文摘
A scalable strategy to fabricate multiplexed plasmonic nanoparticle structures by mechanical scratching with AFM (atomic force microscopy) lithography is presented by L. Jiang, L. Chi, and co-workers, on page 5818. Under the assistance of polymer resist, different shapes of gold nanoparticles assembled on the silicon substrate can be directly scratched by an AFM tip to form well defined nanostructures. Multiplexed plasmonic nanostructures can be further achieved, which demonstrate multiplexed plasmonic effects on the device performance.