摘要
We detected the H+ ions recoiled from Si(1xA0;1 1)-1 脳 1-H by medium energy 80-150 keV Ne+ impacts. The H+ fraction is dependent on emerging angle and emerging energy. With decreasing the emerging angle scaled from the surface normal the H+ fraction increases and reaches a saturation below 鈭?0掳 and almost 100%for emerging energy above 13 keV. In contrast, the charge state is not equilibrated even at 鈭?5掳. Such strong dependence on emerging angle is due to the location of H bound by Si atoms on top of the surface. The sensitivity to H on the surfaces is estimated to be better than 5 脳 1012 atoms/cm2 at a small emerging angle (胃out < 鈭?5掳), where the H+ fraction reaches 鈭?00%. The unexpectedly large energy spread for the recoiled H+ spectra is attributed to the Doppler broadening caused by the zero-point energy of the vibrating H-Si system and additionally to small energy transfers among the three bodies of Ne+ and H-Si, although the assumption of binary collision between Ne+ and H is approximately valid. This H detection technique can be widely applied to analysis of chemical reactions including adsorption and desorption mediated by water and hydroxyl on various kinds of metal-oxide surfaces.