摘要
同步辐射(SR)、惯性约束聚变(ICF)等以粒子束输运(Particle transport)为基础的大科学工程装置近年来在世界范围广泛发展，与之相关的非标仪器设备普遍涉及多门学科的精密集成，往往成为工程实施的关键。
论文主要介绍SR X射线光束线关键仪器、制作ICF大口径衍射光学元件的条形源大型离子束刻蚀设备若干设计制造技术和性能分析。主要内容包括以下两个方面：
1) NSRL X射线光束线仪器关键技术。根据我们X射线光束线仪器特点以及二期工程改造后的光源性能对仪器的影响，利用有限元数值模拟方法开展光学元件(U7C双晶单色器、U7B大面积聚焦镜)在没有水冷情况下的热载分析，通过对光子通量的测量，在线测试了双晶单色器的热效应，定性地分析了其从开机冷态到热平衡这一动态过程，并与普通底面间接水冷方式的模拟结果作了比较；对仪器的关键结构(双晶单色器联动机构、X射线聚焦镜压弯调整机构)从其原理、具体实施方法作了详细描述、讨论，并结合实际应用给出了其性能，系统地开展此类同步辐射关键仪器功能机构的研究。
2) KZ-400离子束刻蚀装置研制。基于条形射频源，我们研制了大尺寸基底往返线性扫描矩形离子束的刻蚀设备，用于大口径衍射光学元件图形转移工艺。详细阐述了此装置的工作原理，以及方形大真空室、三维调节运动工作台及线形运动系统、离子束流密度探测等结构特点与设计分析。通过试验测试不同工作气体压力、气流，加速电压与束压等条件下的长轴束流密度均匀性，给出了相应的利用束阑修剪引出离子束边缘从而提高束流密度均匀性的措施，达到优于5％的均匀性。不同工况条件下的刻蚀实验表明刻蚀机性能满足要求。
最后归纳总结了基于X射线、矩形离子束传输轨迹(Beam tracing)的仪器设备相关共性的问题：一定能量和空间分布的束线追迹模拟与测量，以及在受照光学表面投影引起的热载影响及数值模拟方法；对于一定性能需求的束线传输仪器设备，采用机械机构补偿运动、微小位移补偿精度调整实现要求束线传输轨迹、提高束线传输性能的设计方法。同时简单讨论了这些方法的改进与完善以及在更高性能需求的仪器设备的可能应用。
Large-scale scientific facilities based on particle transport have been developed widely all over the world recently, especially of synchrotron radiation(SR) and Inertial Confinement Fusion(ICF). Related non-standard instrumentation, most of which are integrated and precision system with multidisciplinary approach, plays a critical role in the engineering implement.
Several key techniques on the development of the SR X-ray beamline instrument and the scanning ion beam etcher with linear radio frequency(RF) source for fabrication of large aperture diffractive optical elements(DOE) are presented. It is includes two main aspects:
1) NSRL X-ray beamline main instruments. According to the characteristics of the 6T single-period superconducting wiggler source, discussion on the thermal equilibrium process of the heating effect on optics (U7C double crystal monochromator, U7B bent cylindrical mirror) is presented. A testing method and the results of thermal effect on photon flux of DCM are introduced. Temperature distribution and thermal strain for both steady and transient cases with radiation cooling alone and with a combination of radiation and forced convection cooling are considered by finite element method (FEM). Methods and performance of linkage mechanism for DCM, bender & adjustment device for focusing mirror are presented and discussed.
2) Development of KZ-400 ion beam etcher. With a 6cm×66cm rectangular beam which the substrate carriage traverses back and forth, an area can be over-covered as large as 40cmx40cm. The Operating principle, construction features of the etcher, commissioning results and technical performance are presented, especially of the vacuum system with a large block chamber, workbench assembly with X,Y-translation and Z-rotation, and a scanning faraday-cup based current density detecting system. A beam diaphragm is adopted to optimize the ion beam spatial uniformity, and excelling 5% uniformity along the major axis is achieved. Etching experiments shows a good uniformity of 5.4% of etching depth over the 40cm.
At last, the similar problems of instrumentation related to the beam tracing are discussed and summaried: the simulation and measurement methods with a certain energy and distribution as well as the heating effect on optical surfaces, and the design methods of structures with tiny motion or displacement for compensation of the adjustment to meet the requirement of performance. The improvement and possible application of the methods, for the more precision instrumentation of the incoming demand, are also taken into account in brief.
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