电弧离子镀TiN涂层沉积工艺研究
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摘要
目的优化电弧离子镀沉积TiN涂层的制备工艺,分析不同N_2/Ar条件对涂层微观结构和力学性能的影响机制,进一步强化和研究TiN涂层的优异性能。方法采用带有附加线圈磁场的电弧离子镀技术在不同N_2/Ar条件下制备TiN涂层,利用扫描电子显微镜、X射线衍射仪、超景深显微镜、维氏硬度计、薄膜应力仪和高温摩擦机观察涂层微观结构、测试力学性能。结果随着N_2/Ar流量比的增加,涂层表面形貌得到改善,大颗粒的数量和尺寸明显减少,表面变得光滑致密。TiN涂层的生长取向由沿(110)晶面择优生长,逐渐转变为沿(111)晶面择优生长。涂层显微硬度呈上升趋势,硬度最高为2260HV;当N_2/Ar流量比为2:1时,摩擦系数最低为0.71,磨损率最低为1.5×10~(-2)μm~3/(N·μm),磨痕边界清晰,大颗粒和磨屑较少。结论当N_2/Ar流量比为2:1时,TiN涂层结构致密,且具有最佳的各项力学性能。
Objective To optimize the preparation process of TiN coating deposited by arc ion plating,analyze the influence mechanism of different N_2/Ar on microstructure and mechanical properties of the coating,and further strengthen and study the excellent performance of TiN coating.Methods The TiN coating was prepared by arc ion plating under different N_2/Ar conditions.The microstructure and mechanical behavior of the coating was tested by scanning electron microscope,X-ray diffractometer,ultra depth of field microscope,vickers hardness tester,coating stress meter and high temperature friction machine.Results With the increase of N_2/Ar,the surface morphology of the coating was improved,the number and size of large particles on the surface of the coating were significantly reduced,and the surface became smooth and compact.The growth orientation of TiN coating was preferentially grown along the(110)crystal plane and gradually changed to preferential growth along the(111)crystal plane,and the microhardness of the coating is increased,the highest hardness was 2,260 HV.When the N_2/Ar was 2:1,the friction coefficient was at least 0.707,and the wear rate was at least 1.5×10~(-2)μm~3·N~(-1)·μm~(-1),the wear marks were clear and the defects such as large particles and wear debris were less.Conclusion When N_2/Ar is 2:1,TiN coating has good microstructure and the best mechanical properties.
Objective To optimize the preparation process of TiN coating deposited by arc ion plating,analyze the influence mechanism of different N_2/Ar on microstructure and mechanical properties of the coating,and further strengthen and study the excellent performance of TiN coating.Methods The TiN coating was prepared by arc ion plating under different N_2/Ar conditions.The microstructure and mechanical behavior of the coating was tested by scanning electron microscope,X-ray diffractometer,ultra depth of field microscope,vickers hardness tester,coating stress meter and high temperature friction machine.Results With the increase of N_2/Ar,the surface morphology of the coating was improved,the number and size of large particles on the surface of the coating were significantly reduced,and the surface became smooth and compact.The growth orientation of TiN coating was preferentially grown along the(110)crystal plane and gradually changed to preferential growth along the(111)crystal plane,and the microhardness of the coating is increased,the highest hardness was 2,260 HV.When the N_2/Ar was 2:1,the friction coefficient was at least 0.707,and the wear rate was at least 1.5×10~(-2)μm~3·N~(-1)·μm~(-1),the wear marks were clear and the defects such as large particles and wear debris were less.Conclusion When N_2/Ar is 2:1,TiN coating has good microstructure and the best mechanical properties.
引文
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[19]白秀琴,李健.磁控溅射TiN薄膜低温沉积技术及其摩擦学性能研究[J].润滑与密封,2006,(5):15-17,21.
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[21]ZHOU T,LIU D W,ZHANG Ying et al.Microstructure and Hydrogen Impermeability of Titanium Nitride Thin Films Deposited by Direct Current Reactive Magnetron Sputtering[J].Journal of Alloys and Compounds,2016,688:44-50.
[22]赵升升,赵彦辉,陈伟,等.轴向磁场对电弧离子镀TiN/Cu薄膜性能的影响[J].材料研究学报,2018,5(32):382-387.
[23]贺春林,高建君,王苓飞,等.N2流量对反应共溅射TiN/Ni纳米复合膜结构和结合强度的影响[J].材料导报,2018,6(32):2038-2042.
[24]CHEN Y,DU H,CHEN M,et al.Structure and Wear Behavior of AlCrSiN-based Coatings[J].Applied Surface Science,2016,370:176-183.
[25]WANG T G,ZHAO S S,HUA W G,et al.Design of a Separation Device Used in Detonation Gun Spraying System and Its Effects on the Performance of WC-Co Coatings[J].Surface and Coatings Technology,2009,203(12):1637-1644.
[26]王铁钢,李柏松,张姣姣,等.沉积温度对高功率脉冲磁控溅射Al CrSiN涂层结构和性能的影响[J].稀有金属材料与工程,2018,8(47):2578-2584.
[2]白晓明,郑伟涛.超硬纳米多层膜和复合膜的研究综述[J].自然科学进展,2005,15(1):21-24.
[3]VEPREK S,VEPREK M G.Limits to the Preparation of Super Hard Nano Composites:Impurities,Deposition and Annealing Temperature[J].Thin Solid Films,2012,522:274-282.
[4]师昌绪,徐滨士.21世纪表面工程的发展趋势[J].中国表面工程,2001(1):2-7.
[5]李鹏,黄美东,佟莉娜,等.磁控溅射与电弧离子镀制备TiN薄膜的比较[J].天津师范大学学报(自然科学版),2011,31(2):32-37.
[6]COLOMBO A D.Rolling Contact Fatigue Resistance of PVD CrN and TiN Coated Austempered Ductile Iron[J].Original Research Article Wear,2013,308(2):35-45.
[7]MATHTWES A,LEYLAND A.Developments in PVDRtibological Coatings[J].Heat Treatmen of Metals,2001,28(3):63-70.
[8]王启民,黄健,王成勇,等.高速切削刀具物理气相沉积涂层研究进展[J].航空制造技术,2013(14):78-83.
[9]季鑫,宓一鸣,周细应,等.TiN薄膜制备方法?性能及其应用的研究进展[J].热加工工艺,2009(3):81-83.
[10]钟一昌,任兴润,黄柱,等.氮气流量对TiN薄膜组织结构及力学性能的影响[J].有色金属科学与工程,2016,7(3):47-53.
[11]陈昌浩,金永中,刘东亮,等.气体总流量对多弧离子镀TiN涂层表面形貌和力学性能的影响[J].稀有金属与硬质合金,2016,44(4):43-47.
[12]WANG T G,LIU Y M,ZHANG T,et al.Influence of Nitrogen Flow Ratio on the Microstructure,Composition,and Mechanical Properties of Magnetron Sputtered Zr-B-O-N Films[J].Journal of Materials Science&Technology,2012,28(11):981-984.
[13]茅昕辉,刘云峰,张浩康,等.铝靶脉冲反应溅射沉积氧化铝薄膜中的迟滞回线的研究[J].真空科学与技术学报,2000,20(2):14-17.
[14]牛宝林,陈汪林,刘书媛,等.氮气分压对AlCrTiSiN超晶格涂层微观结构及力学性能的影响[J].中国表面工程,2015,28(2):45-52.
[15]张启沛,钟喜春,杨怡帆,等.多弧离子镀Ti N薄膜颜色性能的研究[J].真空科学与技术学报,2014,34(7):694-699.
[16]YEH T S,WU J M,Hu L J,et al.The Properties of TiN Thin Films Deposited by Pulsed Direct Current Magnetron Sputtering[J].Thin Solid Films,2008,516:7294-7298.
[17]POLCAR T,CAVALEIRO A.Structure and Tribological Properties of Alcrtin Coatings at Elevated Temperature[J].Surface and Coatings Technology[J].2011,206(6):107-110.
[18]张姣姣,王铁钢,阎兵,等.直流基体偏压对Al Cr Si N涂层结构和力学性能的影响[J].稀有金属材料与工程,2018,47(7):2232-2239.
[19]白秀琴,李健.磁控溅射TiN薄膜低温沉积技术及其摩擦学性能研究[J].润滑与密封,2006,(5):15-17,21.
[20]孔德军,付永忠,吴永忠,等.PVD法制备TiN涂层界面特征与摩擦磨损性能[J].真空科学与技术学报,2012,12(32):1078-1083.
[21]ZHOU T,LIU D W,ZHANG Ying et al.Microstructure and Hydrogen Impermeability of Titanium Nitride Thin Films Deposited by Direct Current Reactive Magnetron Sputtering[J].Journal of Alloys and Compounds,2016,688:44-50.
[22]赵升升,赵彦辉,陈伟,等.轴向磁场对电弧离子镀TiN/Cu薄膜性能的影响[J].材料研究学报,2018,5(32):382-387.
[23]贺春林,高建君,王苓飞,等.N2流量对反应共溅射TiN/Ni纳米复合膜结构和结合强度的影响[J].材料导报,2018,6(32):2038-2042.
[24]CHEN Y,DU H,CHEN M,et al.Structure and Wear Behavior of AlCrSiN-based Coatings[J].Applied Surface Science,2016,370:176-183.
[25]WANG T G,ZHAO S S,HUA W G,et al.Design of a Separation Device Used in Detonation Gun Spraying System and Its Effects on the Performance of WC-Co Coatings[J].Surface and Coatings Technology,2009,203(12):1637-1644.
[26]王铁钢,李柏松,张姣姣,等.沉积温度对高功率脉冲磁控溅射Al CrSiN涂层结构和性能的影响[J].稀有金属材料与工程,2018,8(47):2578-2584.