Thin Poly(styrene-block-4-hydroxystyrene) Block Copolymer Films Spin-Coated Directly on Topographic Prepattern Substrates
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- 作者：Geuntak Lee ; Pil Sung Jo ; Bokyung Yoon ; Tae Hee Kim ; Himadri Acharya ; Hiroshi Ito ; Ho-Cheol Kim ; June Huh ; Cheolmin Park
- 刊名：Macromolecules
- 出版年：2008
- 出版时间：December 9, 2008
- 年：2008
- 卷：41
- 期：23
- 页码：9290-9294
- 全文大小：271K
- 年卷期：v.41,no.23(December 9, 2008)
- ISSN：1520-5835
文摘
We have investigated the formation of as-cast thin films of a poly(styrene-block-4-hydroxystyrene) (PS-b-PHOST) copolymer spin-coated directly on topographic prepattern substrates. Either wetting or dewetting of a polymer thin film on the elevated regions occurs in the nonequilibrium state during spin-coating with solvent vapor saturated and strongly depends on the dimensions of the prepatterns. The ratio of periodic unit area to elevated one of a prepattern (β value) is found as one of the most important factors for wettability of a thin film. The dewetting of a thin film, guided by the edges of either elevated individual periodic lines or mesas, took place with self-assembled block copolymer nanostructure when the β value was greater than a critical value of 4 in our system.