光刻照明系统中新型均匀性补偿器的设计

详细信息    查看全文 | 推荐本文 |

英文篇名：Design and analysis on a novel uniform compensator in lithography lighting system 作者：李美萱 ; 阚晓婷 ; 王美娇 英文作者：LI Mei-xuan;KAN Xiao-ting;WANG Mei-jiao;Jilin Engineering Normal University,Institute for Interdisciplinary Quantum Information Technology;Jilin Engineering Laboratory for Quantum Information Technology;College of Optical and Electronic Information Changchun University of Science and Technology; 关键词：均匀性补偿器 ; 浸没式光刻 ; 高分辨率 ; 传统照明 ; 离轴照明 英文关键词：novel uniform compensator;;immersion lithography;;high resolution;;traditional lighting;;off-axis illumination 中文刊名：JGHW 英文刊名：Laser & Infrared 机构：吉林工程技术师范学院量子信息技术交叉学科研究院;吉林省量子信息技术工程实验室;长春理工大学光电信息学院; 出版日期：2019-01-20 出版单位：激光与红外 年：2019 期：v.49;No.484 基金：国家自然科学基金项目(No.91338116);; 吉林省教育厅科学研究项目(No.JJKH20181363KJ)资助 语种：中文; 页：JGHW201901019 页数：5 CN：01 ISSN：11-2436/TN 分类号：107-111

摘要

在超大规模集成电路中,为了满足波长193 nm数值孔径为1. 35的45 nm节点紫外光刻曝光光学系统对高分辨率的要求,设计了一种新型的均匀性补偿器件,用于提高照明系统的出射光均匀性从而实现光刻线条的高度均一性。该照明均匀性补偿器的主要功能是实现对照明视场的能量分布进行微调,从而减小系统的残余不均匀性,保证系统在掩膜面及硅片面上的能量分布均匀性达到更高指标的要求。此外,使用CODE V软件对该照明系统的均匀性进行仿真分析,研究发现采用新型均匀性补偿器可以在传统照明和离轴照明模式下同时的光刻照明系统对掩膜面的非均匀性均低于0. 5%。与传统匀光单元相比,该新型均匀性补偿器在不增加光刻照明系统机械设计和控制难度的基础上可明显提高光刻照明系统的均匀性,故该器件具有更好的应用价值和实用意义。
        In order to satisfy the high resolution requirement of lithography exposure optical system,which wavelength is 193 nm,numerical aperture NA is 1. 35,as well as its node is 45 nm,a novel lighting system with high uniformity has been proposed. The compensator of lighting system can adjust the energy distribution of illumination field,deduce the residual in-homogeneity of system,and ensure that higher uniformity index on the surfaces of mask and silicon. Through CODE V software,the uniformity of the lighting system was simulated. It is demonstrated that,under the traditional and off axis illumination mode,this system make the uniform of mask lower than 0. 5%. Compared with traditional uniform illumination unit,while the mechanical design and control difficulty of lithography illumination system weren't increased,the new uniform compensator improved the uniformity of lithography illumination system. So the device has the better applied value and practical significance.

引文

[1]LI Meixuan,WANG MeiJiao,WANG Li,et al.Design and tolerance analysis of compound eye lens in lithography lighting system[J].Laser&Infrared,2017,47(7):842-847.(in Chinese)李美萱,王美娇,王丽,等.光刻照明系统中复眼透镜的设计及公差分析[J].激光与红外,2017,47(7):842-847.
    [2]SONG Qiang,ZHU Jing,WANG Jian.A Mixed gradient algorithm for high performance DOE design in off-axis lithography illumination System[J].Acta Photonica Sinica,2015,35(1):0122005-1-0122010-9.(in Chinese)宋强,朱菁,王健.基于混合梯度下降的高性能光刻机离轴照明衍射光学元件设计[J].光学学报,2015,35(1):0122005-1-0122010-9.
    [3]PENG Haifeng,SUN Zhen.Design and analysis of a precision axial adjusting mechanism for optical elements in lithographic lens[J].Acta Photonica Sinica,2014,43(4):0422005-1-0422005-5.(in Chinese)彭海峰,孙振.光刻物镜中光学元件精密轴向调整机构的设计与分析[J].光子学报,2014,43(4):0422005-1-0422005-5.
    [4]CHEN Xu,LIU Weiqi,KANG Yusi,et al.Design and tolerance analysis of offner compensator[J].Opt.Precision Eng.,2010,18(1):88-93.(in Chinese)陈旭,刘伟奇,康玉思,等.Offner补偿器的结构设计与装调[J].光学精密工程,2010,18(1):88-93.
    [5]CUI Song,GAO Yingjun,RUAN Chi,et al.A microlens projection photolithographic system[J].Acta Photonica Sinica,2002,31(6):769-773.(in Chinese)崔崧,高应俊,阮驰,等.一种新型微透镜阵列成象式投影光刻系统的研究[J].光子学报,2002,31(6):769-773.
    [6]ZHAO Yang,GONG Yan.Design of beam shaping unit for deep ultraviolet lithographic illumination system[J].Opt.Precision Eng.,2011,19(1):29-34.(in Chinese)赵阳,巩岩.深紫外光刻照明系统光束整形单元的设计[J].光学精密工程,2011,19(1):29-34.
    [7]ZHAO Yang,GONG Yan.Methods of enhancing uniformities of output beams from beam expanding unit for illumination system of deep-ultraviolet lithography[J].Acta Optica Sinica,2012,32(8):0822004-0822009.(in Chinese)赵阳,巩岩.提高深紫外光刻照明系统扩束单元光束均匀性的方法[J].光学学报,2012,32(8):0822004-0822009.
    [8]FAN Zengming,LI Zhou,QIAN Lixun.Aspherical lens laser beam shaping system[J].Infrared and Laser Engineering,2012,41(2):353-357.(in Chinese)范增明,李卓,钱丽勋.非球面透镜组激光光束整形系统[J].红外与激光工程,2012,41(2):353-357.
    [9]CHEN Jinsong.Research on high quality reduction projecting system based on digital micro mirror device[J].Laser&Infrared,2006(03):206-209.(in Chinese)陈劲松.基于数字微镜的高质量精缩投影光刻系统的研制[J].激光与红外,2006(03):206-209.
    [10]Forbes G W.Robust,efficient computational methods for axially symmetric optical asperse[J].Opt Express,2010,18(19):19700-19712.
    [11]Zhang L,Liu D,Shi T,et al.Practical and accurate method for aspheric misalignment aberrations calibration in non-null interferometric testing[J].Applied Optics,2013,52(35):8501-8511.
    [12]Michael M.Pfeffer,Hochschule.Aspheric optics-from design to manufacturing and aspheric metrology[J].Adv.Opt.Techn,2016,5(3):199-200.
    [13]John E Childers,Tom Baker,Tim Emig,et al.Advanced testing requirements of diffractive optical elements for off axis illumination in photolithography[J].Proc of SPIE,2009,Vol.7430,74300S.
    [14]ZHANG Defu,LI Xianling,DONG Lijian,et al.Coupling error inhibition of eccentric adjustment mechanism design in lithographic objective lens[J].Acta Photonica Sinica,2015,35(1):0122005-1-0122005-9.(in Chinese)张德福,李显凌,东立剑,等.光刻物镜偏心调节机构抑制耦合误差设计[J].光子学报,2015,35(1):0122005-1-0122005-9.