集群磁流变效应超光滑抛光加工过程研究
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摘要
随着微电子、光电子技术的发展需求,对光学玻璃、单晶硅、工程陶瓷等硬脆材料的加工精度和表面质量也提出了越来越高的要求,一般需要达到超光滑表面,而这类材料的脆性高,可加工性差,加工表面极易产生微裂纹等损伤。由于传统研磨加工方法效率低下、加工质量不易控制,难以适应发展的需要。因此,如何实现硬脆材料表面的超光滑抛光成为超精密加工技术领域的一个重要研究课题,受到广泛重视。
首先,本文分析了集群磁流变效应平面抛光原理,并基于磁流变抛光加工原理,提出以集群分布式磁性体构成抛光工具形成集群磁流变效应抛光的新方法。论文对集群磁流变效应抛光盘内磁性体的磁极方向进行了仿真分析,得出磁极异向排布优于同向排布的结论；同时,优化了抛光盘盘面结构,并对磨料的运动轨迹进行了仿真分析；通过分析磁流变抛光工作液的组成、特性、流变机理和性能要求,对磁流变抛光工作液的各组成成分比例进行了优化。
其次,本文研制了集群磁流变效应平面抛光试验装置,对试验装置的旋转抛光盘、可调节磁场装置、磁流变液循环系统、工件装夹装置等组成部分进行了优化设计。对K9光学玻璃和硅片及YAG陶瓷进行了可行性加工试验,最终实现K9玻璃表面粗糙度Ra0.005μm、硅片Ra0.016μm、YAG陶瓷Ra0.015μm。结果表明,集群磁流变效应平面抛光加工方法可行,可以实现高精度抛光。
最后,利用研制的集群磁流变效应平面抛光试验装置和自行配制的磁流变抛光工作液,对K9平面玻璃和硅片进行抛光加工试验,得到了加工时间、加工间隙、磁场强度、转速(抛光盘转速、工件盘转速、平摆速度)、羰基铁粉浓度、磨料浓度、磨料种类、磨料与铁粉粒径比等参数对加工效果的影响规律,总结出工艺参数优化选择原则。在工艺参数优化的基础上,对其它类型材料的工件进行加工试验,探索不同材料在应用集群磁流变效应加工方式的加工效果,为磁流变效应加工方法拓宽应用范围。试验研究表明,集群磁流变平面抛光加工方法可行,所研制的集群磁流变平面抛光加工装置具有良好的加工性能。
With the development of microelectronics and optoelectronic technology, there is an increasing demand to hard brittle material's machining accuracy and the surface quality, such as optical glass, silicon and project ceramics, it needs to achieve ultra smooth surface generally. But this kind of material's brittleness is high and the machinability is bad, so it is extremely easy to have damages on the processing surface. Because of the tradition abrasive machining method's efficiency is low, and the processing quality is not easy to control, it is difficult to meet develop need. Therefore, how to realize ultra-smooth polishing to hard brittle material have been become an important research issue in ultra-precision processing technology area, receives widespread attention.
First, the author analyzed the principle of the cluster MR-effect plane polishing, a new method-cluster MR-effect polishing which formed by cluster distributed magnetic body has been put forward based on the principle of MR polishing processing in this article. The conclusion that the different magnetic pole arrangement is superior to the same magnetic pole arrangement gets through simulation analysis to magnetic pole, the structure of the polishing disk is designed optimally, and the movement of abrasive trajectory is analyzed through simulation. By analyzing the magnetorheological finish working fluid's composition, properties, rheological mechanism and performance requirements, the proportion of various components are optimized.
Next, this article has developed a cluster MR-effect plane polishing experimental device, and design optimally to its component, such as rotary polishing disk, adjustable magnetic device, recycling and storing device and clamping workpiece device. Have carried on the feasible processing experiment to K9 optical glass, silicon and YAG ceramics, the surface roughness of K9 glass, silicon and YAG ceramics can achieve respectively Ra0.005μm, Ra0.016μm and Ra0.015μm finally after processed. The result indicated that the cluster MR-effect plane polishing method is feasible, can realize high accuracy polishing.
Finally, using the experimental device and the magnetorheological finish working fluid which is selfmade, carries on the polishing experiment to K9 glass and silicon.The influence rule of parameters on processing effect is obtained, such as the polishing time, the machining gap. the magnetic field intensity, the speed (the rotational speed of polishing disk, the rotational speed of work piece disk and swing speed), the carbonyl iron consistency, the content of abrasives, the abrasive material type, the the size ratio of abrasive and iron powder. Summarized the technological parameter optimization selection principle. Based on the technological parameter optimizes, carries on the processing experiment to the different type material's work piece, explores the processing effect to different material in using the cluster MR-effect plane polishing method, expands the method's application scope. The experimental study indicated that the cluster MR-effect plane polishing method is feasible, and the designed processing equipment has good workability.
首先,本文分析了集群磁流变效应平面抛光原理,并基于磁流变抛光加工原理,提出以集群分布式磁性体构成抛光工具形成集群磁流变效应抛光的新方法。论文对集群磁流变效应抛光盘内磁性体的磁极方向进行了仿真分析,得出磁极异向排布优于同向排布的结论；同时,优化了抛光盘盘面结构,并对磨料的运动轨迹进行了仿真分析；通过分析磁流变抛光工作液的组成、特性、流变机理和性能要求,对磁流变抛光工作液的各组成成分比例进行了优化。
其次,本文研制了集群磁流变效应平面抛光试验装置,对试验装置的旋转抛光盘、可调节磁场装置、磁流变液循环系统、工件装夹装置等组成部分进行了优化设计。对K9光学玻璃和硅片及YAG陶瓷进行了可行性加工试验,最终实现K9玻璃表面粗糙度Ra0.005μm、硅片Ra0.016μm、YAG陶瓷Ra0.015μm。结果表明,集群磁流变效应平面抛光加工方法可行,可以实现高精度抛光。
最后,利用研制的集群磁流变效应平面抛光试验装置和自行配制的磁流变抛光工作液,对K9平面玻璃和硅片进行抛光加工试验,得到了加工时间、加工间隙、磁场强度、转速(抛光盘转速、工件盘转速、平摆速度)、羰基铁粉浓度、磨料浓度、磨料种类、磨料与铁粉粒径比等参数对加工效果的影响规律,总结出工艺参数优化选择原则。在工艺参数优化的基础上,对其它类型材料的工件进行加工试验,探索不同材料在应用集群磁流变效应加工方式的加工效果,为磁流变效应加工方法拓宽应用范围。试验研究表明,集群磁流变平面抛光加工方法可行,所研制的集群磁流变平面抛光加工装置具有良好的加工性能。
With the development of microelectronics and optoelectronic technology, there is an increasing demand to hard brittle material's machining accuracy and the surface quality, such as optical glass, silicon and project ceramics, it needs to achieve ultra smooth surface generally. But this kind of material's brittleness is high and the machinability is bad, so it is extremely easy to have damages on the processing surface. Because of the tradition abrasive machining method's efficiency is low, and the processing quality is not easy to control, it is difficult to meet develop need. Therefore, how to realize ultra-smooth polishing to hard brittle material have been become an important research issue in ultra-precision processing technology area, receives widespread attention.
First, the author analyzed the principle of the cluster MR-effect plane polishing, a new method-cluster MR-effect polishing which formed by cluster distributed magnetic body has been put forward based on the principle of MR polishing processing in this article. The conclusion that the different magnetic pole arrangement is superior to the same magnetic pole arrangement gets through simulation analysis to magnetic pole, the structure of the polishing disk is designed optimally, and the movement of abrasive trajectory is analyzed through simulation. By analyzing the magnetorheological finish working fluid's composition, properties, rheological mechanism and performance requirements, the proportion of various components are optimized.
Next, this article has developed a cluster MR-effect plane polishing experimental device, and design optimally to its component, such as rotary polishing disk, adjustable magnetic device, recycling and storing device and clamping workpiece device. Have carried on the feasible processing experiment to K9 optical glass, silicon and YAG ceramics, the surface roughness of K9 glass, silicon and YAG ceramics can achieve respectively Ra0.005μm, Ra0.016μm and Ra0.015μm finally after processed. The result indicated that the cluster MR-effect plane polishing method is feasible, can realize high accuracy polishing.
Finally, using the experimental device and the magnetorheological finish working fluid which is selfmade, carries on the polishing experiment to K9 glass and silicon.The influence rule of parameters on processing effect is obtained, such as the polishing time, the machining gap. the magnetic field intensity, the speed (the rotational speed of polishing disk, the rotational speed of work piece disk and swing speed), the carbonyl iron consistency, the content of abrasives, the abrasive material type, the the size ratio of abrasive and iron powder. Summarized the technological parameter optimization selection principle. Based on the technological parameter optimizes, carries on the processing experiment to the different type material's work piece, explores the processing effect to different material in using the cluster MR-effect plane polishing method, expands the method's application scope. The experimental study indicated that the cluster MR-effect plane polishing method is feasible, and the designed processing equipment has good workability.
引文
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