用户名: 密码: 验证码:
N,N-Dimethylhydrazidoacrylamides. Part 2: High-Cloud-Point Kinetic Hydrate Inhibitor Copolymers with N- Vinylcaprolactam and Effect of pH on Performance
详细信息    查看全文
  • 作者:Mohamed F. Mady ; Malcolm A. Kelland
  • 刊名:Energy & Fuels
  • 出版年:2015
  • 出版时间:February 19, 2015
  • 年:2015
  • 卷:29
  • 期:2
  • 页码:678-685
  • 全文大小:408K
  • ISSN:1520-5029
文摘
Poly(N,N-dimethylhydrazidoacrylamides)s (PDMHAMs) and a series of copolymers of (N,N-dimethylhydrazidoacrylamide) and (N-isopropylacrylamide) were recently investigated as kinetic hydrate inhibitors (KHIs). Poly(N-vinylcaprolactam) (PVCap) and related copolymers have been used as a class of commercial KHIs in the oil and gas industry to prevent plugging of pipelines with gas hydrates. In this study, we have synthesized and investigated the ability of copolymers of DMHAM monomer and VCap monomer to inhibit structure II gas hydrate formation in high-pressure rocking cells at approximately 75 bar. Various polymer molecular weights have been investigated at various pH conditions. It was found that the novel polymers have high cloud points in deionized (DI) water or brine solutions at high or low pH under pressure compared to polyVCap. A 1:2 copolymer of DMHAM/VCap gave the best KHI performance for this class of copolymer with a cloud point at 50 掳C in DI water. Also, a 1:1 DMHAM/VCap copolymer gave excellent KHI performance, as well as giving no cloud point up to 100 掳C in DI water or high-salinity solutions (3.6鈥?5 wt % NaCl) at pH 5.0. The cloud point was found to be 67 掳C at pH 12.0 for the 15 wt % NaCl solution, making it compatible for use in high-salinity water-based deep-water drilling fluids. It was also found that high pH improved the performance of the KHIs compared to otherwise identical tests at pH 5.0. This may be related to removing the structure I (SI)-forming and relatively more soluble acid gas CO2 from the system at high pH.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700