Photo-oxidation of spin-cast films of 6,13-bis(triisopropylsilylethynyl) pentacene has been exploited to develop a novel means of spatially modulating doping in graphene. The degree of n-doping of initially p-type graphene can be varied by laser irradiation time or intensity with carrier density change up to 鈭? 脳 1012 cm鈥?. This n-doping approach is demonstrated as an effective means of creating p鈥搉 junctions in graphene. The ability to direct-write arbitrary shapes and patterns of n-doped regions in graphene simply by scanning a laser source should facilitate the exploitation of p鈥搉 junctions for a variety of electronic and optoelectronic device applications.