磁控溅射镀膜机离子流密度及能量的测量研究
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摘要
本文首先介绍了磁控溅射镀膜过程中等离子体的性质、主要参数、气体放电过程以及等离子体的研究现状。其次概述了磁控溅射技术的发展状况、磁控溅射原理及特点；并分析了溅射沉积薄膜的各种工艺参数对薄膜特性的影响尤其是等离子体离子流密度和能量对薄膜的影响。
对射频磁控溅射镀膜机等离子体离子流密度的分布规律进行系统地研究。引入离子电流密度这个概念,并用离子电流密度来表征射频磁控溅射镀膜机内等离子体离子流密度。本文利用法拉第探针测量离子流密度。详细地介绍了法拉第探针的结构设计、工作原理和测量系统。开发了相应的计算机数据采集系统。
对射频磁控溅射镀膜机等离子体离子能量的分布规律进行了研究。使用法拉第能量分析器测量离子能量。详细地介绍了法拉第能量分析器的结构设计工作原理及测量系统。
使用法拉第探针成功地测量出在工作气压(1Pa-2Pa)、射频放电功率(30W-90W)范围内磁控溅射镀膜机内离子流密度分布规律。并发现离子流密度分布规律和实验后靶材的刻蚀情况相吻合。此外,还利用法拉第能量分析器成功地测量出在工作气压(1.5Pa)、射频放电功率(30W-90W)范围内磁控溅射镀膜机内离子能量的分布规律。发现实验测量得到的离子平均能量与利用OOPIC模拟得到的离子平均能量比较吻合,两者的相对误差在14.7%左右。
This thesis introduces firstly the character and the main parameter of the plasma in the process of the Magnetron sputtering filming, the discharge process, and the research actuality about plasma. Secondly this thesis summarizes the development of the Magnetron sputtering, the principle and the characteristic of the Magnetron sputtering. In addition This thesis analyses that the influences which kinds of technological parameter of sputtering sediment filming affect the character of the film, especially the influences of the ion density and the ion en-ergy affects the film.
This thesis studies systemically the distribution regularity of the ion density of the plasma in radio frequency Magnetron sputtering filming machine. Intro-duces the concept of the ion current density, and uses the ion current density to describe the ion density of the plasma in radio frequency Magnetron sputtering filming machine. It uses the Faraday probe to measure the ion current density in the paper. And it introduces in detail the structured design, the principle of opera-tion, the measure system of the Faraday probe. It designs the relevant computer data acquisition system.
This thesis studies systemically the distribution regularity of the ion energy of the plasma in radio frequency Magnetron sputtering filming machine. It uses the Faraday energy analyzer to measure the ion energy in the paper. It introduces in detail the structured design, the principle of operation, the measure system of the Faraday energy analyzer.
It is successful for the Faraday probe to measure the distribution regularity of the ion current density of the plasma in radio frequency Magnetron sputtering filming machine in the condition that the background pressure changes from 1Pa to 2Pa and the radio frequency discharge power is from 30W to 90W. And the distribution regularity of the ion current density is the same as the sculpture con- dition of the target after the experiment. Besides, it is also is successful for the Faraday energy analyzer to measure the distribution regularity of the ion energy of the plasma in radio frequency Magnetron sputtering filming machine in the con-dition that the background pressure is 1.5Pa and the radio frequency discharge power changes from 30W to 90W. The ion average energy measured by experiment is the same as the ion average energy simulated by OOPIC. Fractional error be-tween the ion average energy measured by experiment to the ion average energy simulated by OOPIC is about 14.7%.
对射频磁控溅射镀膜机等离子体离子流密度的分布规律进行系统地研究。引入离子电流密度这个概念,并用离子电流密度来表征射频磁控溅射镀膜机内等离子体离子流密度。本文利用法拉第探针测量离子流密度。详细地介绍了法拉第探针的结构设计、工作原理和测量系统。开发了相应的计算机数据采集系统。
对射频磁控溅射镀膜机等离子体离子能量的分布规律进行了研究。使用法拉第能量分析器测量离子能量。详细地介绍了法拉第能量分析器的结构设计工作原理及测量系统。
使用法拉第探针成功地测量出在工作气压(1Pa-2Pa)、射频放电功率(30W-90W)范围内磁控溅射镀膜机内离子流密度分布规律。并发现离子流密度分布规律和实验后靶材的刻蚀情况相吻合。此外,还利用法拉第能量分析器成功地测量出在工作气压(1.5Pa)、射频放电功率(30W-90W)范围内磁控溅射镀膜机内离子能量的分布规律。发现实验测量得到的离子平均能量与利用OOPIC模拟得到的离子平均能量比较吻合,两者的相对误差在14.7%左右。
This thesis introduces firstly the character and the main parameter of the plasma in the process of the Magnetron sputtering filming, the discharge process, and the research actuality about plasma. Secondly this thesis summarizes the development of the Magnetron sputtering, the principle and the characteristic of the Magnetron sputtering. In addition This thesis analyses that the influences which kinds of technological parameter of sputtering sediment filming affect the character of the film, especially the influences of the ion density and the ion en-ergy affects the film.
This thesis studies systemically the distribution regularity of the ion density of the plasma in radio frequency Magnetron sputtering filming machine. Intro-duces the concept of the ion current density, and uses the ion current density to describe the ion density of the plasma in radio frequency Magnetron sputtering filming machine. It uses the Faraday probe to measure the ion current density in the paper. And it introduces in detail the structured design, the principle of opera-tion, the measure system of the Faraday probe. It designs the relevant computer data acquisition system.
This thesis studies systemically the distribution regularity of the ion energy of the plasma in radio frequency Magnetron sputtering filming machine. It uses the Faraday energy analyzer to measure the ion energy in the paper. It introduces in detail the structured design, the principle of operation, the measure system of the Faraday energy analyzer.
It is successful for the Faraday probe to measure the distribution regularity of the ion current density of the plasma in radio frequency Magnetron sputtering filming machine in the condition that the background pressure changes from 1Pa to 2Pa and the radio frequency discharge power is from 30W to 90W. And the distribution regularity of the ion current density is the same as the sculpture con- dition of the target after the experiment. Besides, it is also is successful for the Faraday energy analyzer to measure the distribution regularity of the ion energy of the plasma in radio frequency Magnetron sputtering filming machine in the con-dition that the background pressure is 1.5Pa and the radio frequency discharge power changes from 30W to 90W. The ion average energy measured by experiment is the same as the ion average energy simulated by OOPIC. Fractional error be-tween the ion average energy measured by experiment to the ion average energy simulated by OOPIC is about 14.7%.
引文
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2.崔虎.射频磁控溅射镀膜过程中离子输运和溅射行为的模拟计算[D],西安：西北工业大学,2005
3.赵化侨.等离子体化学与工艺[M],武汉：中国科学技术大学出版社,1993,27-38
4.王晓冬,巴德纯,张世伟,张以忱.真空技术[M],北京：冶金工业出版社,2006,42-54
5. A.D. Richards, B.E.Thompson, and H.H.Swain, Continuum modelling of argon radio frequency glow discharges [J], Appl. Phys. Lett.,1987,50(9):482-494
6.杨幼桐,杜凯,张菲,宋国利,万鹏程,刘艳春.等离子体的诊断方法[J],哈尔滨学院学报,2005,26(10)：132-135
7.陶孟仙.等离子体特性的静电探针测量技术[J],佛山科学技术学院学报(自然科学版),2000,18(3)：11-15
8. N St J Braithwaite, J P Booth,G Cunge. A novel electrostatic probe method for ion flux measurements[J]. Plasma Sources Sci. Technol,1996,5:677-684
9.孙秋普,邓新绿,马腾才,宋远红.用发射探针降落法测量等离子体空间电位[J],核聚变与等离子体物理,2004,24(1)：67-72
10. Mitchell Louis Ronald Walker. Effects of Facility Backpressure on the Per-formance and Plume of a Hall Thruster[D]. Huntsville:The University of Michigan,2005,47-69
11.Yassir Azziz. Instrument Development and Plasma Measurements on a 200-Watt Hall Thruster Plume[D]. Massachusetts:Massachusetts Institute of Technology,2003
12.吴先球,陈俊芳,蒋珍美,熊予莹,吴开华,任兆杏.等离子体离子能量自动分析器的研制和应用[J].电子学报,2003,31(2)：186-188
13.邹积岩,杨磊,程仲元,张汉明.真空电弧镀膜等离子体参数的测量[J].微细加工技术,1997,1：70-75
14.中国科学院,等离子体诊断学[J].原子能科学技术,1994,199-211
15.牛田野,曹金祥,刘磊,刘金英,王艳,王亮,吕铀,王舸,朱颖.低温氩等离子体中 的单探针和发射光谱诊断技术[J].物理学报,2007,56(4)：2330-2336
1 6.]朱永红,吴卫东,陆晓曼,唐永建,孙卫国.采用发射光谱和朗缪尔探针诊断低温低压氢等离子体[J],强激光与粒子束,2008,20(4)：601-606
17.王文清,易忠.用发射探针确定等离子体空间电位的实验研究[J],空间科学学报,1995,15(2)：126-130
18.冯晓珍,田忠玉,明林洲,尹猷均,刘奕华.用于等离子体电位测量的电容探针和发射探针[J].核聚变与等离子体物理,1995,15(1)：59-64
19.刘宇宏,邓新绿,陆文琪.差分发射探针在微波等离子体中的应用[J],核聚变与等离子体物理,1998,18(1)：48-51
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