Patterning of Metal Films on Arbitrary Substrates by Using Polydopamine as a UV-Sensitive Catalytic Layer for Electroless Deposition

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• 作者：Lei Zhao ; Daqun Chen ; Weihua Hu
• 刊名：Langmuir
• 出版年：2016
• 出版时间：May 31, 2016
• 年：2016
• 卷：32
• 期：21
• 页码：5285-5290
• 全文大小：562K
• 年卷期：0
• ISSN：1520-5827

文摘

Patterning metal films on various substrates is essentially important and yet challenging for developing a wide variety of innovative devices. We herein report a versatile approach to pattern metal (gold, silver, or copper) films on arbitrary substrates by using the bio-inspired polydopamine (PDA) thin film as a UV-sensitive adhesive layer for electroless deposition. The PDA film is able to be formed on virtually any solid surfaces under mild condition, and its rich catechol groups allow for electroless deposition of metal films with high adhesion stability. Upon UV irradiation, spatially selective oxidation of PDA film occurs and the local metal deposition is inhibited, thus facilitating successful patterning of metal films. Considering its versatility and simplicity, this strategy may demonstrate great applications in manufacturing various innovative devices.