不同溅射功率下PEN/Ti纳米复合薄膜的制备及性能研究
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摘要
采用直流磁控溅射法,在溅射气压为7.0×10~(-1) Pa和不同溅射功率(72～144W)下,制备出PEN/Ti纳米复合薄膜。研究了不同溅射功率对Ti膜微观组织、表面粗糙度、硬度及生长方式的影响规律。结果表明,直流磁控溅射法在PEN柔性衬底上沉积的钛膜是一种纳米多晶薄膜;随着溅射功率的增加,钛膜沉积速率及钛膜弹性模量皆升高,而钛膜表面粗糙度与钛膜晶粒尺寸均减小;溅射功率的增加将抑制钛膜柱状生长方式。在溅射气压为7.0×10~(-1) Pa,溅射功率为144 W时的工艺参数下,获得性能最佳的复合薄膜。
PEN/Ti nanocomposite films were prepared by DC magnetron sputtering at 7.0×10~(-1) Pa and different sputtering power(72-144 W).The effects of sputtering power on the microstructure,surface roughness,hardness and growth mode of the Ti films were studied.The results show that Ti film deposited on PEN flexible substrate by DC magnetron sputtering is a kind of nano-polycrystalline film.Besides,the deposition rate and the elastic modulus of Ti films increase with sputtering power increasing,while the surface roughness and the grain size of the Ti films decrease.Meanwhile,the mode of columnar growth is inhibited with the increase of sputtering power.When the sputtering pressure is 7.0×10~(-1) Pa and the sputtering power is 144 W,the composite film with the best properties is obtained.
PEN/Ti nanocomposite films were prepared by DC magnetron sputtering at 7.0×10~(-1) Pa and different sputtering power(72-144 W).The effects of sputtering power on the microstructure,surface roughness,hardness and growth mode of the Ti films were studied.The results show that Ti film deposited on PEN flexible substrate by DC magnetron sputtering is a kind of nano-polycrystalline film.Besides,the deposition rate and the elastic modulus of Ti films increase with sputtering power increasing,while the surface roughness and the grain size of the Ti films decrease.Meanwhile,the mode of columnar growth is inhibited with the increase of sputtering power.When the sputtering pressure is 7.0×10~(-1) Pa and the sputtering power is 144 W,the composite film with the best properties is obtained.
引文
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[25] Bao Y W,Wang W,Zhou Y C.Investigation of the relationship between elastic modulus and hardness based on depth-sensing indentation measurements[J].Acta Materialia,2004,52(18):5397-5404.
[2] Belkahla N,Teyssedre G,Saidi-Amroun N,et al.Space charge,conduction and photoluminescence measurements in gamma irradiated poly(ethylene-2,6-naphthalate)[J].Radiation Physics&Chemistry,2014,101(9):73-80.
[3] Money J K.PEN polyester:potential for fibers derived from naphthalene dicarboxylate(NDC)[J].Journal of Industrial Textiles,1995,25(1):24-38.
[4] Guehennec L L,Lopez-Heredia M A,Enkel B,et al.Osteoblastic cell behaviour on different titanium implant surfaces[J].Acta Biomaterialia,2008,4(3):535-543.
[5] Li Zhengxian,Wang Shaopeng,Mu Weiyi,et al.Development status of titanium surface treatment technologies[J].Materials China,2011,30(8):54-60(in Chinese).李争显,王少鹏,慕伟意,等.钛表面处理技术的研究现状[J].中国材料进展,2011,30(8):54-60.
[6] Dehghan-Manshadi A,Bermingham M,Dargusch M,et al.Metal injection moulding of titanium and titanium alloys:challenges and recent development[J].Powder Technology,2017,319(9):289-301.
[7] Xu Guodong,Wang Guisheng.Development of titanium and its industry[J].Chinese Journal of Rare Matals,2009,33(6):903-912(in Chinese).许国栋,王桂生.钛金属和钛产业的发展[J].稀有金属,2009,33(6):903-912.
[8] Li Zhong.Applications of titanium and titanium alloys in automotive field[J].The Chinese Journal of Nonferrous Metals,2010,20(S1):1034-1038(in Chinese).李中.钛及钛合金在汽车上的应用[J].中国有色金属学报,2010,20(S1):1034-1038.
[9] Yang Duo,Zhong Ning,Shang Hailong,et al.Microstructures and mechanical properties of(Ti,N)/Al nanocomposite films by magnetron sputtering[J].Acta Physica Sinica,2013,62(3):285-290(in Chinese).杨铎,钟宁,尚海龙,等.磁控溅射(Ti,N)/Al纳米复合薄膜的微结构和力学性能[J].物理学报,2013,62(3):285-290.
[10] Wang Jing,Ding Yutian,Chen Xiaoyan,et al.Preparation of Al-doped ZnO nanorod photoanode and and its application in dye-sensitized solar cells[J].Journal of the Chinese Ceramic Society,2013,41(11):1588-1593(in Chinese).王璟,丁雨田,陈小焱,等.Al掺杂ZnO纳米棒光阳极的制备及其在染料敏化太阳电池中的应用[J].硅酸盐学报,2013,41(11):1588-1593.
[11] Zhang Jicheng,Wu Weidong,Xu Hua,et al.The recent developments and applications of magnetron sputtering[J].Materials Review,2004,18(4):56-59(in Chinese).张继成,吴卫东,许华,等.磁控溅射技术新进展及应用[J].材料导报,2004,18(4):56-59.
[12] Shi Yongjing,Long Siyuan,Wang Jie,et al.Research advance of direct current magnetron sputtering[J].Materials Review,2008,22(1):65-69(in Chinese).石永敬,龙思远,王杰,等.直流磁控溅射研究进展[J].材料导报,2008,22(1):65-69.
[13] Kim J M,Thiyagarajan P,Rhee S W.Deposition of Aldoped ZnO films on polyethylene naphthalate substrate with radio frequency magnetron sputtering[J].Thin Solid Films,2010,518(20):5860-5865.
[14] Sandoval-Paz M G,Ramírez-Bon R.Indium tin oxide films deposited on polyethylene naphthalate substrates by radio frequency magnetron sputtering[J].Thin Solid Films,2009,517(8):2596-2601.
[15] Li Li,Wu Wei,Jin Yongzhong,et al.Research on forming process and surface topography of Ti thin film deposited by magnetron sputtering[J].Journal of Xihua University(Natural Science Edition),2009,28(2):92-95(in Chinese).李丽,吴卫,金永中,等.磁控溅射钛膜的沉积过程及表面形貌研究[J].西华大学学报(自然科学版),2009,28(2):92-95.
[16]张以忱.真空镀膜技术[M].北京:冶金工业出版社,2009:82-100.
[17]肖定全.薄膜物理与器件[M].北京:国防工业出版社,2011:155-158.
[18] Liu Zuli,Wei Helin,Wang Hanwen,et al.A radom model of thin film growth[J].Acta Physica Sinica,1999,48(7):1302-1308(in Chinese).刘祖黎,魏合林,王汉文,等.薄膜生长的随机模型[J].物理学报,1999,48(7):1302-1308.
[19] Li Xiaochan,Ke Peiling,Liu Xincai,et al.Discharge characteristics of Ti and film preparation using hybrid high power impulse magnetron sputtering[J].Acta Metallurgica Sinica,2014,50(7):879-885(in Chinese).李小婵,柯培玲,刘新才,等.复合高功率脉冲磁控溅射Ti的放电特性及薄膜制备[J].金属学报,2014,50(7):879-885.
[20]杨邦朝,王文生.薄膜物理与技术[M].成都:电子科技大学出版社,1994:82-83.
[21] Meng L J,Santos M P D.Investigations of titanium oxide films deposited by DC reactive magnetron sputtering in different sputtering pressures[J].Thin Solid Films,1993,226(1):22-29.
[22] Fan Ding,Dai Jingjie,Sun Yaoning,et al.Laser gas nitriding of commercial pure titanium TA2[J].Journal of Lanzhou University of Technology,2006,32(3):1-3(in Chinese).樊丁,戴景杰,孙耀宁,等.工业纯钛TA2的激光气体氮化[J].兰州理工大学学报,2006,32(3):1-3.
[23]胡赓祥.材料科学基础[M].上海:上海交通大学出版社,2010:372-373.
[24] Wang Fei,Liu Fang.Preparation and mechanical property study on nanostructured Ti deposited by magnetron sputtering[J].Hot Working Technology,2015,44(22):97-99(in Chinese).王飞,刘芳.磁控溅射法制备纳米晶纯钛及其力学性能研究[J].热加工工艺,2015,44(22):97-99.
[25] Bao Y W,Wang W,Zhou Y C.Investigation of the relationship between elastic modulus and hardness based on depth-sensing indentation measurements[J].Acta Materialia,2004,52(18):5397-5404.