Characterization of an Ar/O₂ magnetron sputtering plasma using a Langmuir probe and an energy resolved mass spectrometer

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• 作者：A. Palmero ; E.D. van Hattum ; H. Rudolph and F.H.P.M. Habraken
• 关键词：Magnetron sputtering ; Cathode poisoning ; Langmuir probe
• 刊名：Thin Solid Films
• 出版年：2006
• 期刊代码：78_00406090
• 类别：ph
• 出版时间：3 January 2006
• 卷：494
• 期：1-2
• 页码：18-22
• 文件大小：131 K

摘要

An argon plasma with a small amount of oxygen in a radio-frequency magnetron sputtering system has been studied experimentally. A Langmuir probe has been used to measure the ion density, electron temperature and plasma potential in the plasma, whereas an energy-resolved mass spectrometer has been used to investigate the ions flowing towards the growing film. It has been found that the argon ion density decreases when the oxygen gas is added to the plasma above a certain flow. A discussion on which process is responsible for this effect is presented.