Photocatalytic TiO₂ films prepared by chemical vapor deposition at atmosphere pressure

详细信息    查看全文

• 作者：Hongfu Sun ; Chengyu Wang ; Shihong Pang ; Xiping Li ; Ying Tao ; Huajuan Tang ; Ming Liu
• 关键词：Photocatalysis ; chemical vapor deposition
• 刊名：Journal of Non-Crystalline Solids
• 出版年：2008
• 出版时间：15 February 2008
• 年：2008
• 卷：354
• 期：12-13
• 页码：1440-1443
• 全文大小：430 K

文摘

Nanometer semiconductor titanium dioxide thin films have excellent properties of photocatalysitic degeneration. The glass coated TiO₂ films is called self-cleaning glass. In this paper, chemical vapor deposition (CVD) method is employed to deposit TiO₂ films on glass. The effect of spacing between nozzle and glass and the effect of substrate temperature on deposition rate are studied. The crystalline structure at different deposition temperatures is analyzed by XRD and anatase was found. And the microstructure of the TiO₂ films is also determined by SEM. It shows that the size of crystal grain increases with the temperature.