ArF准分子激光高反射薄膜技术研究
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摘要
集成电路制造业是我国给予高度关注的战略产业之一。随着光刻技术的不断发展，集成电路的集成度越来越高，集成电路的尺寸越来越小，自20世纪末以来，ArF准分子193nm激光投影光刻机已成为90nm和65nm节点极大规模集成电路制造的主流装备，因此，在ArF准分子激光器及其相应光学系统中所应用的193nm光学薄膜元件具有重要作用。本文对深紫外193nm激光光学系统所使用的高反射薄膜光学元件进行了研究与制备，对光学薄膜元件提出的低损耗和高损伤阈值等技术要求，具体研究内容包括以下几个方面：
1．为了制备出满足上述性能要求的光学薄膜元件，首先必须准确确定出所用薄膜材料在相应波段范围内的光学常数(折射率和消光系数)。材料的光学常数在薄膜状态下和块状状态下差别很大，并依赖所采用的沉积方法。在各个具体的制备条件下，精确解析薄膜的光学常数是制备出高性能薄膜光学元件的重要一环。根据热蒸发制备的LaF3薄膜生长特性，采用了一种折射率非均匀性薄膜光学常数的表征方法，该方法是基于非均匀模型和光度法同时拟合确定薄膜的光学常数，并且与椭圆偏振法相互验证，提高了薄膜在深紫外波段光学常数的解析精度。
2．薄膜的光学性能依赖于沉积方法和沉积条件，需要对不同沉积条件和工艺参数下制备的薄膜进行分析。对热蒸发制备的LaF3、MgF2、GdF3和AlF3薄膜在不同沉积温度和沉积速率的条件下进行光学性能和结构的详细研究，并对薄膜的光学性能、微观结构、化学组分和激光量热吸收等进行系统表征，从而确定各种工艺参数下的薄膜特性。
3．基于高反射薄膜体内电场强度的分布特点，优化设计了多层高反射薄膜，根据设计的结果以及优化的沉积工艺，制备了193nm波段高反射薄膜，并进行了薄膜损耗和误差反演分析，找出了理论设计和实际制备之间的误差原因，从而完善高反射薄膜的沉积工艺。
4．对制备的深紫外193nm多层高反射薄膜进行了ArF准分子激光损伤测试，综合分析薄膜的损伤形貌，系统研究薄膜特性及其演变与薄膜损伤之间的相关性，从理论和实验两方面出发，推断出ArF准分子激光对氟化物高反射薄膜的损伤机理，并在优化薄膜的表面缺陷、聚集密度和膜系设计的基础上，将薄膜的激光损伤阈值在1-on-1损伤模式下从1.0J/cm2提高到了2.25J/cm2。
Integrated circuit (IC) manufacturing is one of the strategic industries to whichis given great attention in our country. With the continuous development oflithography technology, the density of integrated circuit has become higher, and thesize has become smaller. Since the end of the20th century, ArF excimer laserprojection lithography has become the mainstream equipment of90nm and65nmnode huge scale integrated circuit manufacturing. Therefore,193nm optical thin filmdevices which applied in ArF excimer laser and its corresponding optical systemhave played an important role. In this paper, the research and preparation have beencarried on the high reflection (HR) coatings which is used by193nm laser opticalsystem, the technical requirements of low loss and high damage threshold for opticalthin film components have been proposed. The main contents are as follows:
1. In order to prepare the optical thin film components which meet theperformance requirements, you must accurately identify the optical constants(refractive index and extinction coefficient) of the thin film materials used in thecorresponding wavelength range. The optical constants of the materials in the thinfilm state and the block state vary greatly, and depend on the deposition methods.Under various specific preparation conditions, accurate analysis of thin film opticalconstants is one of the most important aspects of the preparation of highperformance film optical elements. According to LaF3film growth characteristicsprepared by thermal evaporation, this paper proposes a characterization of the refractive index inhomogeneity of thin film optical constants, which is based oninhomogeneous model and spectrophotometry method to determine the opticalconstants of thin film at the same time, and to do the mutual authentication with themethod of ellipsometry, and to improve the optical constants of analytic precisionwhen the thin film is in the deep ultraviolet wavelength range.
2. The optical properties of thin film depend on the deposition methods andconditions, and the analysis on the thin film which prepared under differentdeposition conditions and process parameters are needed. Detailed study on theoptical properties and structure of LaF3, MgF2, GdF3and AlF3film that prepared bythermal evaporation under different deposition temperature and deposition rate, andsystematical characterization on optical properties, microstructure, chemicalcomposition and laser calorimetry of thin film. So as to determine the film propertiesunder various process parameters.
3. Based on the distribution characteristics of electric field intensity in the bodyof HR coatings, the thin film has been optimized designed. According to the result ofdesign and optimization of deposition process, the193nm HR coatings has beenprepared, the thin film loss and error of inversion have been analyzed, and identifythe reasons of the error between the theoretical design and practical preparation, soas to improve the HR coatings deposition process.
4. For the preparation193nm HR coatings, ArF excimer laser damage test hasbeen done, analyze the thin film’s damage morphology, systematically research thecorrelation between the thin film properties and its evolution and the coating damage.Starting from the two aspects of theory and experiment, deduce the ArF excimerlaser damage mechanism of fluoride HR coatings, increase the film laser induceddamage threshold from1.0J/cm2to2.25J/cm2on the basis of optimizing use ofsurface defects, packing density and coating design under1-on-1damage mode.
1．为了制备出满足上述性能要求的光学薄膜元件，首先必须准确确定出所用薄膜材料在相应波段范围内的光学常数(折射率和消光系数)。材料的光学常数在薄膜状态下和块状状态下差别很大，并依赖所采用的沉积方法。在各个具体的制备条件下，精确解析薄膜的光学常数是制备出高性能薄膜光学元件的重要一环。根据热蒸发制备的LaF3薄膜生长特性，采用了一种折射率非均匀性薄膜光学常数的表征方法，该方法是基于非均匀模型和光度法同时拟合确定薄膜的光学常数，并且与椭圆偏振法相互验证，提高了薄膜在深紫外波段光学常数的解析精度。
2．薄膜的光学性能依赖于沉积方法和沉积条件，需要对不同沉积条件和工艺参数下制备的薄膜进行分析。对热蒸发制备的LaF3、MgF2、GdF3和AlF3薄膜在不同沉积温度和沉积速率的条件下进行光学性能和结构的详细研究，并对薄膜的光学性能、微观结构、化学组分和激光量热吸收等进行系统表征，从而确定各种工艺参数下的薄膜特性。
3．基于高反射薄膜体内电场强度的分布特点，优化设计了多层高反射薄膜，根据设计的结果以及优化的沉积工艺，制备了193nm波段高反射薄膜，并进行了薄膜损耗和误差反演分析，找出了理论设计和实际制备之间的误差原因，从而完善高反射薄膜的沉积工艺。
4．对制备的深紫外193nm多层高反射薄膜进行了ArF准分子激光损伤测试，综合分析薄膜的损伤形貌，系统研究薄膜特性及其演变与薄膜损伤之间的相关性，从理论和实验两方面出发，推断出ArF准分子激光对氟化物高反射薄膜的损伤机理，并在优化薄膜的表面缺陷、聚集密度和膜系设计的基础上，将薄膜的激光损伤阈值在1-on-1损伤模式下从1.0J/cm2提高到了2.25J/cm2。
Integrated circuit (IC) manufacturing is one of the strategic industries to whichis given great attention in our country. With the continuous development oflithography technology, the density of integrated circuit has become higher, and thesize has become smaller. Since the end of the20th century, ArF excimer laserprojection lithography has become the mainstream equipment of90nm and65nmnode huge scale integrated circuit manufacturing. Therefore,193nm optical thin filmdevices which applied in ArF excimer laser and its corresponding optical systemhave played an important role. In this paper, the research and preparation have beencarried on the high reflection (HR) coatings which is used by193nm laser opticalsystem, the technical requirements of low loss and high damage threshold for opticalthin film components have been proposed. The main contents are as follows:
1. In order to prepare the optical thin film components which meet theperformance requirements, you must accurately identify the optical constants(refractive index and extinction coefficient) of the thin film materials used in thecorresponding wavelength range. The optical constants of the materials in the thinfilm state and the block state vary greatly, and depend on the deposition methods.Under various specific preparation conditions, accurate analysis of thin film opticalconstants is one of the most important aspects of the preparation of highperformance film optical elements. According to LaF3film growth characteristicsprepared by thermal evaporation, this paper proposes a characterization of the refractive index inhomogeneity of thin film optical constants, which is based oninhomogeneous model and spectrophotometry method to determine the opticalconstants of thin film at the same time, and to do the mutual authentication with themethod of ellipsometry, and to improve the optical constants of analytic precisionwhen the thin film is in the deep ultraviolet wavelength range.
2. The optical properties of thin film depend on the deposition methods andconditions, and the analysis on the thin film which prepared under differentdeposition conditions and process parameters are needed. Detailed study on theoptical properties and structure of LaF3, MgF2, GdF3and AlF3film that prepared bythermal evaporation under different deposition temperature and deposition rate, andsystematical characterization on optical properties, microstructure, chemicalcomposition and laser calorimetry of thin film. So as to determine the film propertiesunder various process parameters.
3. Based on the distribution characteristics of electric field intensity in the bodyof HR coatings, the thin film has been optimized designed. According to the result ofdesign and optimization of deposition process, the193nm HR coatings has beenprepared, the thin film loss and error of inversion have been analyzed, and identifythe reasons of the error between the theoretical design and practical preparation, soas to improve the HR coatings deposition process.
4. For the preparation193nm HR coatings, ArF excimer laser damage test hasbeen done, analyze the thin film’s damage morphology, systematically research thecorrelation between the thin film properties and its evolution and the coating damage.Starting from the two aspects of theory and experiment, deduce the ArF excimerlaser damage mechanism of fluoride HR coatings, increase the film laser induceddamage threshold from1.0J/cm2to2.25J/cm2on the basis of optimizing use ofsurface defects, packing density and coating design under1-on-1damage mode.
引文
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