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Moiré Patterns in Superimposed Nanoporous Thin Films Derived from Block-Copolymer Assemblies
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文摘
Nanoscale rotation moiré patterns are observed in double-layer nanoporous thin films produced with use of block-copolymer self-assembly.Periodic hexagonal moiré superstructures appear when the films possessing long-range order are superimposed at small misorientationangles. Overlapping films misoriented by angles close to 30 generate aperiodic quasi-crystal-like superstructures with 5-fold symmetries.The stacking of the disordered nanoporous films produces labyrinth-like patterns. Block-copolymer moiré superstructures are promising asnanolithography masks with controllable morphology and periodicity.

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