ZL109铝合金表面离子镀TiN膜的工艺及性能研究
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摘要
材料表面处理技术已成为当前改善材料表面各种性能的有力手段,是材料科学界的研究热点。TiN薄膜以其高的抗磨、抗蚀的优异性能在工业领域得到了广泛的应用。铝合金硬度和屈服强度低,相对钢及其它材料来说表现出了很差的耐磨性,因而减少了其使用寿命,并限制了其使用范围。因此,在铝合金表面沉积硬质薄膜,比如TiN薄膜,以达到提高铝合金的应用范围和使用寿命有着重要的意义。
本文采用多弧离子镀膜技术在ZL109表面沉积TiN薄膜,通过采用L9(34)正交试验的方法并以显微硬度和比磨损率两个性能指标对沉积工艺进行了研究,并得到了在沉积温度300℃,沉积偏压120V,氮分压1.2Pa,沉积时间1h时,TiN薄膜具有最佳的综合性能。在沉积工艺对性能的影响中发现,薄膜的相组成和应力状态是影响TiN薄膜性能的关键因素。
采用多弧离子镀膜技术在ZL109铝合金表面沉积TiN薄膜的形貌及物相分析表明, TiN薄膜在ZL109铝合金表面生长方式在温度较低时为平面生长模式,随着沉积温度的升高及时间的延长,生长方式向岛状生长模式转化,其物相具有(111)晶面的择优取向。微量磨损试验表明:ZL109铝合金表面镀TiN薄膜后的耐磨性大约提高了10倍。抗高温氧化试验表明,镀TiN薄膜试样在500℃时开始氧化,并在600℃时氧化加剧。
Nowadays, the technology of materials surface treatment has become a powerful tool to improve the properties of materials surface, and has become an important research point in materials science. TiN film whose outstanding performance is high wear and corrosion resistance has been widely applied in the industry. Aluminum alloy has low hardness and yield strength. Compared with the steel and other materials, its wear resistance is poor. Thus its service life is reduced, and the scope of its use is limited. Therefore, hard film, such as TiN film, deposited on the surface of aluminum alloy is very important to increase the scope of application and service life of aluminum alloy.
The TiN film is deposited by multi-arc ion plating technology on the surface of ZL109 aluminum alloy in this paper. The deposited technique is researched by the use of orthogonal test of L9(34). Two properties targets which are micro-hardness and wear rate are adopted in this orthogonal test. As the deposited temperature is 300℃, deposited bias voltage is 120V,nitrogen partial pressure is 1.2Pa, and deposited time is 1h, the best comprehensive performance of TiN films is obtained. From the effect of deposited technique to properties, it is found that phase constitution and stress condition seriously affect the properties of TiN film.
According to the study of microstructure and phase constitution of TiN film deposited by multi-arc ion plating technology on the surface of ZL109 aluminum, the result shows that the growth pattern of TiN film is in the planar growth mode at the low temperature. As the deposition temperature and time increment, the growth pattern is changed to island mode. And the phase constitution has (111) phase face preferred orientation.
The wear resistance test shows that the wear resistance of ZL109 aluminum alloy has been increased about 10 times after depositing TiN film on its surface. The anti-oxidation in the high temperature test shows that the sample with deposited TiN film begins to be oxidized at the temperature 500℃, and seriously oxidized at the temperature 600℃.
本文采用多弧离子镀膜技术在ZL109表面沉积TiN薄膜,通过采用L9(34)正交试验的方法并以显微硬度和比磨损率两个性能指标对沉积工艺进行了研究,并得到了在沉积温度300℃,沉积偏压120V,氮分压1.2Pa,沉积时间1h时,TiN薄膜具有最佳的综合性能。在沉积工艺对性能的影响中发现,薄膜的相组成和应力状态是影响TiN薄膜性能的关键因素。
采用多弧离子镀膜技术在ZL109铝合金表面沉积TiN薄膜的形貌及物相分析表明, TiN薄膜在ZL109铝合金表面生长方式在温度较低时为平面生长模式,随着沉积温度的升高及时间的延长,生长方式向岛状生长模式转化,其物相具有(111)晶面的择优取向。微量磨损试验表明:ZL109铝合金表面镀TiN薄膜后的耐磨性大约提高了10倍。抗高温氧化试验表明,镀TiN薄膜试样在500℃时开始氧化,并在600℃时氧化加剧。
Nowadays, the technology of materials surface treatment has become a powerful tool to improve the properties of materials surface, and has become an important research point in materials science. TiN film whose outstanding performance is high wear and corrosion resistance has been widely applied in the industry. Aluminum alloy has low hardness and yield strength. Compared with the steel and other materials, its wear resistance is poor. Thus its service life is reduced, and the scope of its use is limited. Therefore, hard film, such as TiN film, deposited on the surface of aluminum alloy is very important to increase the scope of application and service life of aluminum alloy.
The TiN film is deposited by multi-arc ion plating technology on the surface of ZL109 aluminum alloy in this paper. The deposited technique is researched by the use of orthogonal test of L9(34). Two properties targets which are micro-hardness and wear rate are adopted in this orthogonal test. As the deposited temperature is 300℃, deposited bias voltage is 120V,nitrogen partial pressure is 1.2Pa, and deposited time is 1h, the best comprehensive performance of TiN films is obtained. From the effect of deposited technique to properties, it is found that phase constitution and stress condition seriously affect the properties of TiN film.
According to the study of microstructure and phase constitution of TiN film deposited by multi-arc ion plating technology on the surface of ZL109 aluminum, the result shows that the growth pattern of TiN film is in the planar growth mode at the low temperature. As the deposition temperature and time increment, the growth pattern is changed to island mode. And the phase constitution has (111) phase face preferred orientation.
The wear resistance test shows that the wear resistance of ZL109 aluminum alloy has been increased about 10 times after depositing TiN film on its surface. The anti-oxidation in the high temperature test shows that the sample with deposited TiN film begins to be oxidized at the temperature 500℃, and seriously oxidized at the temperature 600℃.
引文
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[17]黄美东,林国强,董闯,等.负偏压在电弧离子镀沉积TiN/TiCN多层薄膜中的作用[J].金属热处理,2001,26(7):17-20.
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