Synthesis of hollow ellipsoidal silica nanostructures using a wet-chemical etching approach
- 作者：Henan Zhang ; Yi Zhou ; Yueru Li ; Teresa J. Bandosz ; Daniel L. Akins ; akins@sci.ccny.cuny.edu
- 关键词：Wet-chemical etching ; Hollow shells ; Ellipsoidal silica nanostructure ; Self-templated
- 刊名：Journal of Colloid and Interface Science
- 出版年：2012
- 期刊代码：125_00219797
- 类别：ch
- 出版时间：1 June, 2012
- 卷：375
- 期：1
- 页码：106-111
- 文件大小：1146 K
摘要
We have utilized wet-chemical etching of ellipsoidal silica nanoparticles (ESNs) to form silica nanoshells of a range of elliptical morphologies, with the thicknesses of the ellipsoidal silica nanoshells (ESSs) controlled through variation of synthesis conditions. A mechanism has been proposed to explain how the nanoshells are formed, and we demonstrate that the porosity of the silica ellipsoid plays a role in generating silica shells. Our self-templated, wet-etching approach is an attractive alternate procedure to the approaches presently in existence for the following reasons: (i) it is a facile, one-step process that directly produces ellipsoidal silica nanoshells, while overcoming barriers (such as requirement of removing a solid-core template seed) utilized in many reported chemical etching studies; (ii) it results in ellipsoidal silica nanostructures with dimension less than 100 nm; (iii) with an appropriate etchant, the roughness of the silica shells can be well-controlled; and (iv) it results in tunable, uniform size particles with controllable shell thicknesses. Moreover, the silica materials with the unique structures might be adjusted to meet practical application requirements.