Study of filament performance in heat transfer and hydrogen dissociation in diamond chemical vapor deposition

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• 出版年：2006
• 作者：Qi Xuegui；Chen Zeshao；Xu Hong
• 单位1：School of Mechanical and Power Engineering
• 单位2：East China University of Science and Tchnology
• 出生年：1976
• 语种：英文
• 作者关键词：Hot-filament；Chemical vapor deposition（CVD）；Diamond film；Heat transfer；Hydrogen dissociation
• 起始页：11
• 总页数：7
• 刊名：金刚石与磨料磨具工程
• 是否内版：否
• 刊频：双月刊
• 主办单位：郑州磨料磨具磨削研究所
• 主编：王琴
• 地址：郑州市华山路121号
• 邮编：450007
• 电子信箱：diamond@371.net
• 期：1
• 期刊索取号：P666.06 836
• 数据库收录：全国中文核心期刊；中国科技论文统计源期刊；Ei收录用刊；CA收录用刊
• 核心期刊：全国中文核心期刊

摘要

Hot-filament chemical vapor deposition（HFCVD）i s a promising method for commercial production of diamond films.Filament performance in heat transfer and hydrogen decomposition in reactive environment was investigated.Power consumptionby thefilament in vacuum，helium and 2% CH₄/H₂ was experimentally determined in temperature range 1300℃ —2200℃.Filamentheat transfer mechanism in C-H reactive environment was calculated and analyzed.The result shows that due to surface carburizationand slight carbon deposition，radiation in stead of hydrogen dissociation，becomes the largest contributor to power consumption.Filament-surface dissociation of H2 was observed at temperatures below 1873K，demonstrating the feasibility of diamondgrowth at low filament temperatures.The effective activation energies of hydrogen dissociation on several clean refractory filamentswere derived from power consumption data in literatures.They are all lower than that of thermal dissociation of hydrogen revealingthe nature of catalytic dissociation of hydrogen on filament surface. Obsservation of substrate temperature suggested a weakerrole of atomic hydrogen recombination in heating substrates in C-H environment than in pure hydrogen.