Thin Films of Molybdenum Disulfide Doped with Chromium by Aerosol-Assisted Chemical Vapor Deposition (AACVD)

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• 作者：David J. Lewis ; Aleksander A. Tedstone ; Xiang Li Zhong ; Edward A. Lewis ; Aidan Rooney ; Nicky Savjani ; Jack R. Brent ; Sarah J. Haigh ; M. Grace Burke ; Christopher A. Muryn ; James M. Raftery ; Chris Warrens ; Kevin West ; Sander Gaemers ; Paul O鈥橞rien
• 刊名：Chemistry of Materials
• 出版年：2015
• 出版时间：February 24, 2015
• 年：2015
• 卷：27
• 期：4
• 页码：1367-1374
• 全文大小：493K
• ISSN：1520-5002

文摘

A combined single-source precursor approach has been developed for the deposition of thin films of Cr-doped molybdenum disulfide (MoS₂) by aerosol-assisted chemical vapor deposition (AACVD). Tris(diethyldithiocarbamato)chromium(III) can also be used for the deposition of chromium sulfide (CrS). Films have been analyzed by a range of techniques including scanning electron microscopy (SEM), energy dispersive X-ray (EDX) spectroscopy, Raman spectroscopy, and powder X-ray diffraction (pXRD) to elucidate film morphology, composition, and crystallinity. The presence of Cr in the MoS₂ films produces a number of striking morphological, crystallographic, and nanomechanical changes to the deposited films. The chromium dopant appears to be uniform throughout the MoS₂ from the scanning transmission electron microscopy (STEM) EDX spectrum imaging of nanosheets produced by liquid-phase exfoliation of the thin films in N-methyl-2-pyrollidone.