Formation of Aromatic Siloxane Self-Assembled Monolayers

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• 作者：Susan L. Brandow ; Mu-San Chen ; Charles S. Dulcey ; Walter J. Dressick
• 刊名：Langmuir
• 出版年：2008
• 出版时间：April 15, 2008
• 年：2008
• 卷：24
• 期：8
• 页码：3888 - 3896
• 全文大小：496K
• 年卷期：v.24,no.8(April 15, 2008)
• ISSN：1520-5827

文摘

We describe reproducible protocols for the chemisorption of self-assembled monolayers (SAMs), useful as imaginglayers for nanolithography applications, from p-chloromethylphenyltrichlorosilane (CMPS) and 1-(dimethylchlorosilyl)-2-(p,m-chloromethylphenyl)ethane on native oxide Si wafers. Film chemisorption was monitored and characterizedusing water contact angle, X-ray photoelectron spectroscopy, and ellipsometry measurements. Atomic force microscopywas used to monitor the onset of multilayer deposition for CMPS films, ultimately allowing film macroscopic propertiesto be correlated with their surface coverage and nanoscale morphologies. Although our results indicate the depositionof moderate coverage, disordered SAMs under our conditions, their quality is sufficient for the fabrication of sub-100-nm-resolution metal features. The significance of our observations on the design of future imaging layers capableof molecular scale resolution in nanolithography applications is briefly discussed.