Basal Plane Fluorination of Graphene by XeF2 via a Radical Cation Mechanism

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• 作者：Yijun Liu ; Benjamin W. Noffke ; Xiaoxiao Qiao ; Qiqi Li ; Xinfeng Gao ; Krishnan Raghavachari ; Liang-shi Li
• 刊名：The Journal of Physical Chemistry Letters
• 出版年：2015
• 出版时间：September 17, 2015
• 年：2015
• 卷：6
• 期：18
• 页码：3645-3649
• 全文大小：315K
• ISSN：1948-7185

文摘

Graphene fluorination with XeF₂ is an attractive method to introduce a nonzero bandgap to graphene under mild conditions for potential electro-optical applications. Herein, we use well-defined graphene nanostructures as a model system to study the reaction mechanism of graphene fluorination by XeF₂. Our combined experimental and theoretical studies show that the reaction can proceed through a radical cation mechanism, leading to fluorination and sp³-hybridized carbon in the basal plane.