Review of photochemical reaction constants of organic micropollutants required for UV advanced oxidation processes in water

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• 作者：B.A. Wols^a ; ^b ; ^{bas.wols@kwrwater.nl} ; ^{b.a.wols@tudelft.nl} ; C.H.M. Hofman-Caris^a
• 关键词：UV ; Advanced oxidation process ; Hydrogen peroxide ; Emerging contaminants ; Quantum yield ; Molar absorption ; OH radical reaction rate constant
• 刊名：Water Research
• 出版年：2012
• 期刊代码：57_00431354
• 类别：civ
• 出版时间：1 June, 2012
• 卷：46
• 期：9
• 页码：2815-2827
• 文件大小：1054 K

摘要

Emerging organic contaminants (pharmaceutical compounds, personal care products, pesticides, hormones, surfactants, fire retardants, fuel additives etc.) are increasingly found in water sources and therefore need to be controlled by water treatment technology. UV advanced oxidation technologies are often used as an effective barrier against organic contaminants. The combined operation of direct photolysis and reaction with hydroxyl radicals ensures good results for a wide range of contaminants. In this review, an overview is provided of the photochemical reaction parameters (quantum yield, molar absorption, OH radical reaction rate constant) of more than 100 organic micropollutants. These parameters allow for a prediction of organic contaminant removal by UV advanced oxidation systems. An example of contaminant degradation is elaborated for a simplified UV/H₂O₂ system.