Influence of growth temperature and deposition duration on the structure, surface morphology and optical properties of InN/YSZ (1 0 0)

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• 作者：N.C. Zoita ; ^{cnzoita@inoe.ro} ; C.E.A. Grigorescu
• 关键词：Indium nitride ; YSZ (1  ; 0  ; 0) ; Reactive magnetron sputtering ; Growth temperature ; Deposition duration ; Crystalline structure ; Surface morphology ; Band-gap
• 刊名：Applied Surface Science
• 出版年：2012
• 期刊代码：6_01694332
• 类别：ms
• 出版时间：1 June, 2012
• 卷：258
• 期：16
• 页码：6046-6051
• 文件大小：1036 K

摘要

InN films with the wurtzite structure have been grown directly on YSZ (1 0 0) substrate by the RF-magnetron sputtering technique. Strongly (0 0 2) oriented films with smooth surfaces (0.7-2.9 nm surface roughness depending on substrate temperature), were grown within 30 min. Films deposited for 60 min developed three-dimensional (3D) pyramidal islands on top of their surfaces, which diminished the residual elastic strain. The optical absorption edge and PL peak energy around 1.7 eV were found to redshift with increasing film thickness and substrate temperature.