微透镜阵列焦距及其一致性检测技术研究
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摘要
微光学迅速发展的一个重要标志就是阵列型光学元件的出现。微透镜阵列由于其高衍射效率、高填充因子和较宽的工作波段，近年来广泛应用于光学三维成像、光整形和光耦合等领域。尤其在自适应光学系统的哈特曼波前传感器中，微透镜阵列是波面细分和检测的核心部件。近年来，随着加工工艺的提高和新型光学材料的应用导致微透镜阵列的生产成本降低、加工工艺日趋简单，其应用越来越广。
与传统透镜类似，焦距是微透镜阵列的核心光学参数。随着微透镜阵列也向着小口径、多阵列数以及高填充因子的方向发展，对其焦距检测不仅需要较高的检测精度，而且需要较快的检测效率。对于微透镜阵列焦距的检测，传统的检测方法如转角法、放大率测量法、显微镜测量法、矢高测量法、浮雕深度测量法等不能完成焦距的高精度检测，同时测量范围受限较大。国外实验室常采用干涉仪定焦法，通过干涉仪的猫眼定焦技术确定微透镜阵列的焦点和顶点从而完成焦距的测量。该检测手段成本较高，同时测量效率偏低，不易完成多阵列数的微透镜阵列焦距测量。
本文以解决微透镜阵列焦距测量的精度和效率为指导思想，对不同类型的微透镜阵列，通过分析其加工工艺和成像特性的不同，将4类检测方法用于微透镜焦距测量：基于光栅剪切干涉测量法，基于光栅多缝衍射原理的分光法，基于清晰度定焦评价函数的图像处理法和基于哈特曼波前检测原理的测量法。对剪切干涉法：通过傅里叶光学分析，将剪切干涉定焦从定性检测转换成定量检测，通过分析干涉条纹的周期变化即可完成微透镜阵列定焦检测，提高了测量精度；对光栅衍射法：利用光栅衍射的分光原理，用光栅分光代替传统的转角法完成微透镜的定焦测量，并分析了测量过程中，相邻子单元光斑的干扰状况，节约了测量成本，提高了检测效率；对图像处理法：利用清晰度函数定焦技术代替干涉仪的“猫眼”位置定焦，极大的提高了测量效率；对于哈特曼波前法：通过分析球面波前和平面波前在微透镜阵列焦面上光斑的移动，完成焦距测量，具有较高的检测精度和测量效率。综合分析4种测量方法，比较各类检测方法在不同微透镜阵列检测中的优劣。通过实验完成检测方法的可行性分析，测量范围标定，测量精度和效率分析。
本研究初步构建了一套完整的微透镜阵列焦距及其一致性检测体系，对焦距变化范围为1-200mm，子单元孔径变化范围为0.2-1mm即F数变化为5-200的微透镜阵列，可选取合理的检测方法，完成其焦距测量。该检测体系有效填补了国内外对微透镜阵列焦距测量的空白，对适用于检测范围的微透镜阵列检测精度可达3%，一次测量可完成微透镜阵列10-20个子单元的焦距检测，具有较高的检测精度和检测效率。
As a typical micro-optical element, microlens-array (MLA) has been researchedextensively in recent times. Because of the high diffractive efficiency, high filling factorand wide working wavelength, MLA are applied in modern optical system such asthree-dimensional imaging, light reforming and light coupling, et al. Especially inHartmann-Shack sensor (HSS) of auto-adoption optics, MLA is the key component forthe wavefront subdivision and measurement. In recent times, the development of MLAfabrication and application of new optical materials reduce the cost of MLA fabrication,facilitate the craft and enlarge the application.
Like the traditional lens, focal length is the key optical parameter of MLA. As the sizeof MLA is smaller, the number of arrays is more and the filling factor is bigger, thefocal length measurement of MLA needs not only measurement precision but alsomeasurement efficiency. For the focal length measurement of MLA, traditionaltechnique such as twirling platform method, amplification method, microcopy method,victor height method, and embossment height method can not finish the focal lengthmeasurement with high precision. In laboratory overseas, interferometer is applied forthe focus determination. By the “cat-position” of interferometer, the vertex and focus ofMLA is demarcated and the focal length is calculated after measure the axial distancebetween the vertex and focus. This technology not only has high experiment costs, butalso low measurement efficiency because this technology can only measure onesub-lens at single shot.
To solve the measuring puzzle of MLA, four technologies namely grating shearinginterferometry, grating diffraction method, image process method and Hartmannwavefront measurement method are first applied in the focal length measurement of byanalyzing the fabrication and imaging characteristics of MLA. For the grating shearinginterferometry, this method is innovative improved from qualitative measurement toquantitative measurement by Fourier optics and the measurement precision is also improved after determine the relationship between period of stripe and defocus ofgrating. For the grating diffraction method, grating is applied as spectral instrumentinstead of the high precision turntable, and the disturbance of sub lens in themeasurement is analyzed; this method can improve the measurement efficiency becauseit can determine tens of sub lenses at single shot. For the image process method, focusfixed technology based on the digital image process is applied for the focus and vertexdetermination instead of interferometer, and the measurement efficiency is improvedwhile the measurement costs is reduced. For the Hartmann wavefront method, the focallength is measured by analyze the difference of imaging spot between plane andspherical wavefront. Comprehensive compare these four methods, the advantage anddisadvantage of each technology is analyzed. The feasibility, measurement range,measurement precision and efficiency is demarcated in the experiment.
In this research, an integral measurement system is established for the focal lengthmeasurement of MLA. Different MLA with diameter of sub lens from0.2mm to2mmand F-number from5-200can be measured by choosing a suitable method in thissystem. This measurement system fills the blank of focal length measurement of MLA,and the measurement precision is better than3%. The technologies in this system canmeasure tens sub lens at one measurement, which means these technologies have notonly measurement precision but also efficiency.
与传统透镜类似，焦距是微透镜阵列的核心光学参数。随着微透镜阵列也向着小口径、多阵列数以及高填充因子的方向发展，对其焦距检测不仅需要较高的检测精度，而且需要较快的检测效率。对于微透镜阵列焦距的检测，传统的检测方法如转角法、放大率测量法、显微镜测量法、矢高测量法、浮雕深度测量法等不能完成焦距的高精度检测，同时测量范围受限较大。国外实验室常采用干涉仪定焦法，通过干涉仪的猫眼定焦技术确定微透镜阵列的焦点和顶点从而完成焦距的测量。该检测手段成本较高，同时测量效率偏低，不易完成多阵列数的微透镜阵列焦距测量。
本文以解决微透镜阵列焦距测量的精度和效率为指导思想，对不同类型的微透镜阵列，通过分析其加工工艺和成像特性的不同，将4类检测方法用于微透镜焦距测量：基于光栅剪切干涉测量法，基于光栅多缝衍射原理的分光法，基于清晰度定焦评价函数的图像处理法和基于哈特曼波前检测原理的测量法。对剪切干涉法：通过傅里叶光学分析，将剪切干涉定焦从定性检测转换成定量检测，通过分析干涉条纹的周期变化即可完成微透镜阵列定焦检测，提高了测量精度；对光栅衍射法：利用光栅衍射的分光原理，用光栅分光代替传统的转角法完成微透镜的定焦测量，并分析了测量过程中，相邻子单元光斑的干扰状况，节约了测量成本，提高了检测效率；对图像处理法：利用清晰度函数定焦技术代替干涉仪的“猫眼”位置定焦，极大的提高了测量效率；对于哈特曼波前法：通过分析球面波前和平面波前在微透镜阵列焦面上光斑的移动，完成焦距测量，具有较高的检测精度和测量效率。综合分析4种测量方法，比较各类检测方法在不同微透镜阵列检测中的优劣。通过实验完成检测方法的可行性分析，测量范围标定，测量精度和效率分析。
本研究初步构建了一套完整的微透镜阵列焦距及其一致性检测体系，对焦距变化范围为1-200mm，子单元孔径变化范围为0.2-1mm即F数变化为5-200的微透镜阵列，可选取合理的检测方法，完成其焦距测量。该检测体系有效填补了国内外对微透镜阵列焦距测量的空白，对适用于检测范围的微透镜阵列检测精度可达3%，一次测量可完成微透镜阵列10-20个子单元的焦距检测，具有较高的检测精度和检测效率。
As a typical micro-optical element, microlens-array (MLA) has been researchedextensively in recent times. Because of the high diffractive efficiency, high filling factorand wide working wavelength, MLA are applied in modern optical system such asthree-dimensional imaging, light reforming and light coupling, et al. Especially inHartmann-Shack sensor (HSS) of auto-adoption optics, MLA is the key component forthe wavefront subdivision and measurement. In recent times, the development of MLAfabrication and application of new optical materials reduce the cost of MLA fabrication,facilitate the craft and enlarge the application.
Like the traditional lens, focal length is the key optical parameter of MLA. As the sizeof MLA is smaller, the number of arrays is more and the filling factor is bigger, thefocal length measurement of MLA needs not only measurement precision but alsomeasurement efficiency. For the focal length measurement of MLA, traditionaltechnique such as twirling platform method, amplification method, microcopy method,victor height method, and embossment height method can not finish the focal lengthmeasurement with high precision. In laboratory overseas, interferometer is applied forthe focus determination. By the “cat-position” of interferometer, the vertex and focus ofMLA is demarcated and the focal length is calculated after measure the axial distancebetween the vertex and focus. This technology not only has high experiment costs, butalso low measurement efficiency because this technology can only measure onesub-lens at single shot.
To solve the measuring puzzle of MLA, four technologies namely grating shearinginterferometry, grating diffraction method, image process method and Hartmannwavefront measurement method are first applied in the focal length measurement of byanalyzing the fabrication and imaging characteristics of MLA. For the grating shearinginterferometry, this method is innovative improved from qualitative measurement toquantitative measurement by Fourier optics and the measurement precision is also improved after determine the relationship between period of stripe and defocus ofgrating. For the grating diffraction method, grating is applied as spectral instrumentinstead of the high precision turntable, and the disturbance of sub lens in themeasurement is analyzed; this method can improve the measurement efficiency becauseit can determine tens of sub lenses at single shot. For the image process method, focusfixed technology based on the digital image process is applied for the focus and vertexdetermination instead of interferometer, and the measurement efficiency is improvedwhile the measurement costs is reduced. For the Hartmann wavefront method, the focallength is measured by analyze the difference of imaging spot between plane andspherical wavefront. Comprehensive compare these four methods, the advantage anddisadvantage of each technology is analyzed. The feasibility, measurement range,measurement precision and efficiency is demarcated in the experiment.
In this research, an integral measurement system is established for the focal lengthmeasurement of MLA. Different MLA with diameter of sub lens from0.2mm to2mmand F-number from5-200can be measured by choosing a suitable method in thissystem. This measurement system fills the blank of focal length measurement of MLA,and the measurement precision is better than3%. The technologies in this system canmeasure tens sub lens at one measurement, which means these technologies have notonly measurement precision but also efficiency.
引文
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