Photocatalytic Nanostructuring of Graphene Guided by Block Copolymer Self-Assembly

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• 作者：Zhongli Wang ; Tao Li ; Lars Schulte ; Kristoffer Almdal ; Sokol Ndoni
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2016
• 出版时间：April 6, 2016
• 年：2016
• 卷：8
• 期：13
• 页码：8329-8334
• 全文大小：467K
• ISSN：1944-8252

文摘

Nanostructured graphene exhibits many intriguing properties. For example, precisely controlled graphene nanomeshes can be applied in electronic, photonic, or sensing devices. However, fabrication of nanopatterned graphene with periodic supperlattice remains a challenge. In this work, periodic graphene nanomesh was fabricated by photocatalysis of single-layer graphene suspended on top of TiO₂-covered nanopillars, which were produced by combining block copolymer nanolithography with atomic layer deposition. Graphene nanoribbons were also prepared by the same method applied to a line-forming block copolymer template. This mask-free and nonchemical/nonplasma route offers an exciting platform for nanopatterning of graphene and other UV-transparent materials for device engineering.