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石材表面微观不平度对其光泽度影响的实验研究
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摘要
随着我国经济的发展和人民生活水平的提高,室内外装饰趋于高档豪华,高档石材的需求量每年都大幅度递增,提高石材精细磨抛后的表面光泽度是提升石材档次的关键。
     本文在国内外关于石材表面光泽面形成机理研究的基础上,结合陶瓷和玻璃精密加工技术研究进展,通过游离磨料研磨抛光、ELID磨削这两种加工条件截然不同的精密加工方法获取高质量的石材加工表面,并采用多种检测手段跟踪石材磨抛过程中表面特征的变化,结合石材的性质研究其表面光泽度的形成及其与加工表面微观不平度的依赖关系。本文共分六章,第一章介绍了石材的一些基本性质,并对国内外的石材磨抛机理研究现状做了综合评述;第二章至第六章是本论文研究的主要内容,论述了本文所采用的试验方法及加工过程中石材的微观形貌及其光泽度的关系。本文的主要成果有以下几个方面:
     1.石材的表面粗糙度很分散,在不同的位置表面粗糙度值相差达3-4倍。显微形貌观察结果表明,石材抛光后表面存在凹坑、裂纹、晶界裂隙、晶粒脱落等缺陷,这些缺陷是导致石材表面粗糙度分散的原因。
     2.表面光泽度的高低依赖于其粗糙度的大小。随着表面粗糙度的降低,表面光泽度上升,只有表面粗糙度降低到一定程度以后,石材表面的表面光泽度才会急剧增加。但当表面粗糙度值比较低的时候,表面光泽度的增加是很小的。
     3.石材表面光泽度的高低还与材料本身缺陷和表面残留凹坑密切相关。跟踪抛光过程中石材表面形貌变化发现,这些凹坑一部分是石材本身所固有的,另一部分则是粗磨时造成的凹坑在抛光时无法消除而遗留下来。
     4.在考虑材料本身缺陷和表面残留凹坑对表面光泽度影响的基础上,提出了零缺陷光泽度的概念。这一定义有助于定量评价加工缺陷对表面光泽度的影响,可用于预测实际磨抛石材所能达到的最高光泽度。
With the development of economy and the improvement of people's living standards in our country, the interior and exterior decoration tends to be high-grade and luxurious, and the requirement for high-grade stone productions increases widely every year. Therefore, to improve the surface glossiness after fine grinding and polishing is the key to enhance the grade of stone productions.
    Based on the researches at home and abroad on the forming mechanism of the gloss surface of stones, and combined with the research development on machining technologies of ceramics and glasses, in this thesis two methods, loose abrasive polishing and ELID lap grinding, are applied for stones to achieve high-quality surface, and keep trace of transformation of the surface morphologies by multi-kinds of test technique. Ultimately the formation of surface glossiness and its dependence on surface micro-irregularity are researched by combining with the characteristics of stones. This thesis is separated into six chapters. Some basic characteristics of stones are introduced and current researches at home and abroad on the grinding and polishing mechanism of stones are summarized in chapter one; and the relationship between the micro-appearance and the surface glossiness after polishing is discussed from chapter two to chapter six, which is the main content for this thesis.
    The main achievements of this thesis are summarized as follows:
    1. The surface roughness of stone is very discrete, whose value in a place is 3-4 times as large as that in other places. After observation of the stone micro-appearance after polishing, it is found that some flaws, such as craters, cracks, crystal boundaries and pull-out pits, exist on the stone surface which result in the discreteness of surface roughness
    2. It is found that the degree of surface glossiness depends on that of roughness. The surface glossiness increases with the decrease of surface roughness. Only when the surface roughness decreases to a certain degree, the surface glossiness increases sharply; while the glossiness increases very little when the roughness is much lower.
    3. The degree of glossiness of stones is also related with material inherent flaws and the remained craters on stone surface. After tracing the changes of surface morphologies of stones, it is found that some of these craters on stone surface are inherent, and others formed in the former coarse grinding are inherited from some craters that can not be removed by polishing.
    4. On the basis of considering the influences on surface glossiness of material inherent limitations and the remained craters, a new conception------"zero-limitation glossiness" is
    
    
    proposed in this thesis, which provides a reference for evaluating quantitatively the influences on surface glossiness of machining deficiencies and for forecasting the highest glossiness in practical stone machining.
引文
[1] http://www. world-stone. com/zhishi_xinxi. asp?id=592
    [2] http://www. stoneboy. com/chinese/News/news_center_1. asp
    [3] 李享德.岩石磨削抛光机理及工艺研究:[博士学位论文].大连理工大学,1990,7
    [4] 杨杰,严荣荫等.《中国石材》.北京:中国建材工业出版社,1994,12
    [5] 乐昌硕.岩石学.地质出版社,1984
    [6] 晏辉.谈谈对石材缺陷的看法.石材,2000,0(3):14-16
    [7] 李享德,刘培德.岩石的理论光泽度与可抛光性.非金属矿,1990.0(3):41-44
    [8] P. R. Davis. Developments in Stone Polishing. IDR 95/6
    [9] 希禾,舒士韬,戴增惠,袁蓟生.饰面石材开采与加工.中国建筑工业出版社,1986,6
    [10] 王成勇,魏昕,陈启波,谭哲丽.磨具组成成份对花岗岩抛光效果的影响.磨料磨具与磨削,1995,2(8):11-13
    [11] 赵万康,王珉,左敦稳.新型花岗石抛光磨具的性能研究.金刚石与磨料磨具工程,1996,2(92):31-33
    [12] 邓碧岳,张春娴.菱苦土磨具及其在石材工业中的应用.磨料磨具与磨削,1989.3(51):9-14
    [13] 潘海鸿,温筱茜,曹硕生.花岗石磨具配方、性能及工艺参数的研究.磨料磨具与磨削,1994.1(79):7-11
    [14] 朱目成,王雅萍.石材研磨磨块的试验优化设计.金刚石与磨料磨具工程,1995.4(88):13-16
    [15] 李享德,刘培德,孙宝元.加工石材用菱苦土磨具的配比选择及磨损机理.磨料磨具与磨削,1990.6(60):8-13
    [16] 左宏森.新型金刚石磨块在研磨机上的应用与分析.金刚石与磨料磨具工程,2000.2(116)
    [17] 张科.石材金刚石磨具形状和排布方式对磨加工性能的影响.磨料磨具与磨削,1992.5(71)
    [18] 王心善,王振民.花岗石墓碑石加工用金刚石磨盘的粒度选择及合理应用.金刚石与磨料磨具工程,1996.4(94):6-8
    [19] 杨中喜,邵有国.影响花岗石石材磨削抛光的岩石学因素.石材,1999.0(5):10-13
    [20] 李远,黄辉,赖明通,徐西鹏.人造金刚石加工中岩石表面光泽度形成过程研究.珠宝科技,2002.6(2):48-51
    [21] 谢晋,杨凯华.花岗石表面光泽薄膜生成机理及抛光工具和工艺.金刚石与磨料磨具工程,1998.1(103):20-24
    [22] P. Davis, N. Pearce. Diamond Tooling Reduces Polishing Costs. IDR 95/2
    
    
    [23] RS. Midha, R. DChannon, M. Montakhab. An Investigation into the Optimisation of Stone Processing Using Diamond Tools. Proc. of Intertech 2001, Canada
    [24] G. Schwan. Economic Polishing of Granite. IDR 98/1
    [25] D. N. Wright, C. Rouse. Stone Polishing-measurement of Surface Finish. IDR 93/1
    [26] Mamoru Nakayama, Katsuhisa Kudo, Tooru Sakakibara, Haruki Nomura. Polishing of Stone. IDR 92/5
    [27] 杨中喜,刘晓鸿.用电子显微镜研究花岗石的抛光机理.山东建材学院学报,1999.13(4):308-310
    [28] 孙大千,曹书云.天然岩石材料磨削加工抛光层的初探.机械工程学报,1993,29(1):1.6
    [29] 殷玲,刘忠.大理石抛光表层变质层的研究.磨料磨具与磨削,1993,2(74):21-22
    [30] 周长明,邵国有,候文萍.花岗石抛光机理探讨.非金属矿,1997,0(1):58-60
    [31] 黄辉.关于花岗石高光泽度饰面形成机理的基础研究:[博士学位论文].南京航空航天大学,2002.1
    [32] M. Jiang, R. Komanduri. Chemical Mechanical Polishing(CMP) in Magnetic Float Polishing(MFP) of Advanced Ceramic(Silicon Nitride) and Glass(Silicon Dioxide). Key Engineering materials Vols 2001 (202-203): 1-14
    [33] Woong Cho, Yoomin Ahn, Chang-Wook Beak, Yong-Kweon Kim. Effect of mechanical process parameters on chemical mechanical polishing of A1 thin films. Microeletronic Engineering 2003(65): 13-23
    [34] H. liang, F. Kaufman, R. Sevilla, S. Anjur. Wear phenomena in chemical mechanical polishing. Wear 1997(211): 271-279
    [35] Chunhong Zhou, Lei Shan, J. Robert Hight, S. H. Ng, Steven Danyluk. Fluid pressure and its effects on chemical mechanical polishing. Wear 2002(253): 430-437
    [36] B. JHooper, G. Byrne, S. Galligan. Pad conditioning in chemical mechanical polishing. Journal of Materials Processing Technology 2002(123): 107-113
    [37] M. Jiang, R. Komanduri. Application of Taguchi Method for Optimization of Finishing Condition in Magnetic Float Polishing(MFP). Wear 1997(213): 59-71
    [38] N. Umehara, T. Hayashi, K. Kato. In Situ, Observation of the Behavior of Abrasives in Magnetic Fluid Grinding. Journal of Magnetism and Magnetic Materials 1995(149): 181-184
    [39] N. Umehara. MAGIC Polishing. Journal of Magnetism and Magnetic Materials 2002(252): 341-343
    [40] B. P. Bandyopadhyay, H. Ohmori. The Effect of EILD grinding on the flexural strength of silicon nitride. International Journal of Machine Tools & Manufacture 1999(39): 839-853
    [41] B. P. Bandyopadhyay, H. Ohmori, I. Takahashi. Efficient and stable grinding of
    
    ceramics by electrolytic in-process dressi:ng(ELID). Journal of Materials Processing Technology 1997(66): 18-24
    [42] H. S. Lim, K. Fathima, A. Senthi Kumar, M. Rahman. A fundamental study on the mechanism of electrolytic in-process dressing(ELID) grinding. International Journal of Machine Tools & Manufacture 2002(42): 935-943
    [43] K. Katahira, Y. Watannabe, H. Ohmori, T. Kato. ELID grinding and tribological characteristics of TiAIN film. International Journal of Machine Tools & Manufacture. 2002(42): 307-1313
    [44] 李伯民,赵波.现代磨削技术.机械工业出版社,2003
    [45] 杨建东,田春林.高速研磨技术.国防工业出版社,2003
    [46] 袁巨龙,崔丽芬.蓝宝石单晶纳米加工技术的研究.仪器仪表学报.1995,16(1):187-192
    [47] 袁长良等.表面组糙度及其测量.机械工业出版社,1989
    [48] 林滨.工程陶瓷超精密磨削机理与实验研究[博士学位论文].天津大学,1999,8

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