Investigation on microtribological behavior of thin films using friction force microscopy

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• 作者：Lu ; Xin-Chun ; Shi ; Bing ; Li ; Lawrence K.Y. ; Luo ; Jianbin ; Wang ; Jihui ; Li ; Hengde
• 关键词：Friction force microscope ; Thin films ; Microtribology ; Micro friction and wear
• 刊名：Surface and Coatings Technology
• 出版年：2000
• 期刊代码：106_02578972
• 类别：ms
• 出版时间：June 1, 2000
• 卷：128-129
• 期：Complete
• 页码：341-345
• 文件大小：497 K

摘要

A purpose-built atomic force and friction force microscope (AFM/FFM) was employed to study micro friction and wear behavior of thin films of Langmiur–Blodgett (L–B), gold (Au), polytetrafluoroethylene (PTFE), silicon nitride (Si₃N₄) and PTFE/Si₃N₄ multi-layers prepared by different deposition techniques. The results show that the L–B film has a low friction coefficient but can be worn easily under a light load less than 20 nN; Au film and silicon wafer has a higher friction coefficient than that of L–B film and can be worn under a higher load of approximately 50 nN; the PTFE/Si₃N₄ multilayer has a lower friction coefficient than that of Si₃N₄ and has a higher micro wear resistance than that of PTFE. The friction force of the PTFE/Si₃N₄ multilayer is linear with the load at the nanometer scale. The worn track is formed in PTFE film and PTFE/Si₃N₄ multilayers when the load is greater than 70 nN.