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破悉热氨处理石墨烯法制备石墨型氮掺杂的生成机理
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摘要
氮掺杂石墨烯具有引人注目的属性而被研究多年,但其可能的生机过程至今还不清楚。本文中,我们针对热氨处理石墨烯制备氮掺杂石墨型过程进行基于从头算分子动力学的研究,提出了一种高度可行的生成机理。我们的结果表明在各种通常的石墨烯本征点缺陷中,只有单空位缺陷5-9和双空位缺陷555-777具有捕获氨基并使其脱氢的电子结构。这两个缺陷的局域结构特征与热动学效应结合在一起,对体系的复杂原子重组过程起决定作用,导致生成石墨型氮掺杂并同时完美修复相应缺陷。表明结构对称性、局域力场、多氨基之间的相互作用以及临时生成的桥位氮催化效应等在起重要作用。所获氮掺杂构型与实验发现完全一致。因此,所揭示的生成机理将对实验上目标制备具有特定属性和少缺陷的氮掺杂石墨烯具有重要指导意义。
Nitrogen-doped graphene(N-graphene) has attractive properties that have been widely studied over the years.However, its possible formation process still remains unclear.Here, we propose a highly feasible formation mechanism of the graphitic-N doing in thermally treated graphene with ammonia by performing ab initio molecular dynamic simulations at experimental conditions.Results show that among the commonly native point defects in graphene, only the single vacancy 5-9 and divacancy 555-777 have the desirable electronic structures to trap N-containing groups and to mediate the subsequent dehydrogenation processes.The local structure of the defective graphene in combining with the thermodynamic and kinetic effect plays a crucial role in dominating the complex atomic rearrangement to form graphitic-N which heals the corresponding defect perfectly.The importance of the symmetry, the localized force field, the interaction of multiple trapped N-containing groups, as well as the catalytic effect of the temporarily formed bridge-N are emphasized, and the predicted doping configuration agrees well with the experimental observation.Hence, the revealed mechanism will be helpful for realizing the targeted synthesis of N-graphene with reduced defects and desired properties.
引文
[1]Li,X.-F.;Lian,K.-Y.;Liu,L.;Wu,Y.;Qiu,Q.;Jiang,J.;Deng,M.;Luo,Y.Sci.Rep.,2016,6:23495.
    [2]Li,X.-F.;Lian,K.-Y.;Qiu,Q.;Luo,Y.Nanoscale,2015,7:4156.

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