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Si对Hastelloy N合金氧化行为的影响
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  • 英文篇名:Effects of Silicon on the Oxidation Behavior of Hastelloy N Superalloy at 850 °C
  • 作者:郭伟杰 ; 李建树 ; 陆燕玲 ; 张继祥 ; 周兴泰
  • 英文作者:Guo Weijie;Li Jianshu;Lu Yanling;Zhang Jixiang;Zhou Xingtai;Shanghai Institute of Applied Physics,Chinese Academy of Sciences;Chongqing Jiaotong University;
  • 关键词:Hastelloy ; N合金 ; 高温氧化 ; Si ; 氧化动力学 ; 氧化层
  • 英文关键词:Hastelloy N superalloy;;high-temperature oxidation;;silicon;;oxidation kinetics;;oxide scale
  • 中文刊名:COSE
  • 英文刊名:Rare Metal Materials and Engineering
  • 机构:中国科学院上海应用物理研究所;重庆交通大学;
  • 出版日期:2019-03-15
  • 出版单位:稀有金属材料与工程
  • 年:2019
  • 期:v.48;No.392
  • 基金:国家自然科学基金(51674237);; 超轻材料与表面技术教育部重点实验室资助
  • 语种:中文;
  • 页:COSE201903029
  • 页数:7
  • CN:03
  • ISSN:61-1154/TG
  • 分类号:189-195
摘要
利用不连续增重法,研究了不同Si含量的Hastelloy N合金850℃恒温氧化行为。结果表明,随Si含量的增加,氧化动力学曲线保持抛物线规律。氧化100 h后,氧化膜出现分层现象,最外层均为NiO、NiFe_2O_4等复合氧化物,中间层为Cr_2O_3、MoO_2等氧化物。由于在氧化层与基体界面处形成连续致密的SiO_2层,有效阻止Cr离子向外扩散进入氧化层,促进Hastelloy N合金中间层形成较为致密的Cr_2O_3氧化层,提高了合金的抗氧化性能。
        The isothermal oxidation behavior of Hastelloy N superalloy with different silicon contents at 850°C in air was investigated by a discontinuous increasing weight method.The results show that oxidation mass gain kinetics of the samples follows the parabolic law with increasing Si contest.It is observed that the surfaces of the alloys exhibit a multi-layer structure after 100 h oxidation.The outer oxide film of Hastelloy N superalloy mainly consists of NiO,NiFe_2O_(4 )and other oxide composites.The middle layer is confirmed to be Cr_2O_3 and MoO_2.A continuous and dense SiO_2 sublayer is formed at the metal-oxide interface,it is effective to prevent Cr diffusion.The addition of Si promotes the formation of a relatively continuous and compact Cr_2O_3 and it can strongly improve the oxidation resistance.
引文
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