H<sub>2sub>O outgassing from silica-filled polysiloxane TR55

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• 作者：Dinh ; L.N. ; Schildbach ; M.A. ; Maxwell ; R.S. ; Siekhaus ; W.J. ; Balazs ; B. ; McLean II ; W.
• 关键词：Silica ; Polysiloxane ; Water outgassing ; Temperature-programmed desorption/decomposition
• 刊名：Journal of Colloid and Interface Science
• 出版年：2004
• 期刊代码：125_00219797
• 类别：ch
• 出版时间：June 1, 2004
• 卷：274
• 期：1
• 页码：25-32
• 文件大小：538 K

摘要

Temperature-programmed desorption/decomposition (TPD) was employed to obtain the moisture content and outgassing kinetics of TR55, a silica-filled cross-linked polysiloxane. The total moisture content of TR55 in the as-received state and after 20&ndash;30 min of vacuum pumping in the load-lock prior to TPD was measured to be on the order of 0.35 wt%. Physisorbed H<sub>2sub>O and chemisorbed H<sub>2sub>O account for about 13.2 and 86.8%, respectively, of the 0.35 wt%measured moisture content. H<sub>2sub>O outgassing models based on the kinetics measured from TPD experiments suggest that loosely bound chemisorbed water outgasses in a dry environment slowly but continuously over many decades at or a little above room temperature. However, physisorbed water can be easily pumped out in a matter of hours at around 400 K.