Spatially Controlled Oxygen Inhibition of Acrylate Photopolymerization as a New Lithography Method for High-Performance Organic Thin-Film Transistors

详细信息    查看全文

• 作者：Jingsheng Shi ; Mary B. Chan-Park ; Cheng Gong ; Hongbin Yang ; Ye Gan ; Chang Ming Li
• 刊名：Chemistry of Materials
• 出版年：2010
• 出版时间：April 13, 2010
• 年：2010
• 卷：22
• 期：7
• 页码：2341-2346
• 全文大小：833K
• 年卷期：v.22,no.7(April 13, 2010)
• ISSN：1520-5002

文摘

A new concept-based lithography with use of spatially controlled oxygen inhibition of photopolymerization in acrylate-based materials as a micropatterning technique and its application in high-performance top- and bottom-gated organic thin-film transistors (OTFTs) on flexible substrates are demonstrated. This process does not rely on any surface/interfacial chemistry or adhesives and thus can be used in the patterning of a broad range of materials for printed organic electronics. It is also capable of achieving high resolution (3 μm), which is sufficient in OTFT-based organic electronics applications. The bottom-gated pentacene transistors show a remarkably high mobility of 1.02 cm² V⁻¹ S⁻¹, which is among the highest mobilities in flexible transistors fabricated by low-cost patterning processes.