退火温度对氧化铬薄膜结构和高温摩擦学性能的影响
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摘要
采用电弧离子镀技术在GH-4169高温合金基体上沉积氧化铬薄膜,并对薄膜进行了不同温度的退火处理,系统研究了不同退火温度(500、600、700和800℃)对薄膜形貌、薄膜结构、薄膜力学性能及薄膜摩擦学性能的影响.结果表明:随退火温度升高,薄膜表面缺陷减少,氧化铬晶化趋于完善,薄膜硬度下降.高温摩擦学性能方面薄膜经500和600℃退火后,在环境温度从室温到800℃宽温域范围内摩擦系数较退火前均有所增加;经800℃退火后的薄膜在环境温度为400～600℃时的摩擦系数均明显下降,但室温摩擦系数明显升高,宽温域内摩擦系数波动较大;700℃退火后薄膜宽温域内摩擦系数在0.21～0.33之间,波动较小.
Chromium oxide thin film was deposited on GH-4169 alloy by arc ion plating(AIP). The effects of annealing temperature(500 ℃, 600 ℃, 700 ℃ and 800 ℃) on morphology, structure, mechanical properties and tribological properties were studied. The results showed that the chromium oxide film presented a decreasing defect density and hardness, and gradually perfect crystallinity, as the annealing temperature increased. In addition, chromium oxide films annealing at different temperatures presented different high temperature tribological properties: chromium oxide films annealing at 500 ℃ and 600 ℃ showed a higher friction coefficient than one as-deposited from 25 ℃ to 800 ℃;chromium oxide films annealing at 800 ℃ showed a relatively low friction coefficient from 400 ℃ to 600 ℃, while a high friction coefficient(>0.4) at room temperature, which indicated a obvious fluctuation over a wide range of temperature; chromium oxide films annealing at 700 ℃ showed a stable friction coefficient(0.21～0.33) from 25 ℃ to800 ℃.
Chromium oxide thin film was deposited on GH-4169 alloy by arc ion plating(AIP). The effects of annealing temperature(500 ℃, 600 ℃, 700 ℃ and 800 ℃) on morphology, structure, mechanical properties and tribological properties were studied. The results showed that the chromium oxide film presented a decreasing defect density and hardness, and gradually perfect crystallinity, as the annealing temperature increased. In addition, chromium oxide films annealing at different temperatures presented different high temperature tribological properties: chromium oxide films annealing at 500 ℃ and 600 ℃ showed a higher friction coefficient than one as-deposited from 25 ℃ to 800 ℃;chromium oxide films annealing at 800 ℃ showed a relatively low friction coefficient from 400 ℃ to 600 ℃, while a high friction coefficient(>0.4) at room temperature, which indicated a obvious fluctuation over a wide range of temperature; chromium oxide films annealing at 700 ℃ showed a stable friction coefficient(0.21～0.33) from 25 ℃ to800 ℃.
引文
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[16]Wang Tiegang,Jeong Dawoon,Kim Soohyun,et al.Study on nanocrystalline Cr2O3 films deposited by arc ion plating:I.composition,morphology,and microstructure analysis[J].Surface and Coatings Technology,2012,206(10):2629-2637.doi:10.1016/j.surfcoat.2011.10.058.
[17]Pang Xiaolu.Characterization of growth and mechanical properties of Chromium oxide coating deposited by RF magnetron sputtering[D].Beijing:University Science and Technology Beijing,2008(in Chinese)[庞晓露.氧化铬薄膜的生长机理及力学性能表征[D].北京:北京科技大学,2008].
[2]Bijker,Bastiaens,Draaisma,et al.The development of a thin Cr2O3wear protective coating for the advanced digital recording system[J].Tribology International,2003,36(4-6):227-233.doi:10.1016/S0301-679X(02)00191-3.
[3]Contoux,Cosset,Célérier,et al.Deposition pr℃ess study of chromium oxide thin films obtained by d.c.magnetron sputtering[J].Thin Solid Films,1997,292(1-2):75-84.doi:10.1016/S0040-6090(96)08941-9.
[4]Agouram,amp x,Bodart,et al.Characterisation of reactive unbalanced magnetron sputtered chromium oxynitride thin films with air[J].Surface and Coatings Technology,2004,180(0):164-168.
[5]Hong SB,Kim E,Jiang ZT,et al.Effects of gas ring position and mesh introduction on film quality and thickness uniformity[J].Materials Science and Engineering:B,1997,45(1-3):98-101.doi:10.1016/S0921-5107(96)01913-7.
[6]J Li,Zhang,J Huang,et al.Mechanical and tribological properties of plasma-sprayed Cr2C3-NiCr,WC-Co,and Cr2O3 coating[J].Journal of Thermal Spray Technology,1998,7(2):242-246.doi:10.1361/105996398770350981.
[7]Zhang Jian,Yang Jun,Zhu Langtao.Microstructure and wear resistance of Cr2O3 based ceramic coatings deposited by supersonic atmosphere plasma spraying[J].Ordnance Material Science and Engineering,2012,35(2):4-8(in Chinese)[张建,杨军,朱浪涛.超音速等离子喷涂Cr2O3陶瓷涂层的微观组织及其耐磨性能[J].兵器材料科学与工程,2012,35(2):4-8].
[8]P Hones.Characterization of sputter-deposited chromium oxide thin flms[J].Surface and Coating Technology,1999,120:277-283.
[9]Luo Fei,Pang Xiaolu,Gao Kewei,et al.Effects of radio frequency power on mechanical properties and wear resistance of chromium oxide thin films[J].Journal of Materials Engineering,2007(1):25-28(in Chinese)[罗飞,庞晓露,高克玮,等.射频功率对氧化铬薄膜的力学性能和耐磨损性能的影响[J].材料工程,2007(1):25-28].doi:10.3969/j.issn.1001-4381.2007.01.006.
[10]Luo Qinghong,Yang Huisheng,Zhang Tianwei,et al.Sputtering angle and quality of chromium oxide coatings on Irregularly shaped work-piece[J].Chinese Journal of Vacuum Science and Technology,2008,28:13-16(in Chinese)[罗庆洪,杨会生,张天伟,等.溅射角度对氧化铬薄膜性能结构的影响[J].真空科学与技术学报,2008,28:13-16].
[11]Pang Xiaolu,Gao Kewei,Yang Huisheng,et al.Interfacial microstructures of chromium oxide coatings[J].Journal of Vacuum Science and Technology,2008,28(5):420-423(in Chinese)[庞晓露,高克玮,杨会生,等.氧化铬薄膜的界面高分辨研究[J].真空科学与技术学报,2008,28(5):420-423].
[12]Pang Xiaolu,Luo Fei,Gao Kewei,et al.Influence of annealing temperature/time on structure and mechanical properties of chromium oxide coating by magnetron sputtering[J].Vacuum,2007,44(6):43-47(in Chinese)[庞晓露,罗飞,高克玮,等.热处理对磁控溅射制备氧化铬涂层的结构及力学性能的影响[J].真空,2007,44(6):43-47].doi:10.3969/j.issn.1002-0322.2007.06.011.
[13]Xiong Xiaotao,Yan Liangchen,Yang Huisheng.Deposition technology and properties of Chromium Oxide Coatings By RFreactive sputtering[J].Journal of University Science and Technology Beijing,2005,27(2):205-208(in Chinese)[熊小涛,阎良臣,杨会生.射频反应磁控溅射制备氧化铬薄膜技术及性能[J].北京科技大学学报,2005,27(2):205-208].doi:10.3321/j.issn:1001-053X.2005.02.018.
[14]Ji Wang,Song Wang,SunWen.Microstructures and mechanical properties of Chromium oxide films by arc ion plating[J].Materials Letters,2004,58(14):1993-1998.doi:10.1016/j.matlet.2003.12.029.
[15]Ji Ailing,Wang Wei,Song Guihong,et al.Microstructure and hardness of Chromium oxide coatings by arcionplating[J].ACTAMetalluigica Sinica,2003,39(9):979-983(in Chinese)[纪爱玲,汪伟,宋贵宏,等.电弧离子镀氧化铬涂层的组织机构和硬度[J].金属学报,2003,39(9):979-983].doi:10.3321/j.issn:0412-1961.2003.09.016.
[16]Wang Tiegang,Jeong Dawoon,Kim Soohyun,et al.Study on nanocrystalline Cr2O3 films deposited by arc ion plating:I.composition,morphology,and microstructure analysis[J].Surface and Coatings Technology,2012,206(10):2629-2637.doi:10.1016/j.surfcoat.2011.10.058.
[17]Pang Xiaolu.Characterization of growth and mechanical properties of Chromium oxide coating deposited by RF magnetron sputtering[D].Beijing:University Science and Technology Beijing,2008(in Chinese)[庞晓露.氧化铬薄膜的生长机理及力学性能表征[D].北京:北京科技大学,2008].