Structural Investigation of Cr(Al)N/SiOx Films Prepared on Si Substrates by Differential Pumping Cosputtering

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• 作者：Masahiro Kawasaki ; Hiroshi Takabatake ; Ichiro Onishi ; Masateru Nose ; Makoto Shiojiri
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2013
• 出版时间：May 8, 2013
• 年：2013
• 卷：5
• 期：9
• 页码：3833-3838
• 全文大小：519K
• 年卷期：v.5,no.9(May 8, 2013)
• ISSN：1944-8252

文摘

Analytical electron microscopy revealed the structure and growth of hard coating Cr(Al)N/SiO_x nanocomposite films prepared in a differential pumping cosputtering (DPCS) system, which has two chambers to sputter different materials and a rotating substrate holder. The substrate holder was heated at 250 掳C and rotated at a speed as low as 1 rpm. In order to promote the adhesion between the substrate and composite film, transition layers were deposited on a (001) Si substrate by sputtering from the CrAl target with an Ar flow and a mixture flow of Ar and N₂ (Ar/N₂) gases, subsequently, prior to the composite film deposition. Then, the Cr(Al)N/SiO_x nanocomposite film was fabricated on the transition layers by cosputtering from the CrAl target with the Ar/N₂ gas flow and from the SiO₂ target with the Ar gas flow. The film had a multilayer structure of 1.6 nm thick crystallite layers of Cr(Al)N similar to NaCl-type CrN and 1 nm thick amorphous silicon oxide layers. The structure of the transition layers was also elucidated. These results can help with the fabrication of new hard nanocomposite films by DPCS.

Keywords:

Cr(Al)N/SiO_x; cosputtering; nanocomposite film; hard coating; analytical electron microscopy