Removal of NO in NO/N2, NO/N2/O2, NO/CH4/N2, and NO/CH4/O2/N2 Systems by Flowing Microwave Discharges

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• 作者：Jos&eacute ; L. Hueso ; Agustí ; n R. Gonzá ; lez-Elipe ; Jos&eacute ; Cotrino ; Alfonso Caballero
• 刊名：Journal of Physical Chemistry A
• 出版年：2007
• 出版时间：February 15, 2007
• 年：2007
• 卷：111
• 期：6
• 页码：1057 - 1065
• 全文大小：300K
• 年卷期：v.111,no.6(February 15, 2007)
• ISSN：1520-5215

文摘

In this paper, continuing previous work, we report on experiments carried out to investigate the removal ofNO from simulated flue gas in nonthermal plasmas. The plasma-induced decomposition of small concentrationsof NO in N₂ used as the carrier gas and O₂ and CH₄ as minority components has been studied in a surfacewave discharge induced with a surfatron launcher. The reaction products and efficiency have been monitoredby mass spectrometry as a function of the composition of the mixture. NO is effectively decomposed into N₂and O₂ even in the presence of O₂, provided always that enough CH₄ is also present in the mixture. Othermajority products of the plasma reactions under these conditions are NH₃, CO, and H₂. In the absence of O₂,decomposition of NO also occurs, although in that case HCN accompanies the other reaction products as amajority component. The plasma for the different reaction mixtures has been characterized by optical emissionspectroscopy. Intermediate excited species of NO^*, C^*, CN^*, NH^*, and CH^* have been monitored dependingon the gas mixture. The type of species detected and their evolution with the gas composition are in agreementwith the reaction products detected in each case. The observations by mass spectrometry and optical emissionspectroscopy are in agreement with the kinetic reaction models available in literature for simple plasma reactionsin simple reaction mixtures.