 29(7):931
[11] 杨力主编．先进光学制造技术．北京．科学出版社，2001：143
[12] 曾红军等．连续微光学元件在光刻胶上的面形控制．光学学报，2000，20(5)：692-693
[13] 高应俊等．高质量光刻胶微小透镜阵列的制作．光子学报，1996，Vol．25，No．10：909-910
[14] 张新宇等．用于强功率半导体激光器的石英柱微透镜阵列．华中理工大学学报，1998，26(Ⅱ)：7-9
[15] 高应俊等．高质量光刻胶微小透镜阵列的制作．光子学报，1996，Vol．25，
No.10:912
[16] 朱传贵．自聚焦平面微透镜阵列及其光学性质研究，博士论文，1992：58-60
[17] 吴福田，冯书文．《应用光学》．山东大学出版社，1996：232
[18] R Vlkel,Ph Nussbaum,H P Herzig,R Dandliker,Microlens array imaging for photolithography.Optical Engineering,1996,Vol.35,No.11:3324
[2] 大越孝敬，三维成像技术，北京，机械工业出版社，1976：18-32
[3] M Oikawa, K Iga, Distributed-index planar microlens and its application, Appl.Opt. Vol.21(1982): 1052-6
[4] N Fborreli, D 1 Morse, R H Bellman, and W L Morgan, Photolytic technique for producing microlens in photosensitive glass,Appl.Opt.Vol.24(1988):2520-5
[5] W J Hossack, P McOwan, and R E Burge, Computer generated optical fan out elemem, Opt. Commun. Vol.68(1988): 97-102
[6] H Nishihara, Suhara,Micro Fresnel Lenses,Progress in Optics,Vol.24(1987):1-3
[7] Z D Popovic, R A Sprague, G A N Connell,Technique for monolithic fabrication of microlens array,Appl.Opt.Vol.27(1988):1281-1284
[8] Gao Yingjun,Yan Guoan, Yao Shengli,Gao Feng,Fabrication of difffraction-limited full aperture microlens array by melting photoresist,High Technology Letters,Vol.3(1997),No.1,:5-9
[9] N.F.Borrelli,D.L.Moore,R.H.Bellman,W.L.Morgan.Appl.Opt,1985,24(16):2520J.
[10] Johns, S.J. Walker. Appl. Opt. 1990, 29(7):931
[11] 杨力主编．先进光学制造技术．北京．科学出版社，2001：143
[12] 曾红军等．连续微光学元件在光刻胶上的面形控制．光学学报，2000，20(5)：692-693
[13] 高应俊等．高质量光刻胶微小透镜阵列的制作．光子学报，1996，Vol．25，No．10：909-910
[14] 张新宇等．用于强功率半导体激光器的石英柱微透镜阵列．华中理工大学学报，1998，26(Ⅱ)：7-9
[15] 高应俊等．高质量光刻胶微小透镜阵列的制作．光子学报，1996，Vol．25，
No.10:912
[16] 朱传贵．自聚焦平面微透镜阵列及其光学性质研究，博士论文，1992：58-60
[17] 吴福田，冯书文．《应用光学》．山东大学出版社，1996：232
[18] R Vlkel,Ph Nussbaum,H P Herzig,R Dandliker,Microlens array imaging for photolithography.Optical Engineering,1996,Vol.35,No.11:3324