A Titanium-Doped SiOx Passivation Layer for Greatly Enhanced Performance of a Hematite-Based Photoelectrochemical System

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• 作者：Dr. Hyo-Jin Ahn ; Ki-Yong Yoon ; Myung-Jun Kwak and Prof. Ji-Hyun Jang
• 刊名：Angewandte Chemie International Edition
• 出版年：2016
• 出版时间：August 16, 2016
• 年：2016
• 卷：55
• 期：34
• 页码：9922-9926
• 全文大小：2309K
• ISSN：1521-3773

文摘

This study introduces an in situ fabrication of nanoporous hematite with a Ti-doped SiO_x passivation layer for a high-performance water-splitting system. The nanoporous hematite with a Ti-doped SiO_x layer (Ti-(SiO_x/np-Fe₂O₃)) has a photocurrent density of 2.44 mA cm⁻² at 1.23 V_RHE and 3.70 mA cm⁻² at 1.50 V_RHE. When a cobalt phosphate co-catalyst was applied to Ti-(SiO_x/np-Fe₂O₃), the photocurrent density reached 3.19 mA cm⁻² at 1.23 V_RHE with stability, which shows great potential of the use of the Ti-doped SiO_x layer with a synergistic effect of decreased charge recombination, the increased number of active sites, and the reduced hole-diffusion pathway from the hematite to the electrolyte.